Dissertations / Theses on the topic 'Capacitive discharge'
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Collins, Steven John. "A radio frequency capacitive discharge digital to analogue converter." Thesis, University of Glasgow, 2012. http://theses.gla.ac.uk/3371/.
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As the communications revolution continues there is an ever increasing demand for integrated transmitters and receivers on silicon in devices such as mobile phones and networking products. The demand to integrate complete systems onto a single die has driven a need to minimise the area of transmitters which has led to research into combining digital to analogue converters and RF mixers to minimise their area. The drive for increasing speeds and smaller transistors has resulted in higher capