Dissertations / Theses on the topic 'Cathodic Arc'
To see the other types of publications on this topic, follow the link: Cathodic Arc.
Create a spot-on reference in APA, MLA, Chicago, Harvard, and other styles
Consult the top 50 dissertations / theses for your research on the topic 'Cathodic Arc.'
Next to every source in the list of references, there is an 'Add to bibliography' button. Press on it, and we will generate automatically the bibliographic reference to the chosen work in the citation style you need: APA, MLA, Harvard, Chicago, Vancouver, etc.
You can also download the full text of the academic publication as pdf and read online its abstract whenever available in the metadata.
Browse dissertations / theses on a wide variety of disciplines and organise your bibliography correctly.
1
Elzwawi, Salim Ahmed Ali. "Cathodic Arc Zinc Oxide for Active Electronic Devices." Thesis, University of Canterbury. Electrical and Computer Engineering, 2015. http://hdl.handle.net/10092/10852.
Full textAbstract:
The filtered cathodic vacuum arc (FCVA) technique is a well established deposition method for wear resistant mechanical coatings. More recently, this method has attracted attention for growing ZnO based transparent conducting films. However, the potential of FCVA deposition to prepare ZnO layers for electronic devices is largely unexplored. This thesis addresses the use of FCVA deposition for the fabrication of
active ZnO based electronic devices. The structural, electrical and optical characteristics of unintentionally doped ZnO films grown on different sapphire substrates were systematically investigated. The potential of FCVA to grow both polar and non-polar ZnO films was demonstrated. The resulting films showed considerable promise for
device applications with properties including high transparency(> 90%), moderate intrinsic carrier concentrations (10¹⁷ - 10¹⁹ cm⁻³), electron mobilities up to 110 cm⁻²/Vs, low surface roughness (< 5 nm) and well-structured photoluminescence. Post-growth annealing in oxygen at temperatures up to 800 C produced significant improvements
in the electronic and optical properties of these films, due to the formation of larger grains with lower inter-grain potential barriers.
Silver oxide (AgOᵪ ) and iridium oxide (IrOᵪ) Schottky diodes fabricated on annealed FCVA ZnO films showed ideality factors as low as 1.20, barrier heights up to 0.85 eV and high sensitivity to ultraviolet light (up to ̴ 10⁻⁵ at -2 V). Transparent and opaque MESFETs fabricated on these films showed well defined field effect characteristics, channel mobilities up to 70 cm⁻²/Vs and insensitivity to 1 mW/cm⁻² visible light. These devices were further subjected to extensive bias and temperature stress
tests. MESFET stability appeared to be strongly dependent on Schottky gate type, bias conditions and ZnO film morphology. Positive bias stress of AgOᵪ gated devices resulted in irreversible damage, that is thought to be due to Ag electromigration across the gate interface. Mapping of the surface potential of the ZnO channel material with Kelvin probe force microscopy suggested a strong relationship between the defect density at grain boundaries and both channel mobility and current stability. Interval growth techniques were found to reduce the density of defects at grain boundaries and produced MESFETs with higher current stability. IrOᵪ gated devices showed superior bias stability and temperature resilience from 25 C-195 C.
2
Neumann, Patrick Reinhard Christian. "Centre-Triggered Pulsed Cathodic Arc Spacecraft Propulsion Systems." Thesis, The University of Sydney, 2015. http://hdl.handle.net/2123/13810.
Full textAbstract:
Satellites must carry some manner of propulsion system so that course correction or orbit stationkeeping manoeuvres can be carried out. Chemical thrusters have lower specific impulse than electric propulsion systems, and so focus has turned to using plasma and ion propulsion systems such as Hall Effect thrusters and gridded ion thrusters. Both of these systems use gaseous propellants and require a charge neutralisation system, both of which impose certain design compromises. This thesis explores the potential use of pulsed cathodic arcs as a spacecraft propulsion system, determining fuel specific impulse and jet power efficiency of a range of suitable materials over a range of arc currents and pulse durations. Comparisons between element classes are made, so as to identify candidate materials for various mission profiles. The results for magnesium in particular stand out as being comparable to several thruster technologies that are flight-rated.
3
Eriksson, Anders. "Cathodic Arc Synthesis of Ti-Si-C-N Thin Films from Ternary Cathodes." Licentiate thesis, Linköpings universitet, Tunnfilmsfysik, 2010. http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-61994.
Full textAbstract:
Cathodic arc deposition is a powerful technique for thin film synthesis, associated with explosive phase transformations resulting in an energetic and highly ionized plasma. This Thesis presents film growth through arc deposition from compound cathodes of Ti3SiC2, providing source material for plasma and films rich in Si and C. The interest for the resulting Ti-Si-C-N films is inspired by the two ternaries Ti-Si-N and Ti-C-N, both successfully applied as corrosion and wear resistant films, with a potential for synergistic effects in the quarternary system. When using a rotating substrate fixture setup, which is common in high capacity commercial deposition systems, the repeated passage though the plasma zone results in growth layers in the films. This effect has been observed in several coating systems, in deposition of various materials, but has not been explained in detail. The here investigated layers are characterized by a compositional modulation in Si and Ti content, which is attributed primarily to preferential resputtering in segments of rotation when the plasma has high incidence angle towards the substrate normal. For depositions in a non-reactive environment, the films consist of primarily understoichiometric TiCx, Ti, and silicide phases, and display a modest hardness (20-30 GPa) slightly improved by a decreasing layer thickness. Hence, the side effects of artificial layering from substrate rotation in deposition systems should be recognized. Adding N2 to the deposition process results in reactive growth of nitride material, formed in a wide range of compositions, and thereby enabling investigation of films in little explored parts of the Ti-Si-C-N system. The structure and properties of such films, comprising up to 12 at% Si and 16 at% C, is highly dependent on the supply of N2 during deposition. Superhard (45-50 GPa) cubic-phase (Ti,Si)(C,N) films with a nanocrystalline feathered structure is formed at N-content of 25-30 at%. At higher N2 deposition pressure, C and Si segregate to column and grain boundaries and the cubic phase assumes a more pronounced nitride character. This transformation is accompanied by substantially reduced film hardness to 20 GPa. Ti-Si-C-N films thus display a rich variety of structures with favorable mechanical properties, but in the regime of high Si and C content, the amount of N must be carefully controlled to avoid undesirable formation of weak grain boundary phases based on Si, C and N.
4
MacKenzie, Maureen. "Analytical electron microscopy of interfaces in cathodic arc coatings." Thesis, University of Glasgow, 1997. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.337506.
Full text
5
Mustapha, Nazir Mohamad. "Reactive filtered arc evaporation." Thesis, Loughborough University, 1993. https://dspace.lboro.ac.uk/2134/26797.
Full textAbstract:
Conventional physical vapour deposition (PVD) techniques usually result in films of lower quality than the corresponding bulk material. A major problem with PVD films is the presence of columns and voids throughout the thickness of the film. The films may have a low packing density, low micro-hardness and in many cases poor adhesion to the substrate. Many of these problems are a direct consequence of the low energy of the depositing atoms arriving at the substrate during film growth. The resulting film porosity gives rise to a reduction in mechanical strength, and in the case of dielectric optical films, a reduction in the refractive index. The properties of deposited films are greatly improved when the substrate or the growing film is bombarded with more energetic particles. An ideal deposition process requires a high flux of film atoms with an energy of approximately 5-50 eV in order to achieve sufficient surface mobility at the substrate to overcome columnar growth.
6
Chhowalla, Manish. "Carbon thin films with enhanced properties from cathodic arc plasmas." Thesis, University of Cambridge, 1998. https://www.repository.cam.ac.uk/handle/1810/265423.
Full textAbstract:
In this thesis, the physical, optical and electronic properties of amorphous carbon ( a-C) thin films deposited using a filtered and unfiltered cathodic arcs are investigated. Firstly, the plasma properties of the filtered cathodic vacuum arc (FCVA) have been examined using planar and wire Langmuir probes in order to optimize the plasma throughput around the 90� bend. The knowledge of plasma characteristics is then utilized to understand the properties of highly tetrahedral amorphous carbon ( ta-C) films as a function of the ion energy, deposition temperature and the deposition rate. A model based on the intrinsic thermal effects of the deposition process is developed to explain the discrepancy of the sp3 fraction versus the ion energy in the literature. The possibility of p-type electronic doping of ta-C has also been investigated by the incorporation of B into the ta-C matrix. It was shown for the first time that the incorporation of B in ta-C reduces the compressive stress while maintaining high sp3 bonding. The details of a new form of arc discharge referred to as the 'stationary arc' which allows the deposition of smooth ta-C films without a bulky macroparticle filter are reported. Finally, extraordinary hardness and elastic properties of a new form of carbon arising from interlinking of graphitic nanoparticles are also presented.
7
Schonjahn, Cornelia. "Surface treatment in a cathodic arc plasma : key step for interface engineering." Thesis, Sheffield Hallam University, 2001. http://shura.shu.ac.uk/20336/.
Full textAbstract:
The effect of substrate surface treatment (substrate sputter cleaning) in a cathodic arc plasma prior to unbalanced magnetron deposition of transition metal nitride coatings on the performance of the coated components has been investigated. In particular the influence of parameters such as ion species, ion energy and exposure time on the changes in substrate surface topography, microstructure and micro-chemistry were studied employing transmission electron microscopy, energy dispersive X-ray analysis, electron energy loss spectroscopy, X-ray diffraction, atomic force microscopy and optical microscopy. The consequences for both the microstructure of subsequently grown transition metal nitride coatings and their adhesion were elucidated. The relevance for practical applications was demonstrated using the example of dry high-speed milling tests, which showed that an appropriate choice of substrate surface pre-treatment parameters can double the life time of the coated tools. This was found to be due to an improved adhesion as a result of a combina-tion of reduced oxygen incorporation at the interface between coating and substrate and local epitaxial growth of the coating. The latter is promoted by certain sub-strate surface pre-treatment procedures, which provide clean surfaces with preserved crystallographic order.
8
Liu, Zhijie. "Application of a pulsed cathodic arc for deposition of high entropy alloy thin films." Thesis, The University of Sydney, 2021. https://hdl.handle.net/2123/27518.
Full textAbstract:
High entropy alloys (HEAs) were highly valued because of their unique and desirable properties. A HEA is defined as having at least five elements in equimolar or near equimolar ratios, and the concentration of each element is between 5% and 35%. HEAs have many desired properties, such as excellent hardness, thermal stability, high electrical and oxidation resistance, and excellent mechanical properties. These advantages grant HEAs to overcome the conventional alloys and be applied in various fields like tools with excellent hardness, high temperature and durable characteristics, magnetic films, and diffusion barriers. While physical vapour deposition is one of the most common deposition technics in the thin film deposition application, cathodic arc deposition was chosen for the current study because of its remarkable advantages, such as high ionization rate and high deposition efficiency. Though cathodic arc has been used widely across industry applications, its application for high entropy alloy has been limited. Therefore, further research and experimentation are required to improve fabrication efficiency.
This thesis explores the plasma transportation associated with cathodic arc during HEA deposition. The high-speed framing camera examined the cathode spot motion as it is the primary plasma source. The deposition pattern and ion cross-section distribution experiment were conducted by deposition on the transparent plastic sheets under a range of operating parameters. The effectiveness of the electromagnetic coil was investigated by atomic force microscopy (AFM) and scanning electron microscopy (SEM) for the thin film samples on the silicon wafers. Overall, this work shows the different outcomes for various cathode current and electromagnetic coil current inputs to optimise the deposition conditions further.
9
Syed, Muhammad Bilal. "Thermal Stability of Arc Evaporated ZrCrAlN." Thesis, Linköpings universitet, Nanostrukturerade material, 2012. http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-84769.
Full textAbstract:
This research explores the thermal stability of ZrCrAlN material system. For this purpose fourteen different compositions of ZrCrAlN coatings were deposited onto tungsten carbide substrates by using reactive cathodic arc evaporation. These compositions were further annealed at 800oC, 900oC, 1000oC and 1100oC temperatures. EDS was employed to specify the compositions. The crystal structure of the coatings were analysed by XRD, and the hardness of these coatings was determined by Nanoindentation. The experimental findings reported a significant age hardening of Zr0.16Cr0.12Al0.72N and a delayed h-AlN formation in Zr0.07Cr0.40Al0.52N. ZrCrAlN was thus proved to be thermally stable.Multifilms,A4:2 Growth and characterization of Multicomponent Nitrides by Magnetron Sputtering and Arc evaporation
10
Veerasamy, Vijayen S. "Tetrahedral amorphous carbon : deposition, characterisation and electronic properties." Thesis, University of Cambridge, 1994. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.337824.
Full text
11
Kok, Yin Nan. "Nanoscale multilayer Me-graphite coatings grown by combined steered cathodic arc/unbalanced magnetron sputtering." Thesis, Sheffield Hallam University, 2005. http://shura.shu.ac.uk/19926/.
Full textAbstract:
Low friction, nanoscale multilayer carbon/chromium (C/Cr) coatings were successfully deposited by the combined steered cathodic arc/unbalanced magnetron sputtering technique (also known as Arc Bond Sputtering or ABS) using a Hauzer HTC 1000-4 PVD coater. The work described in this thesis has been directed towards understanding the effect of ion irradiation on the composition, microstructure, and functional properties of C/Cr coatings. This has been achieved by varying the bias voltage, U[B], over a wide range between -65 V and -550 V. C/Cr coatings were deposited in three major steps: (i) Cr+ ion etching using a steered cathodic arc discharge at a substrate bias voltage of -1200 V, (ii) deposition of a 0.25 mum thick CrN base layer by reactive unbalanced magnetron sputtering to enhance the adhesion, and (iii) deposition of C/Cr coatings by unbalanced magnetron sputtering from three graphite targets and one chromium target at 260°C. The coatings were deposited at different bias voltages (U[B]) from -65 V to -550 V in a non-reactive Ar atmosphere. C/Cr coatings exhibit excellent adhesion (critical load, L[C] > 70 N), with hardness ranging from 6.8 to 25.1 GPa depending on the bias voltage. The friction coefficient of C/Cr coatings was found to reduce from 0.22 to 0.16 when the bias voltage was increased from U[B] = -65 to -95 V. The relevance of C/Cr coatings for actual practical applications was demonstrated using dry high-speed milling trials on automotive aluminium alloy (Al-Si8Cu3Fe). The results showed that C/Cr coated cemented carbide ball-nose end mills prepared at U[B] = -95 V (70 at.% C, 30 at.% Cr) enhance the tool performance and the tool life compared to the uncoated tools by a factor of two, suggesting the potential for use in dry high-speed machining of "sticky" alloys such as aluminum. Different film morphologies were observed in the investigated bias voltage range between U[B] = -65 and -550 V using XTEM. With increasing bias voltage from U[B] = -65 to -95 V, the structure changed from columnar, with carbon accumulated at the column boundaries, to a dense structure which comprised randomly distributed onionlike carbon clusters. A novel nanostructure was observed within this bias voltage range, in which the basic nano-lamellae obtained as a result of substrate rotation in front of the C and Cr targets were modified by an ion-irradiation induced nanocolumnar structure. Further increases in the bias voltage to U[B] = -350 V and U[B] = -450 V led to segregation and self-organisation of the carbon atoms induced by the high energy ion bombardment and, finally, to the formation of a new type of self-organised multilayer structure. A coating growth model accounting for the influence of ion bombardment on the growing C/Cr film was introduced to explain the phase separation and formation of the selforganised layered nanostructure. A novel experimental set-up for the investigation of tribocorrosion was built based on a modification of the conventional Scanning Reference Electrode Technique (SRET). The device comprises a ball on rotating cylinder contact configuration combined with a SRET electrochemical device. This combination may contribute significantly to the understanding of wear-corrosion synergism.
12
Eriksson, Anders. "Cathodic Arc Synthesis of Ti-Si-C-N Thin Films : Plasma Analysis and Microstructure Formation." Doctoral thesis, Linköpings universitet, Tunnfilmsfysik, 2013. http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-86259.
Full textAbstract:
This Thesis explores the arc deposition process and films of Ti-Si-C-N, inspired by the two ternary systems Ti-Si-N and Ti-C-N, both successfully applied as corrosion and wear resistant films. The correlation between cathode, plasma, and film properties are studied for a comprehensive view on film formation. Novel approaches to adapt arc deposition to form multi-element films are investigated, concluding that the source of C is not a determining factor for film growth. Thus, cubic-phase films of similar properties can be synthesized from processes with either 1) ternary Ti-Si-C cathodes, including the Ti3SiC2 MAX phase, in N2 atmosphere or 2) Ti-Si cathodes in a mixture of N2 and CH4. With the Ti3SiC2 cathodes, superhard (45-50 GPa) cubic-phase (Ti,Si)(C,N) films can be deposited. The structure is nanocrystalline and feather-like, with high Si and C content of 12 and 16 at%, respectively. To isolate the effects of Si on film structure, magnetron sputtered Ti-Si-N films of comparatively low defect density was studied. These films show a strong preference for {200} growth orientation, and can be grown as a single phase solid solution on MgO(001) substrates up to ~9 at% Si, i.e. considerably higher than the ~5 at% Si above which a feather-like nanocrystalline structure forms in arc deposited films. On (011) and (111) growth surfaces, the films self-organize into TiN columns separated by segregated crystalline-to-amorphous SiNx. The conditions for film growth by arc were investigated through plasma studies, showing that plasma properties are dependent on cathode composition as well as phase structure. Plasma generation from Ti-Si cathodes, with up to 25 at% Si, show higher average ion charge states of Ti and Si compared to plasma from elemental cathodes, which may be related to TiSix phases of higher cohesive energies. The ion energy distributions range up to 200 eV. Furthermore, compositional discrepancies between plasma ions and film infer significant contributions to film growth from Si rich neutral species. This is further supported by depositions with a macroparticle filter, intended for growth of films with low surface roughness, where Si and C contents lower than the stoichiometry of Ti3SiC2 cathodes was measured in both plasma and films. Also the substrate geometry is critical for the film composition in plasma based film deposition, as evidenced by the formation of artificial layering from rotating substrate fixtures common in high capacity arc deposition systems. The layers are characterized by modulations in composition and crystallinity, primarily attributed to preferential resputtering in high ion incidence angle segments repeated through rotation.
13
Oliveira, Junior Myriano Henriques de. "Propriedades ópticas, mecânicas e estruturais de filmes de carbono amorfo." [s.n.], 2009. http://repositorio.unicamp.br/jspui/handle/REPOSIP/277831.
Full textAbstract:
Orientador: Francisco das Chagas MarquesTese (doutorado) - Universidade Estadual de Campinas, Instituto de Fisica Gleb Wataghin
Made available in DSpace on 2018-08-14T14:37:10Z (GMT). No. of bitstreams: 1 OliveiraJunior_MyrianoHenriquesde_D.pdf: 13534676 bytes, checksum: 4da81eaf9a2b22721528c9804801a446 (MD5) Previous issue date: 2009
Resumo: Neste trabalho desenvolvemos um sistema de deposição de filmes finos pela técnica de arco catódico filtrado (FCVA- Filtered Cathodic Vacuum Arc), que possibilita o desenvolvimento de ligas metálicas e, sobretudo, a deposição de filmes de carbono amorfo altamente tetraédrico. Utilizando este sistema desenvolvemos filmes de carbono amorfo (a-C) com elevada dureza (estimado em cerca de 50 a 60GPa) e alta concentração de ligações sp3 C-C em função da polarização do substrato. Estudamos as propriedades ópticas, mecânicas (stress e dureza), estruturais (Raman e RBS) e a estabilidade térmica (efusão de gases) destes filmes em função da energia de deposição. Também desenvolvemos e caracterizamos filmes de carbono crescidos por FCVA assistido por um feixe de íons secundário de Ar e Kr com diferentes energias, onde analisamos os efeitos da energia deste feixe sobre as propriedades físicas do material resultante. Além das estruturas de carbono intrínseco realizamos um estudo sobre filmes de carbono amorfo hidrogenado depositados por PECVD (plasma enhanced chemical vapor deposition) com diferentes tensões de bias (de 60 à 550V) e atmosferas mistas de CH4/Kr, onde variamos a pressão parcial deste gás nobre entre 0 e 50%. Estudamos a influência deste gás nobre sobre as propriedades estruturais do material assim como a forma como os átomos deste elemento se distribuem dentro da rede amorfa. Esta última análise foi baseada em estudos conduzidos a partir da absorção de raios-x na borda K do átomo de criptônio, onde verificamos a aglomeração destes átomos na forma de estruturas solidas. Também investigamos os processos de transformações estruturais ocorridas em estruturas a-C:H e ta-C com a temperatura baseadas na efusão de gases. Para este estudo construímos um sistema que funciona em ultra-alto vácuo, com temperatura controlada variando de ambiente até cerca de 1000 graus. Os estudos sobre as propriedades estruturais foram baseados, sobretudo, em medidas de espectroscopia de espalhamento Raman com radiação de excitação na região do visível e do ultravioleta, o que possibilita a obtenção de informações mais detalhadas sobre a forma como os átomos sp2 e sp3 distribuem-se no material. Por fim, exploramos o potencial de aplicação de três tipos de carbono amorfo; tipo polimérico (PLC), tipo diamante (DLC) e tetraédrico (ta-C) como monocamadas antirefletoras para células solares de silício cristalino e comparamos com o desempenho obtido com camadas fabricadas com materiais usualmente empregados na indústria para tal aplicação. Os resultados mostraram que filmes de carbono amorfo podem ser utilizados como camada anti-refletora. Os filmes de carbono tipo polimérico apresentaram resultados muito semelhantes aos obtidos com camadas convencionais de dióxido de estanho
Abstract: In this work we designed, manufactured and characterized a Filtered Cathodic Vacuum Arc (FCVA) deposition system. This technique is usually applied in the preparation of metallic alloys and highly sp3 - hybridized amorphous carbon thin films. By using this system we prepared a series of amorphous carbon films (a-C) with high hardness (up to ~60GPa) and high concentration of sp3 C-C bonds varying the deposition energy of the C+ ions. Mechanical (hardness and intrinsic stress) and structural (Raman, RBS and gas effusion) were investigated. Another series of a-C was developed by FCVA, but using an assisted beam of Ar or Kr as a function of the ion energy. The main purpose of this work is to understand of the effects of the bombardment of an energetic ion beam on the physical properties of the films. Another study performed on hydrogenated amorphous carbon films (a-C:H) were carried out on samples deposited by plasma enhanced chemical vapor deposition (PECVD). The films were prepared with different self-bias, varying from 60 up to 550V, and different mixed atmospheres of methane and krypton gases, varying the partial pressure of krypton from 0 to 50%. Films prepared at low bias are polymeric-like (PLC), while films prepared at high bias are diamond-like (DLC). We had performed investigations on the influence of this noble gas on the structural properties of the a-C:H films and how the Kr atoms are arranged within the amorphous matrix. The distribution of Kr atoms was studied mainly by x-ray absorption on the krypton absorption K-edge. Due to the absence of EXAFS oscillations the spectra were interpreted using the XANES region, which gave us evidences of clustering of Kr atoms. The processes involved in the a-C:H nd ta-C structural transformations during the thermal annealing were analyzed by means of thermal gas effusion measurements (using a quadrupole spectrometer) in a system developed in our laboratory. Raman scattering spectroscopy measurements were carried out with excitation radiation in the visible and ultraviolet ranges. This choice is justified due to the more detailed information obtained by multiwavelength Raman spectroscopy on the distribution of sp2and sp3sites within the amorphous carbon matrix. Finally, we had evaluated the possibility of the application of three types of amorphous carbon structures, the diamond-like and polymeric-like carbon, and the ta-C as antireflective coating on crystalline silicon solar cells. We observed that all amorphous carbon structures (DLC, PLC and ta-C) increase the short-circuit current of the solar cells. In the case of PLC films, the result is comparable to that obtained with conventional antireflective coating such as tin dioxide (SnO2)
Doutorado
Física da Matéria Condensada
Doutor em Ciências
14
Oblitas, Raissa Lima de. "Avaliação da composição elementar de filmes finos de ligas metálicas depositados por Arco Catódico Filtrado em Vácuo utilizando RBS e EDS quantitativo." Universidade de São Paulo, 2016. http://www.teses.usp.br/teses/disponiveis/43/43134/tde-24102016-115435/.
Full textAbstract:
Devido à relevância de filmes finos, as técnicas que são utilizadas para produzi-los e também para caracteriza-los tem se tornado importante. Neste contexto, foram analisados filmes finos de até 100 nm, de duas ligas metálicas (cromel e alumel), obtidos a partir da deposição por plasma de Arco Catódico Filtrado em Vácuo (Filtered Cathodic Vacuum Arc - FCVA). O objetivo deste projeto foi avaliar a similaridade em composição elementar entre os materiais utilizados para deposição, que operam como cátodos, e os filmes finos depositados, a partir de medições obtidas pela técnica de microanálise quantitativa Energy Dispersive Spectroscopy (EDS). Para comparação entre resultados e apreciação de compatibilidade, foi realizada avaliação estatística considerando o Teste t, no qual a estatística do teste é dada pela Distribuição t de Student, adotando nível de significância de 5%. Os valores obtidos por EDS Quantitativo para os cátodos foram de (em wt%) (90,3 ± 0,5)% de Ni e (9,72 ± 0,19)% de Cr para o cromel e (95,1 ± 0,8)% de Ni, (2,02 ± 0,14)% de Mn, (1,65 ± 0,04)% de Si e (1,15 ± 0,05)% de Al para o alumel. Já para os filmes finos, foram de (90,2 ± 0,5)% de Ni e (9,8 ± 0,5)% de Cr para o cromel e (95,2 ± 0,4)% de Ni, (2,8 ± 0,4)% de Mn, (0,77 ± 0,17)% de Si e (1,08 ± 0,09)% de Al para o Alumel, ambos apresentando compatibilidade com as medidas por Rutherford Backscattering Spectrometry (RBS) - técnica comumente utilizada para este tipo de espécime. Verificou-se que a composição elementar do filme fino de cromel não apresentou diferença significativa com o cátodo da mesma liga. Entretanto, para o filme fino de alumel, houve evidências de diferença significativa com relação ao cátodo, apontada pelo elemento silício.Due the relevance of thin films, the techniques used to produce and also to characterize them has become important. In this context, it was analyzed thin films up to 100 nm of two alloys (Chromel and Alumel) obtained by plasma deposition using Filtered Cathodic Vacuum Arc (FCVA). The objective of this project was to evaluate the similarity in elemental concentration of the materials used for deposition, which act as cathodes, and the deposited thin films, through measurements obtained by quantitative microanalysis technique Energy Dispersive Spectroscopy (EDS). In order to compare results and compatibility assessment was performed statistical analysis considering the t-test in which the test statistic is given by the Student\'s t - distribution, adopting a significance level of 5%. The values obtained by Quantitative EDS for the cathodes were (in wt%) (90.3 ± 0.5)% of Ni and (9.72 ± 0.19)% of Cr for the Chromel and (95.1 ± 0.8)% of Ni, (2.02 ± 0.14)% of Mn, (1.65 ± 0.04)% of Si and (1.15 ± 0.05)% of Al for the Alumel. As for the thin films, they were (90.2 ± 0.5)% of Ni and (9.8 ± 0.5)% of Cr for the Chromel and (95.2 ± 0.4)% of Ni, (2.8 ± 0.4)% of Mn, (0.77 ± 0.17)% of Si and (1.08 ± 0.09)% for Al Alumel, both featuring compatibility with the measures by Rutherford Backscattering Spectrometry (RBS) - technique commonly used for this type of specimen. It was verified that the elemental concentration of the thin film of Chromel presented no significant difference with the cathode of the same alloy. However, for the Alumel thin film, there was evidence of a significant difference with respect to the cathode, appointed by element Silicon.
15
Oates, T. W. H. "Metal plasma immersion ion implantation and deposition using polymer substrates." Thesis, The University of Sydney, 2003. http://hdl.handle.net/2123/571.
Full textAbstract:
This thesis investigates the application of plasma immersion ion implantation (PIII) to polymers. PIII requires that a high negative potential be applied to the surface of the material while it is immersed in a plasma. This presents a problem for insulating materials such as polymers, since the implanting ions carry charge to the surface, resulting in a charge accumulation that effectively neutralises the applied potential. This causes the plasma sheath at the surface to collapse a short time after the potential is applied. Measurements of the sheath dynamics, including the collapsing sheath, are performed using an electric probe. The results are compared to theoretical models of the plasma sheath based on the Child-Langmuir law for high voltage sheaths. The theoretical model predicts well the sheath dynamics for conductive substrates. For insulating substrates the model can account for the experimental observations if the secondary electron coefficient is modified, justified on the basis of the poly-energetic nature of the implanting ions. If a conductive film is applied to the insulator surface the problem of charge accumulation can be avoided without compromising the effectiveness of PIII. The requirement for the film is that it be conductive, yet transparent to the incident ions. Experimental results are presented which confirm the effectiveness of the method. Theoretical estimates of the surface potential show that a film of the order of 5nm thickness can effectively circumvent the charge accumulation problem. Efforts to produce and characterise such a film form the final two chapters of this thesis. The optimal thickness is determined to be near the percolation threshold, where a marked increase in conductivity occurs. Spectroscopic ellipsometry is shown to be an excellent method to determine the film thickness and percolation threshold non-invasively. Throughout this work cathodic vacuum arcs are used to deposit thin films and as a source of metal plasmas. The design and construction of a pulsed cathodic vacuum arc forms a significant part of this thesis. Investigations of the cathode spots and power supply requirements are presented.
16
Oates, T. W. H. "Metal plasma immersion ion implantation and deposition using polymer substrates." University of Sydney. Physics, 2003. http://hdl.handle.net/2123/571.
Full textAbstract:
This thesis investigates the application of plasma immersion ion implantation (PIII) to polymers. PIII requires that a high negative potential be applied to the surface of the material while it is immersed in a plasma. This presents a problem for insulating materials such as polymers, since the implanting ions carry charge to the surface, resulting in a charge accumulation that effectively neutralises the applied potential. This causes the plasma sheath at the surface to collapse a short time after the potential is applied. Measurements of the sheath dynamics, including the collapsing sheath, are performed using an electric probe. The results are compared to theoretical models of the plasma sheath based on the Child-Langmuir law for high voltage sheaths. The theoretical model predicts well the sheath dynamics for conductive substrates. For insulating substrates the model can account for the experimental observations if the secondary electron coefficient is modified, justified on the basis of the poly-energetic nature of the implanting ions. If a conductive film is applied to the insulator surface the problem of charge accumulation can be avoided without compromising the effectiveness of PIII. The requirement for the film is that it be conductive, yet transparent to the incident ions. Experimental results are presented which confirm the effectiveness of the method. Theoretical estimates of the surface potential show that a film of the order of 5nm thickness can effectively circumvent the charge accumulation problem. Efforts to produce and characterise such a film form the final two chapters of this thesis. The optimal thickness is determined to be near the percolation threshold, where a marked increase in conductivity occurs. Spectroscopic ellipsometry is shown to be an excellent method to determine the film thickness and percolation threshold non-invasively. Throughout this work cathodic vacuum arcs are used to deposit thin films and as a source of metal plasmas. The design and construction of a pulsed cathodic vacuum arc forms a significant part of this thesis. Investigations of the cathode spots and power supply requirements are presented.
17
Kuhakan, J., M. Medhisuwakul, and L. D. Yu. "Filtered Cathodic Vacuum Arc Deposition of Porous and Nanostructured Carbon and Hybrid C-Mo Thin Films for Fuel Cell Membranes." Thesis, Sumy State University, 2012. http://essuir.sumdu.edu.ua/handle/123456789/34867.
Full textAbstract:
In our proton exchange membrane (PEM) fuel cells, the electrolyte is a catalyst platinum (Pt) coated
nafion membrane. In order to increase the electrochemically active catalyst area to enhance the cell
performance but without sacrificing the electrical conductivity of the membrane, carbon thin films were
deposited onto the membrane by using the filtered cathodic vacuum arc deposition (FCVAD) technique.
With varying the deposition conditions, it was possible to form porous carbon films and nanoisland and
nanorod structure surface which increased the catalyst area when a higher He working gas pressure and a
low number of pulses were used. Based on this result, hybrid C-Mo thin films were deposited for further
enhancing the Pt catalytic effect. Under the varied deposition conditions, the surface morphology and C
and Mo grain sizes of the hybrid thin films were measured and their relations with the catalytic
performance were studied.
When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/34867
18
Taylor, Matthew Bruce, and matthew taylor@rmit edu au. "A Study of Aluminium Nitride and Titanium Vanadium Nitride Thin Films." RMIT University. Applied Science, 2007. http://adt.lib.rmit.edu.au/adt/public/adt-VIT20080529.151820.
Full textAbstract:
Thin film coatings are used to improve the properties of components and products in such diverse areas as tool coatings, wear resistant biological coatings, miniature integrated electronics, micro-mechanical systems and coatings for optical devices. This thesis focuses on understanding the development of intrinsic stress and microstructure in coatings of the technologically important materials of aluminium nitride (AlN) and titanium vanadium nitride (TiVN) deposited by filtered cathodic arc deposition. Thin films of AlN are fabricated under a variety of substrate bias regimes and at different deposition rates. Constant substrate bias was found to have a significant effect on the stress and microstructure of AlN thin films. At low bias voltages, films form with low stress and no preferred orientation. At a bias voltage of -200 V, the films exhibited the highest compressive stress and contained crystals preferentially oriented with their c axis in the plane of the film. At the highest bias of -350 V, the film forms with low stress yet continue to contain crystallites with their c axis constrained to lie in the plane of the film. These microstructure changes with bias are explained in terms of an energy minimisation model. The application of a pulsed high voltage bias to a substrate was found to have a strong effect on the reduction of intrinsic stress within AlN thin films. A model has been formulated that predicts the stress in terms of the applied voltage and pulsing rate, in terms of treated volumes known as thermal spikes. The greater the bias voltage and the higher the pulse rate, the greater the reduction in intrinsic stress. At high pulsing and bias rates, a strong preference for the c axis to align perpendicular to the substrate is seen. This observation is explained by dynamical effects of the incident ions on the growing film, encouraging channelling and preferential sputtering. For the first time, the effect of the rate of growth on AlN films deposited with high voltage pulsed bias was investigated and found to significantly change the stress and microstructure. The formation of films with highly tensile stress, highly compressive stress and nano-composites of AlN films containing Al clusters were seen. These observations are explained in terms of four distinct growth regions. At low rates, surface diffusion and shadowing causes highly porous structures with tensile stress; increased rates produced Al rich films of low stress; increasing the growth rate further led to a dense AlN film under compressive stress and the highest rates produce dense, low stress, AlN due to increased levels of thermal annealing. Finally this thesis analyses the feasibility of forming ternary alloys of high quality TiVN thin films using a dual cathode filtered cathodic arc. The synthesised films show exceptional hardness (greater than either titanium nitride or vanadium nitride), excellent mixing of the three elements and interesting optical properties. An optimum concentration of 23% V content was found to give the highest stress and hardness.
19
Araujo, Juliano Avelar. "Obtenção e caracterização microestrutural e química de recobrimentos multicamadas de NbN/CrN para aplicações tribológicas pelo processo de deposição física de vapor." Universidade de São Paulo, 2016. http://www.teses.usp.br/teses/disponiveis/3/3133/tde-08122016-080902/.
Full textAbstract:
O presente trabalho tem como objetivo contribuir para o conhecimento da morfologia, microestrutura e modulação composicional (perfil da composição química) de recobrimentos NbN/CrN multicamadas nanoestruturados com diferentes periodicidades (entre 4 e 20 nm) depositado por PVD pela técnica de arco catódico. Foi alcançada espessura total do recobrimento de 30 ?m mantendo-se a homogeneidade da periodicidade ao longo de toda a espessura. Análises de difração de Raios-X, aliadas a modelamento computacional (difração dinâmica), e análise de microscopia eletrônica de transmissão (MET), permitiram a determinação da periodicidade das multicamadas e a espessura das camadas individuais de NbN e CrN e análise qualitativa da coerência entre as camadas. O modo de varredura (SMET) acoplado com espectroscopia de perda de energia de elétrons (EELS), permitiu medir a variação da composição química ao longo das nano-camadas individuais. A análise por EELS mostrou que, mesmo para a menor periodicidade estudada - 4nm, não há eliminação da modulação composicional. Assim, um modelo de Análise de Elementos Finitos (FEA) foi utilizado para avaliar a componente das tensões residuais intrínsecas ao longo das multicamadas, alimentado com o cáculo da deformação do parâmetro de rede, que pela Lei de Vergards varia em função da modulação química, ao longo das camadas de NbN e CrN. A microindentação instrumentada e o teste de riscamento mostraram aumento de dureza e maior resistência ao risco com a redução da periodicidade das multicamadas nanoestruturadas de NbN/CrN. O cruzamento dos resultados das diversas técnicas empregadas permitiu análise detalhada da estrutura e morfologia destes recobrimentos e a influência das periodicidades na modulação química das camadas individuais, possibilitando o desenvolvimento de um modelo qualitativo. Este aprendizado irá permitir a deposição de recobrimentos multicamadas nanoestruturados com melhor controle das propriedades mecânicas objetivadas em função da aplicação final do produto.The present work aims at contributing to the knowledge, microstructure and compositional modulation (Chemical composition profile) of NbN/CrN multilayer nanostructured coatings with different periodicities (between 4 and 20nm) deposited by cathodic arc technique. It was reached a total coating thickness of 30 ?m preserving the periodicity homogeneity along the thickness. X-Ray Diffraction analisys, combined with computational modeling (dinamic diffraction) and Transmission Eletron Microscopy analysis (TEM), allowed the multilayer periodicity determination, the individual NbN and CrN layer thicknesses as well as the qualitative analysis of coherency among layers. The scanning mode (STEM) combined with Electron Energy Loss Spectroscopy (EELS), allowed the measurement of the chemical composition variation along the individual nanolayers. The EELS analysis showed that, even for the lowest periodicity studied - 4nm, there is no elimination of the compositional modulation. Thus, the Finite Element Analysis model (FEA) was used to evaluate the intrinsic residual stress component along the multilayers, fed with the lattice parameter deformation calculation, which, by Vegards Law varies as a function of the chemical modulation, along the NbN and CrN layers. The instrumented microindentation and the Scratch test showed hardness increase and higher scratch resistance as periodicity decreases on the nanostructured multilayer of NbN/CrN. The cross-linking data of the several techniques employed enabled a detailed analysis of the structure and morphology of such coatings and the influence of the periodicities on the individual layer chemical modulation, allowing the development of a qualitative model. This learning will allow multilayer nanostructured coatings deposition with a better control of desired mechanical properties as a function of the final product application.
20
Atiser, Adil [Verfasser]. "Influence of the plasma chemistry and energetics of an Al cathodic arc discharge on the composition and structure of Alumina thin films / Adil Atiser." Aachen : Shaker, 2011. http://d-nb.info/1080765220/34.
Full text
21
Weng, Ko-Wei, and 翁克偉. "System and Process Correlation in Cathodic Arc Evaporation." Thesis, 2002. http://ndltd.ncl.edu.tw/handle/79222023800694336652.
Full textAbstract:
博士國立中興大學
材料工程學研究所
90
The research purpose was to develop the new process and the novel system configuration that attributed to reduction and promoted the formation of microdroplets, improvement the interface connection strength leaded to the enhancement of adhesion properties and anti-wear performance, and increased the flexibility of coating system, to extend the application of cathodic arc deposition. The combination of the process and the system design in our study can be categorized into four groups, reformation cathodic arc source, cathodic arc activated deposition (CAAD), current-modulating arc source, and the hybrid PVD, which included the filter arc deposition (FAD) source and an metal plasma ion implantation (MPII) source. Reformation cathodic arc source, which is based on the original type of the multi-arc cathodic source using the extend shield to prevent the droplets ejection with low angle and the gas feeding path locate behind the cathode that will dramatically increase the flexibility and stability of the system and avoid the extinguished of the arc spot. We evaluated chromium carbide coatings synthesized by reformation cathodic arc evaporation for potential applications in forming and molding operations. The results indicated that Cr3C2 outperforms hard chrome plating and CrN coatings in measures of sliding wear resistance and ease of mold release. Cathodic arc activated deposition (CAAD); Diamond-like carbon (DLC) films were synthesized using the CAAD process. Energetic Cr plasma with intensive ion energy activates the decomposition of C2H2 and deposits an amorphous carbon film containing a mixture of sp2 and sp3 carbon-bond structures, which result in a DLC film of 3824 Hv(25g) microhardness. The Cr metal inclusion and ion bombardment aid in stress release and the increase of film density. The CAAD-synthesized DLC film possesses apparent adhesion strength of 55 N. The pin-on-disk wear test demonstrates an excellent wear performance of 3000-m of wear endurance tested under 10 N at 0.3 m/s. Current-modulating arc source; conventional cathodic arc evaporation (CAE) suffers from macroparticle contamination and excessive heat load on the substrates, resulting from the energetic ion flux emitted from hot cathode spots. Herein, a low frequency current-modulating controller was used to modulate the arc currents in high-low cycles. The deposition is conducted primarily during the high-current cycles, while a minimum background-current is maintained to sustain the arc discharge. Cathodes can be operated at currents lower than in the continuous CAE process. Macropraticle ejection is reduced substantially due to the effective cathode cooling. The residual stress of CrN coatings is reduced from 3.8 GPa to 3.0 GPa in a current-modulating CAE process. Results of this system design provide a practical and effective way to operate CAE process with reduced substrate temperature, reduced coating roughness, and improved film adhesion. The Hybrid PVD designs; CrN coatings were deposited using a hybrid PVD technique including the FAD and MPII sources. MPII is a plasma-based ion implantation process based on an accelerated (10-80 keV) vacuum arc metal plasma source with multiple charge states. At the initial coating stage, low dosage of MPII ion flux helps in surface activation and ion mixing. Subsequently, surface treatments of the as-deposited CrN coating with implantation of metal and/or carbon ions result in densification and phase transformation at a near-surface regime. Wear resistance, corrosion resistance, fatigue strength, and mold-releasing mechanism are significantly improved. In sum, we can adjust system and process design appropriately according to the requisitions and synthesize the optimum coatings.
22
Lin, Yi-Hung, and 林毅弘. "Wear Behavior of Cathodic Arc Plasma Deposited Titanium Nitride." Thesis, 1996. http://ndltd.ncl.edu.tw/handle/00681412826478635949.
Full textAbstract:
碩士逢甲大學
材料科學研究所
84
Recent investigation on the current status of hard coatings shows that cathodic arc plasma (CAP) deposition is the most widely used process for tool application while titanium nitride (TiN) is the most common material.Great advantages can be obtained from CAP coating that plenty of reports about wear behavior were appeared. However, these reports emphasized the performance of tool materials with and without CAP coating. A systematical study on the coating parameters that affecting the wear behavior is lake. In this study, wear test were carried out by using Ball-on- Disk sliding wear test which is the closest method to real metal forming. Substrate bias and nitrogen pressure, which are the most important coating parameters for arc-evaporation, and the substrate bias during the initial etching stage ( titanium ion bombardment ) were changed to evaluate the influence on wear performance. Experimental results showed that the amounts and sizes of macroparticles, film thickness, hardness, adhesion and microstructure of TiN film were all affected by coating parameters. The deposited films were observed with a decrease in the amount and size of macroparticles, deposition rate, hardness and adhesion when increasing substrate bias. With increasing substrate bias the TiN(111) preferred orientation was replaced by TiN(220). A decrease in the amount of macroparticles and voids with increasing nitrogen pressure, while the deposition rate and adhesion increased, the preferred orientation changed to TiN(111). During the etching stage, the higher substrate bias suffered a higher ion flux and the subsequent higher substrate temperature, which flattened the macroparticles in the deposited film and the higher adhesion strength. The wear test showed that TiN films whatever deposited exhibited a low wear loss.Some appeared a negative values. The films deposited at low substrate bias with higher density in macroparticles caused a mass transfer of the counter material and the negative value in wear loss was obtained. The higher friction coefficient of the TiN film obtained at high substrate bias was dominantly attributed to the contribution of gouging wear. The wear modes observed were abrasion wear, gouging wear, brinelling and adhesive wear in mass transfer mode.The decreased friction coefficient with increasing nitrogen pressure should then be attributed to a decreased amount of macroparticles on the surface of deposited films and wear loss gradually changed to a negative value,owing to mass transfer. The wear modes observed were composed of abrasion wear of the counter material against the deposited films and substrate, gouging wear, the spalling of deposited films and adhesive wear in mass transfer mode.
23
Kuo, Jui-Kang, and 郭瑞剛. "Investigation of DLC-film wear by cathodic arc deposition." Thesis, 1999. http://ndltd.ncl.edu.tw/handle/55110576322533352403.
Full textAbstract:
碩士華梵大學
機電工程研究所
87
ABSTRACT This paper describes the characteristics of the DLC film evaporated by graphite cathodic arc method and it’s tribological behavior in reciprocating dry sliding with 4032 Al-alloy, 52100 steel and Al2O3. In addition, the wear mechanisms of the film and counterbody are discussed. The influence of process parameter and loading on wear is also studied. The result shows that the DLC film obtained under low Ar evaporation condition has a better performance on hardness. Besides, the thickness of the DLC film increases with the increase of negative bias voltage on substrate under low Ar flow condition during evaporation. The Raman spectrum analysis shows that the DLC film has wide and flat spectrum region at the wavelength of 1560 cm-1 of G band and 1350 cm-1 of D band. It means that the DLC film has much graphite-like SP2 bonding and a little amorphous DLC SP3 bonding. The wear-resistance of the DLC film increases with the decrease of the Ar flow during evaporation. Furthermore, the 52100 steel counterbody during sliding wear exhibits a best wear performance, which is due to high hardness and good surface roughness. The main wear mechanisms are adhesion wear and fatigue wear for 4032 Al alloy and 52100 steel and brittle fracture and fatigue wear for Al2O3 while the principal wear mechanisms of DLC film are abrasive wear and fatigue wear.
24
Chang, Yen-Shuo, and 張晏碩. "Cathodic arc evaporated CrAlSiN coatings with multi-cycle depositions." Thesis, 2014. http://ndltd.ncl.edu.tw/handle/01302734791497431759.
Full textAbstract:
碩士明道大學
材料科學與工程學系碩士班
102
The study used by cathode arc deposition to process nano-multi cycle of deposition CrAlSiN thin film which substrate used SUS304 and Tungsten steel. The system selected by PLATIT 80+ that is used on the industry widely. The experiment processed four different muti-cycle deposition CrAlSiN coating.The experiment was divided into two steps. First, it showed that Characteristic will change on microstructures and mechanical of muti-cycle deposition of CrAlSiN coating. The result show that the microstructures that used by Field Emission Scanning Electronic Microscope became honeycomb like morphology can be considered as CrAlN grains embedded in the SixN matrix which structure can be nano-structure. The hardness that used nanoindent increased from 41GPa of 1 cycle to 43GPa of 4 cycles with the increase of coating thickness. But the values are in error, so the results are similar of the hardness. Finally,due to CrAlSiN thin films have a high hardness, the test methods used by sandblasting test that contain dry sandblasting test 5 minutes and wet sandblasting test of 30 minutes and 60 minutes to detect the characteristic. In the sandblasting test, wet sandblasting test its roughness improving gradually. Because of the hardness of SiO2 below than CrAlSiN coating, it can be improve hardness helpfully that cathode arc deposition created shortcoming of high roughness. In the dry sandblasting test which sand used by emery and test 5 minutes, the result showed that the roughness improved significantly but the coatings ware not peeled completely. The coatings of muti-cycles of deposition of CrAlSiN had good properties in the harsh environment. Keywords: CrAlSiN, sandblasting test, hardness, roughness, mechanical propert
25
ZHANG, YONG-JIE, and 張詠傑. "Electric Magnetron Arc Source Design of Cathodic Arc Evaporation and Deposition of AlTiN Hard Coatings." Thesis, 2018. http://ndltd.ncl.edu.tw/handle/6tmswb.
Full textAbstract:
碩士國立虎尾科技大學
機械與電腦輔助工程系碩士班
106
The cathodic arc system of physical vapor deposition, because of its fast deposition rate and low cost of machine equipment, is widely used by the tool and mold industry coatings, but it has one of the biggest defects are particles and droplets deposited on the surface of the film. This defect causes the surface of the film. Decrease in luminosity and mechanical properties. Therefore, many researches have proposed improvement methods for this drawback, such as reducing cathode target current, placing a magnetic filter tube in front of the target, and avoiding the deposition of particles on the film surface by magnetic field guidance. However, both methods can lead to a decrease in the deposition rate of the thin film and reduce the production efficiency. This study proposes a new type of electromagnetic control method. Two sets of electromagnetic coils are arranged behind the target. By adjusting the electromagnetic coil and voltage, the distribution of the magnetic field on the target surface is changed, and the magnetic field is affected by the magnetic field to reduce the generation of particles and droplets. The electromagnetic control device designed in this study consists of two sets of electromagnetic coils. By adjusting the coil voltage to find the magnetic field distribution of different parameters, using a high-speed camera to take pictures of arc motion under different voltage conditions, and raising the cathode target current to 150A, observe the arc in the traditional permanent magnet control and electromagnetic control two different arc source design under the arc situation. Followed by the use of two kinds of arc sources deposited AlTiN film, the target is a pure Ti target and AlTi alloy target, observe the difference between the film surface and the mechanical properties of the two films. In this study, the plasma characteristics of the electromagnetic arc source were observed by the plasma spectroscopy (OES). The thin film microstructure was observed through a field emission electron microscope (FE-SEM) to observe the distribution of particles and droplets on the surface of the film and the cross-sectional structure. X-ray diffraction analyzer (XRD) for crystal phase analysis. Mechanical Properties The Rockwell indentation tester was used to analyze the adhesion of the film and observe the cracks. The hardness of the film was tested using the tiny Vickers indentation test base, and finally passed through a ball-on-disk tester. The wear resistance of the film was measured, and the surface profiler was used to observe the abrasion trajectory and the film surface roughness. From the experimental results, it is known that when the arc is used under the influence of the electromagnetic field, the arc is split and evenly dispersed on the target surface, and the target can be consumed on average. The deposited AlTiN thin film is showed greatly smaller surface roughness as compared to the AlTiN deposited by the conventional permanent arc source, and the surface particles and liquid are greatly reduced. The number of micro particles is reduced by 60% and the thickness increases with the same process. Since the electromagnetic arc source can change the magnetic field distribution on the target surface, it can also greatly increase the utilization of the target material.
26
謝涵嵋. "Deposition of CoCrCuFeNi Films with Cathodic Vacuum Arc Deposition Apparatus." Thesis, 2008. http://ndltd.ncl.edu.tw/handle/42247626937510788686.
Full text
27
杜禹寬. "Deposition of Al0.5CoCrCu1.5FeNi Films with Filtered Cathodic Vacuum Arc Deposition Apparatus." Thesis, 2010. http://ndltd.ncl.edu.tw/handle/12714418462452046671.
Full text
28
Chan, Mu-hsuan, and 詹慕萱. "Process and Characterization of Titanium Dioxide Coatings by Cathodic Arc Deposition." Thesis, 2006. http://ndltd.ncl.edu.tw/handle/19815625463245705135.
Full textAbstract:
碩士明道管理學院
材料暨系統工程研究所
94
Due to the energy shortage and environmental protection issues, titanium dioxide used as photocatalyst by absorbing solar energy to decompose various kinds of pollutant has been an interesting research recently. Moreover, for pure TiO2, only the ultraviolet fraction of the solar irradiation (about 5%) is active in the photoexcitation processes. Recently, many researches are working on the utilization of visible light to activate catalyst behaviors of titanium dioxide in order to expand applications in many fields. Titanium oxide (TiO2) and Copper-doped titanium oxide (TiO2/Cu) and Chromium-doped titanium oxide (TiO2/Cr) films were prepared by Cathodic Arc Deposition System in this study. Stainless steel coupons and silicon wafer are used as the substrates. The titanium oxide thin films were synthesized by introducing different partial pressure of oxygen gas. Following the deposition process, post-treatment of the as-deposited specimens was conducted by heating up to 450oC for 3 hours. The results show that XRD diffraction patterns reveal titanium oxide films with anatase phase, however, for the specimens with TiO2/Cr and TiO2/Cu structures exhibit amorphous structure. After heat treatment at 450oC by 3 hour, TiO2 films contained anatase and rutile coexisted phases. On the other hand, heat-treated TiO2/Cr and TiO2/Cu films also gave anatase and rutile coexisted phases. The photocatalytic properties, under UV and visible lights, were characterized by degradation of methylene blue in aqueous solution and the water-contact angle measurement. The result revealed that, for the titanium oxide films, the contact angle decrease to 0° under UV light within 25 minutes and the best degradation rate of methylene blue was comparable to the other films. For the TiO2/Cr films with post heat treatment, the water contact-angle was characterized by decreasing to 0° within 15 minutes under visible illumination. However, the TiO2/Cu exhibits less photocatalytic properties by degradation of methylene blue and the water contact-angle measurement. UV-Visible spectroscope was used to observe the film absorption edge under UV and visible lights. The absorption edges of TiO2 films are 376nm. The absorption edges of TiO2/Cu and TiO2/Cr films are shifted 500nm~570nm by UV-Visible spectroscope.
29
Hsieh, Chi-Chung, and 謝啟中. "Simulation Study of Plasma Characteristics for Magnetic Filter Cathodic Arc System." Thesis, 2006. http://ndltd.ncl.edu.tw/handle/94999126832983257920.
Full textAbstract:
碩士國立成功大學
光電科學與工程研究所
94
Abstract In this simulation study,we use the PIC-model plasma simulation program OOPIC Pro as a tool for related research. the research is about the effects on system under the variation of the generating rate of the working gas、the type of axial magnetic field、input voltage on substrate、input voltage on solenoid、the type of baffles in the solenoid...etc. The research is helpful in following three aspects― a) Improve the comprehension of plasma characteristics. b) It is helpful to the further design of manufacture process. c) Constructing a platform of simulation study for further design and research in the characteristics of plasma under the electromagnetic field circumstance.
30
Jiang, Luh-Feng, and 江祿峰. "The Study of Hard Films by Cathodic Arc Plasma Deposition Method." Thesis, 1995. http://ndltd.ncl.edu.tw/handle/67007795681131096079.
Full textAbstract:
碩士國立臺灣科技大學
化學工程研究所
83
In tihis thesis, we explored the application of cathodic arc plasma technique in the deposition of (i)diamond-like film, (ii) hard films such as TiN, TiC and TiCN. Diamond-like film was deposited using high density graphite (1.92 g/cm3) as target and nitrogen as arc-sustaining gas. Film structure was influenced by parameters like arc current, background gas pressure and substrate bias voltage. Optimum condition was achieved as 35-40 ampere arc current, 0.01 torr background pressure, and -300 to -500 volt bias voltage. TiN, TiC and TiCN Films were deposited using Ti metal as target, and the mixture of N2 with CH4 or C2H2 as sustaining gas. From X- ray diffraction data, we found that TiN was preferentially grown in（111）direction, while TiC was in（220 ） direction, and higher crystallinity was achieved using CH4 as compared to C2H2. In conclusion, applicability of cathodic arc plasma technique in depositing both diamond- like film and Ti-based hard films was demonstrated, film structure and property were correlated to deposition parameters.
31
Wu, Tzu-Ming, and 吳澤民. "Synthesis and characterization of Titanium carbide by Filter Cathodic Arc Plasma." Thesis, 2007. http://ndltd.ncl.edu.tw/handle/46960769912778923515.
Full textAbstract:
碩士中國文化大學
材料科學與奈米科技研究所
95
In this study, we use the Filter Cathodic Vacuum Arc Deposition System. Due to have Filter System, it can be improved to filter macro-particle. At surface roughness, plates the film adhering and has great improvement with the hole rate on the surface, and plate the film structure do not change, because hole rate reduce to dwindle with particle, it make to speed reduce of plate film. The Cathodic Arc will have film to be density high, adhesive force strong, fast to deposit speed, advantage such as being good of the homogeneity, and by controlling different bias voltage and flow of gas will get different thickness of TiC film. The process can reduce the increase of the time and cost, and it can depend on different application and demand even more, equally match different kind and composition of plating film. The experiment discusses the TiC film, and observes micro-structure and characteristic of the interface. Utilize the X-Rays Diffraction analysis gets it under the regular flowing rate. If bias voltage is bigger, TiC intensity will be obvious. We used SEM to observe and discover when change C2H2 flow rate finding the increase with the flow, deposits speed would be slow down. We find the regular flow, and bias voltage -400V in Raman spectrum, the result is the best. XPS can observe the rising with the bias voltage of substrate, the binding energy of TiC film changes to low energy unanimously. The c-c bond becomes many gradually; cause the film of hardness to improve at the same time. At AFM observes and receives increasing C2H2 flow under the regular bias voltage. The roughness of surface of the film will be improved thereupon.
32
HSU, PIN-HUA, and 徐品華. "Process of CrAl(O,N) Oxide Coatings by Cathodic Arc Deposition." Thesis, 2016. http://ndltd.ncl.edu.tw/handle/77641476087901471408.
Full textAbstract:
碩士明道大學
材料與能源工程學系碩士班
104
In this study, cathodic arc deposition and Cr, Cr30Al70 dual targets were used to synthesize the CrN, CrAlN, CrAlON and CrAl coatings at low temperature. Except the CrAl coating, the other coatings possess similar surface roughness, however, many submicro droplets were sprayed on the coating surface due to the Al element with low melting temperature mixed in the target material. CrAlON coating decomposed of the Cr2O3, Al2O3 and CrN phases which present corundum structure. Vicker’s hardness test showed the highest hardness of Hv10g – 3180 for the CrAlN coating. The polarization test showed the CrAlN and CrAlON coatings possessed the best corrosion resistance in 1M H2SO4. The oxidation resistance of the CrAlON coating was up to 1000oC due to the Cr2O3, Al2O3 and CrN phases coexisted in the coating. The results will be the potential application of injection machine parts, IC molding die applications.
33
翁克偉. "Microstructure of TiNi thin films prepared by cathodic arc plasma ion plating." Thesis, 1998. http://ndltd.ncl.edu.tw/handle/85831609429632063451.
Full textAbstract:
碩士逢甲大學
材料科學研究所
86
TiNi intermetallic compound with pseudoelasticity and erosion and corrosion resistance could be potentially applied to sliding wear, rolling fatigue, corrosion, or erosion environment. The TiNi is however expensive. Thin film coating of TiNi will enable the usage of low cost materials such as polain steel to the above application. Thus a study on the TiNI coating is required. A cathodic arc plasma ion plating process was used to deopsit TiNi films on plain steel. In the exoperimental, plain steel were use as substrates. Substrates bias voltage, working pressure and target composition were changed to reveal the effect on microstructure of the deposited films. Observations of the surface topography and cross sectional morphology on the deposited films were carried out by suing SEM. XRD and TEM were used to characterize microstructure. EDS was used to identify elemental composition of the deposited films. DSC measurement was used to obtain the transformation temperature of the deposited films. Experimental results show that the crystallinity of deposited films were strongly dependent upon coating paraceters. Dre to the higher migration ability of surface adatoms, high substrate bias voltage facilitate the higher crystallinity of the deposited films. Growth rate of the deposited films decreases from 20 μm/hr to 4 μm/hr when negatively bias substrate voltage increases from 0 V to 800 V. By evaluating working pressures, The better crystallinity of the deposited film with lower groeth rate 6μm/hr can be obtained when working pressure decrease from 400 mtorr to 200 mtorr. This again benefit from the higher adatom mobility when working pressure is low. However, the lower working pressure can caused frequent are decease and fail to grow film. By adjusting the target composition, positive dependence on the film composition is found. However, the deposited films suffer a decrease in Ti composition of 5~10 at%. This may be attributed to the low atomic weight and high chemical activity of titanium atom which may be either easily scattered or oxidized during flight to the substrates. The crystallinity of the deposited film is also found to be higher when the Ti-rich target composition in used. This may caused by the back sputtering effect when the growing films submitted by a rich nickel ionbombardment. The measure phases in the deposited film characterized by TEM are B2 and B19 with minor phase TiNi3 when target composition Ti50Ni50 is used. It turns out to be Ti2Ni as the minor phase when target composition Ti60Ni40 is used. DSC measurement shows that the transformation temperaturs of the deposited film increase from 193.6K to 276K when target composition increase from Ti 50% to Ti 60% . This is far below the bulk TiNi reported and can be attributed to the high defect structure of the deposited films. As a result of this study, well defined crystallinity and adjustable composition of the deposited films can be obtained by suitable controll of the coating parameters.
34
Yeh, Chien-hsuan, and 葉建弦. "Deposition of Yttria-Stabilized Zirconia Film Using Cathodic Arc Plasma Ion Plating." Thesis, 2004. http://ndltd.ncl.edu.tw/handle/23832370439881588772.
Full textAbstract:
碩士逢甲大學
材料科學所
92
Zirconia ceramic exhibits excellent fracture toughness, high ion conductivity, low electron conductivity, and low thermal conductivity properties. Therefore, YSZ films have been widely applied to be the solid electrolyte of fuel cell, oxygen sensor, wear protective coatings and the thermal barrier coatings of high temperature power-generator components. Cathodic arc plasma ion plating (CAP) process is a promising coating technology which has high deposition rate, high atomic ionization and excellent film adhesion. In this study, the CAP process with Zr84Y16 cathode was used to deposit the YSZ film onto the Ni-base superalloy substrate. Substrate bias, working pressure and substrate to cathode distance were changed to reveal their effect on film microstructure. The results show that the major phases of YSZ films were (111) oriented cubic and tetragonal structure. The crystallinity of the films increased with the enhancing negative substrate bias voltage which cause intensified ion bombardment on the film surface and facilitate the migration of adatoms to form crystalline of films. All films deposited in this study exhibits dense columnar structure. At lower substrate bias voltage, the surface morphology of YSZ films is rougher and consists of lots of facet protrusions. The macrodroplets would become flatter and the film surface would be smoother while the substrate bias voltage was increased. The film growth rates are 19 �慆/h and 18 �慆/h at the working distances 12 cm and 18 cm, respectively. The film composition is 2.15~2.99 at% Y, 17.22~18.76 at% Zr and 78.73~79.83 at% O. And the adhesion strength between YSZ film and substrate is poor because of the high internal stress in YSZ films and many microparticles coexisting in the films. Campared with other deposition processes, Cathodic arc plasma ion plating process can be used to prepare high crystallinity and dense YSZ films. The growth rate of CAP-YSZ films is higher than sputter deposition process in ten-fold demonstrating the successful deposit ion of YSZ films using CAP process could be a useful method for preparation of solid electrolyte, thermal barrier coatings and the like.
35
Hsueh, Hsu-Hung, and 薛旭宏. "High Hardness Al-Ti-O-N Coating Deposited by cathodic Arc Evaporation." Thesis, 2008. http://ndltd.ncl.edu.tw/handle/46761235970646268310.
Full textAbstract:
碩士明道大學
材料暨系統工程研究所
96
The development of wear resistant coatings for cutting applications is rapidly progressing. The structure, mechanical properties, and wear performance of arc evaporated Al-Ti-O-N coatings have been investigated in this study. The various Al-Ti-O-N coatings were synthesized by using an AlTi target and varied O2/(O2+N2) gas flow between 0 to 16%. The coating structure was designed with tripled layers in which were composed of CrN as interlayer,CrN/AlTiN multi-layer and AlTiON top layer. The structural of the various coatings were analyzed using SEM, AFM, XRD, and XPS. The mechanical properties were investigated using nanoindentation and the wear behaviors were analysed by pin-on-disk tribometer. The coatings performances in wear tests were evaluated against WC ball in dry and wet conditions, respectively. It is shown that the addition of oxygen into the arc deposition process leads to the formation of a dual phase structure including oxides and nitrides in the AlTiON. The addition of oxygen increases the ductility of the coatings, which improves the performances in wear tests. At high levels of oxygen, however, the performance is dramatically reduced as a result of increased crater wear.
36
黃思嘉. "Growth of single-crystal aluminum nanorods by filtered cathodic arc discharge system." Thesis, 2003. http://ndltd.ncl.edu.tw/handle/53514879343535583335.
Full textAbstract:
碩士國立清華大學
材料科學工程學系
91
Abstract Single phase aluminum nanorods was fabricated by filtered cathodic arc deposition system. SEM showed that typical nanorods are around 100 — 200 nm in diameter and several hundred nm in length. High resolution transmission electron microscopy with electron diffraction study revealed that the structures are of single crystalline. The EDS confirmed that the nanorods contain only the element of aluminum. In this method we are able to synthesize aluminum nanorods directly, quickly (few minutes), and in large-scale (8” wafer). No templates and catalysts was applied and uniformly distributed aluminum nanorods over the whole substrate(33 cm2). The distributed aluminum nanorods have density of around 108/cm2-109/cm2. On the other hand, when the aluminum thin film(without aluminum nanorods on the film) was annealed, aluminum whiskers on the aluminum film would form. It is generally accepted that compressive stresses in the film are the cause of whisker growth.
37
古永延. "Tribological performance study of TiCxNy coatings deposited by cathodic arc ion plating technology." Thesis, 1997. http://ndltd.ncl.edu.tw/handle/52670915645296376310.
Full text
38
Wu, Chung Wei, and 吳仲崴. "Sysnthesis and characterizations of TiSi(N,O) films by cathodic arc plasma evaporation." Thesis, 2009. http://ndltd.ncl.edu.tw/handle/t5w58v.
Full textAbstract:
碩士明道大學
材料科學與工程學系碩士班
97
In this study, the TiSi(N,O) coating on tungsten carbide and S304 steel substrates were deposited using cathodic arc plasma deposition process. This coating designed and implemented a compound interface, comprising a series of Ti, TiN, and TiSiN interlayers deposited in a continuous structure, between the TiSi(N,O) top coating and tungsten carbide substrate. The TiSi(N,O) composition was varied by changing the oxygen flow rate during the coating process. The phase structure, chemical composition, and morphology of coatings were observed by utilizing X-ray diffractometer, Auger electron spectrometer and scanning electron microscope. The corrosion behaviors of the coatings were studied in aerated 3.5 wt.% NaCl aqueous solutions by interpretation of the electrochemical anodic polarization curves. The tribological performance of TiSi(N,O) coatings was evaluated using a ball-on-disk tribometer. The results showed that the corrosion resistance of TiSi(N,O) coatings was deteriorated than that of TiSiN coating. However, the TiSi(N,O) coatings exhibits lower friction coefficient than that of TiSiN coatings.
39
Chen, Wu-Wen, and 陳裕文. "Synthesis and characterizations of Ti-Si-C film by cathodic arc plasma evaporation." Thesis, 2009. http://ndltd.ncl.edu.tw/handle/66d4ub.
Full textAbstract:
碩士明道大學
材料科學與工程學系碩士班
97
In this work, Ti-Si-C coatings were produced by reactive cathodic arc deposition from TiSi alloy target at different C2H2 flow ratios onto cemented carbide substrates. The composition of the films was investigated by Electron Probe Micro-Analysis (EPMA), while structure was characterized using a X-ray diffractometer. The hardness and residual stress were studied using depth-sensing indentation and substrate deflection measurements (using Stoney's equation), respectively. Plots of carbon contents as a function of the C2H2 flow ratios showed the structure and mechanical properties of the coatings depend strongly on their carbon content. Experimental results showed that both the carbon content increases and grain size decrease with the increase of the C2H2 flow ratios, results in hardness increased. This indicates that higher hardness can be enhanced by increasing the C2H2 flow ratios. Structural analysis revealed the possibility of the coexistence of different phases in the prepared films, namely a sub-stoichiometric fcc NaCl-type TiC structure, a Ti metallic phase (α-Ti or β-Ti), and silicon carbide in the amorphous phase
40
Chiu, Li-Yen, and 邱立言. "Structure and mechanical properties of AlSiN/TiN multilayer deposited by cathodic arc evaporation." Thesis, 2011. http://ndltd.ncl.edu.tw/handle/47608317571405371385.
Full textAbstract:
碩士明道大學
材料科學與工程學系碩士班
99
In this thesis, the bigger particle defect of AlSiN/TiN multilayer which was coated by using Cathode Arc Deposition (CAE) systems was studied. The rotation speed of the sample holder on process was changed when AlSiN/TiN multilayer was coated and the mechanical property and structure of multilayer ware measured. The advantage of CAE system is that it can use alloy target and it owns better uniformity, stronger adhesion and higher deposition rate. The advantage of multilayer films is not only that it combines the characteristics of each single film, also it significantly improve the hardness, adhesion loss. The mechanical properties of multilayer films are better than the one of single-layer. Multilayer film has more excellent performance; however, very few researches study the rotation speed on the coating process. Many evidences prove that the different rotation speed on the process can change adhesion wear, hardness of thin films, and indeed increase or decrease the thin film lifetime. In this study, the coating time was kept the same but the rotation speed and period number are changed. The change of mechanical structure with different period number was explored. The range of rotation speed is from 1 RPM to 16RPM. The mechanical properties such as surface hardness, adhesion and wear behavior are compared. The surfaces and cross sections of AlSiN / TiN multilayer are observed by using Scanning Electron Microscopy (SEM), Atomic Force Microscopy (AFM) and Water Contact angle. The microstructures of thin films were analyzed by using X-ray diffraction (XRD) and X-ray Photoelectron Spectroscopy (XPS). The adhesion was measured by using Rockwell Hardness Test and the Scratch Test. The hardness of films was measure by using Nanoindentation Test. The friction coefficient of film was measured by using the Wearing Test tests.
41
Chen, Wei-Chih, and 陳威池. "Synthesis and characterizations of TiSiN/TiAlN multilayer coating by cathodic arc plasma evaporation." Thesis, 2007. http://ndltd.ncl.edu.tw/handle/67638116303993904379.
Full textAbstract:
碩士明道大學
材料暨系統工程研究所
95
In this work, nano-multilayer TiSiN/TiAlN films have been deposited on WC-Co substrates by using TiSi (80:20 at.%) and TiAl (50:50 at.%) alloy target on a dual cathodic arc plasma evaporation system. The influences of bias voltages, holder speed rotation and reaction gas pressure varied on the microstructure, adhesion strength and tribological properties of the films were investigated. Scanning electron microscopy (SEM), X-ray diffraction (XRD) techniques were employed to analysis the microstructure, grain size, residual stress and bi-layer thickness. Corrosion test were used by Potentiostat to analysis the corrosion potential. Vicker’s hadrness and tribometer tester were used to measure the mechanical and tribological properties of nano-multilayer TiSiN/TiAlN thin films. The results showed that the hardness of the films ranged from 24-27 GPa, which the value is lower than both of TiAlN (29 GPa) and TiSiN (35 GPa). The coefficient of steady-state friction of the films against Cr steel ball ranged from 0.45 to 0.6, and TiSiN and TiAlN is 0.6 and 0.7, respectively. It has been found that the microstructure, adhesion strength and wear properties of the films were dependent on bias voltage, interlayer design bi-layer thickness and grain size in film structure, resulting from both improved adhesion strength and wear properties of nano-multilayer TiSiN/TiAlN coatings.
42
Tsou, Po-Yi, and 鄒柏毅. "Source current effect on properties of CrSiN hard coatings by cathodic arc deposition." Thesis, 2014. http://ndltd.ncl.edu.tw/handle/16721670734108340408.
Full textAbstract:
碩士明道大學
材料科學與工程學系碩士班
102
Cathodic arc deposition system has a feature of high ionization rate, fast deposition rate and good adhesion properties. CrSiN thin films has good mechanical and chemical properties, few researches used the pulse current to enhance the films properties with excellent features. In this study, CrSiN thin films were deposited by cathodic arc deposition system. The influences of source cathodic arc current on the microstructure, mechanical properties and chemical properties of CrSiN thin films were investigated. The characteristics of CrSiN coatings were carried out by X-ray diffraction and scanning electron microscopy to analysis the microstructure of the surface morphology, thickness and crystalline structure of CrSiN thin films. Use the abrasion test, scratch test, Rockwell indentation test, nanoindentation and roughness instrument to analysis the mechanical properties of the coatings. Corrosion tests of the coatings were also conducted to value the chemical properties. From the results of wear test, CrSiN thin films against the tungsten carbide ball showed the friction coefficient ranged from 0.3 to 0.4. The hardness of CrSiN thin films ranged from 31 to 35 GPa, from which the hardness of coating deposited by pulsed current was higher. The scanning electron microscopy observation of the film surface showed structures is embedded in the amorphous Si3N4 structures. By X-ray diffraction analysis, CrSiN thin films exhibited FCC NaCl-type structure and the preferred orientation is CrN(200). The corrosion potential of the films ranged from -0.1 to -0.4 with the different current. As the current increase, the thickness increases, therefore, increases the corrosion resistance. The pulsed current is without the obvious effect on the thickness of coatings, however, the corrosion resistance is better. Keywords: Cathodic arc deposition, Pulsed current, Wear, Corrosion, CrSiN
43
Chang, JingTang, and 張景棠. "Cavitation Erosion Behavior of TiNi Thin Films Deposited by Cathodic Arc Plasma Ion Plating." Thesis, 2000. http://ndltd.ncl.edu.tw/handle/55860173335944425053.
Full textAbstract:
碩士逢甲大學
材料科學學系
88
TiNi intermetallic compound is considered for its pseudoelasticity to the application of cavitation resistance. It is however expensive and motivated the introduction of thin film process. Cathodic arc plasma deposition was used to deposit TiNi films on S48C medium carbon steel substrate. The substrates bias voltage was changed to optimize the properties of the deposited film when using Ti50Ni50 target. And Ti55Ni45 and Ti60Ni40 targets were used as well to deposit different film compositions. Surface and cross-sectional morphology of the deposited films were observed by using scanning electron microscopy. Film microstructure was characterized using XRD. EDS was used to analyze the elemental constituents of the deposited films. Cavitation resistance of the deposited films was evaluated using the ASTM G32-85 standard test in fresh water, 3.5wt% NaCl water solution and 3.5wt% HCl water solution. The DC polarization behaviors of films were measured to explore the electrochemical behavior of coated specimens in corrosive environments. Experimental results show that films deposited by using target Ti50Ni50 is Ti45Ni55. The major phase in such films is TiNi-B2, TiNi3 and TiNi-B19’ coexist as the minor phase. The film compositions were Ti49Ni51 and Ti51Ni49 when target composition Ti55Ni45 and Ti60Ni40 were used. The major phase in films deposited by using Ti55Ni45 target is TiNi-B2 accompanied with TiNi3 and TiNi-B19’. The major phase in films deposited by using Ti60Ni40 target is TiNi-B2 accompanied with TiNi-B19’ and Ti2Ni, without TiNi3. Crystallinity increases with increasing titanium composition. Cavitation resistance of specimens was significantly increased to more than a 3-fold value in comparison with the uncoated carbon steel in fresh water if high substrate bias voltage was applied. These promising results suggest that cathodic arc plasma ion plating is suitable for preparing cavitation resistant TiNi films, if high substrate bias voltage is employed. In the case of 3.5wt% NaCl solution and 3.5wt% HCl solution, the cavitation weight loss of specimen is higher than the specimen in fresh water. In fresh water, the films with different compositions almost have the same weight loss. Film composition does not influence the cavitation resistance of films in this regard. It however causes the difference in weight loss of specimens by suffering the electrochemical reactions that occurs in NaCl solution and HCl solution. Titanium-rich film composition may reduce Icorr and give rise to Epp of specimens in 3.5wt% NaCl solution, or reduce Icorr of specimens in 3.5wt% HCl solution. This explains that the films prepared by using Ti60Ni40 and Ti55Ni45 target have superior cavitation resistance.
44
Kao, Frank, and 高穗安. "A study of microstructure and properties of TiN prepared by cathodic arc ion plating." Thesis, 1999. http://ndltd.ncl.edu.tw/handle/39115559694237910565.
Full textAbstract:
碩士國立中興大學
材料工程學研究所
87
Abstract TiN thin films prepared by cathodic arc ion plating are wildly used as a hard coating for cutting tools in industry due to its good wear- and corrosion-resistance. Experiments were carried out to deposit TiN on a type 304 stainless steel for different substrate bias ranging from -100 to -300 V, and nitrogen pressure ranging from 10 to 30 mTorr. With the different coating conditions, the mechanical and corrosion properties and microstructure of the TiN thin films were studied. Characterization of the microstructure of the TiN thin films was done both by transmission electron microscopy (TEM) and scanning electron microscopy (SEM). Macro-particles on the surface of TiN thin films were observed by scanning electron microscopy. Investigation of the macro-particles using TEM indicates that the macro-particles is composed of metallic Ti in the center and the outside is covered by a layer of TiN. The TEM result also shows that the specimen distance to the Ti target has pronounced effect on the thickness of the TiN coatings. The preferred orientation of TiN thin films was studied by x-ray diffraction (XRD) analysis. The x-ray spectra reveal strong (111) texture in the specimens at all coating conditions. It is found that the hardness of TiN thin films decreases with increasing the substrate bias from -100 to -300 V. The reverse trend is observed for increasing the nitrogen pressure. The corrosion behavior of the TiN coated steel in an aerated 30 % sulfuric acid for 7 days was investigated by scanning electron microscopy, which shows good corrosion resistance of the TiN prepared by cathodic arc ion plating.
45
Wang, Wan-Chun, and 王婉純. "A Study of the Microstructure and Coating Properties of Cathodic Arc Evaporated Chromium Nitrides." Thesis, 2000. http://ndltd.ncl.edu.tw/handle/91783602092676001064.
Full textAbstract:
碩士國立中興大學
材料工程學研究所
88
This research is to investigate the microstructure, residual stress, oxidation resistance and corrosion resistance of cathodic arc deposited CrN film. The microstructure and chemical composition of the coatings were analyzed by X-ray diffractometry (XRD), analytical electron microscopy (AEM), high resolution transmission electron microscope (TEM) and scanning electron microscopy (SEM). The corrosion behavior of the coatings were studied by an EG&E 263A potentiostat. The residual stress in the cathodic arc deposited CrN film was measured to be 5.05 GPa. From cross-section TEM, it is found that the as-deposited CrN has a thickness of 4.1μm, and exhibits columnar structure. The thickness of the CrN film remains the same after oxidation but the CrN phase transfer into a mixture of CrN and Cr2N phases which have equiaxial grains; in addition, a thin oxide film Cr2O3 layer forms near the surface, which has columnar structure. From XRD, SEM and TEM results, it can be found that the extent of phase transformation increases with oxidation temperature. The surface free energy of CrN films can be calculated from the Young’s equation. Experimental results using three different solutions show that the surface energy decreases with increasing temperature below 500℃ and then keep to 800℃. From the corrosion results, it is found that both CrN and TiN films can protect 304 stainless steel from corrosion in sulfuric acid solution. However, the corrosion resistance of the CrN or TiN-coated carbon steel is less than the bare carbon steel. This result is further confirmed by electrochemical analysis using potential dynamic test.
46
Chen, Qi Ke, and 陳祈克. "On tribological properties of CrN coatings deposited on D2 steels by cathodic arc evaporation." Thesis, 1995. http://ndltd.ncl.edu.tw/handle/69904049877615120708.
Full text
47
Shih, Yuan-Ting, and 施元丁. "The influence of oxygen on Diamondlike film deposited by cathodic arc plasma deposition technology." Thesis, 1995. http://ndltd.ncl.edu.tw/handle/86418768558415822509.
Full text
48
Huang, Sung-Hsiu, and 黃頌修. "A Study of Nano-multilayered Thin Films Prepared by Filtered Cathodic Arc Evaporation Method." Thesis, 2015. http://ndltd.ncl.edu.tw/handle/57tpme.
Full textAbstract:
博士國立交通大學
材料科學與工程學系所
103
Due to the miniaturization and high-frequency applications of microelectronics, the substrates for electronic package have evolved from conventional FR4 printed circuit board to advanced substrates such as BT resin, Al2O3 and AlN substrates. Presently, the dry machining is the mainstream of substrate manufacture due to the requirements of product functionality and environmental issues. Development of new materials and surface hardening methods for drilling tools is hence critical since traditional cement metal tools such as WC-Co and surface coatings can no longer fulfill the precision of advanced substrate production. Nano-multilayered coatings are known to possess high hardness and high-temperature oxidation resistance in comparison with traditional single layered coatings. This thesis work investigates the nano-multilayered thin films prepared by filtered cathodic arc evaporation (CAE) method so as to explore their applicability to the surface hardening of cutting tools for dry machining. Nano-multilayered thin films were prepared by interleaving the Ti-Al targets with various composition ratios and Zr/Cr targets at different cathode locations of CAE system. Meanwhile, acetylene (C2H2) and tetramethylsilane (TMS, Si(CH3)4) was introduced during the deposition to supply of carbon (C) and/or silicon (Si) dopants in coating layers. The mechanical properties of coatings were evaluated by nano-indentaion, wear test and scratch test. Microstructures and compositions of samples were characterized by electron probe micro-analyzer, x-ray diffraction, x-ray photoelectron spectroscopy, scanning electron microscopy and high-resolution transmission electron microscopy. Experimental results indicated that the Ti0.33Al0.66N/Ti0.55Al0.55N nano-multilayered thin film with the hardness as high as 43.9 GPa can be achieved by using a combination of an Al-rich Ti0.33Al0.66 target and a traditional Ti0.55Al0.55 target. Notably, such a hard coating layer provided a high hot hardness behavior compared with conventional TiAlN coating. The CrN/ZrN multilayered coatings with different bilayered thicknesses were also prepared by varying the substrate rotation speeds and the arc currents of the Cr/Zr target, and the best properties are achieved when the bilayered thickness is 16 nm and coatings containing 3.5 to 3.7 at.% of C. Bases on previous results, this thesis investigated the effects of TMS as the precursors of C and Si dopants. The process window using TMS was found to be wider than that of the acetylene method. The optimal hardness value (31.1 GPa) was achieved at the coating layer with the composition of 20.2% Cr-26.4% Zr-48.1% N-1.3% Si-2.2% C-1.8% O (in the unit of at.%) prepared at the 50 sccm flow rate of TMS. Meanwhile, the investigation on the influence of working pressure and argon (Ar) flow rate on hardness, adhesion and friction properties of coatings indicated that the lower friction could be achieved by increasing the Ar flow rate and the adhesion could be improved by slightly increasing the working pressure.
49
Hsieh, Tsung-Ju, and 謝宗儒. "Synthesis and characterizations of nanocomposite (Ti,Si)CN films by cathodic arc plasma evaporation." Thesis, 2007. http://ndltd.ncl.edu.tw/handle/72298780840660377622.
Full textAbstract:
碩士明道大學
材料暨系統工程研究所
95
Nanocomposite (Ti,Si)CN double-layered films were deposited on tungsten carbide (WC–Co) substrates using TiSi alloy as target for a dual cathodic arc plasma deposition system. The double-layered coatings were designed with Ti/(Ti,Si)N as an interlayer and (Ti,Si)CN as a surface layer. The (Ti,Si)CN coatings were deposited under the mixture of constant flow of N2 and various flows of C2H2. The influences of bias voltages and C2H2/N2 rate on the microstructure, mechanical, tribological and corrosion properties of the films were investigated. Scanning electron microscopy, transmission electron microscopy, X-ray diffraction techniques were also employed respectively to analyses the microstructure, grain size and residual stress. Nano-indentation and tribometer testes were used to measure the mechanical and tribological properties of nanocomposite (Ti,Si)CN thin films. It was found that the microstructure, mechanical, tribological, and corrosion properties of the films correlated with bias voltages and C2H2/N2 rate, resulting in better mechanical and wear properties and of (Ti,Si)CN coatings.
50
Guillen, E., I. Heras, Llorente G. Rincon, F. Lungwitz, M. Alcon-Camas, and R. Escobar-Galindo. "Room temperature deposition of highly dense TiO2 thin films by Filtered Cathodic Vacuum Arc." 2019. https://hzdr.qucosa.de/id/qucosa%3A33929.
Full textAbstract:
A systematic study of TiO2 films deposited by dc filtered cathodic vacuum arc (FCVA) was carried out by varying the deposition parameters in a reactive oxygen atmosphere. The influence of the oxygen partial pressure on film properties is analyzed. Composition was obtained by Rutherford backscattering spectroscopy (RBS) measurements, which also allow us to obtain the density of the films. Morphology of the samples was studied by scanning electron microscopy (SEM) and their optical properties by ellipsometry. Transparent, very dense and stoichiometric TiO2 films were obtained by FCVA at room temperature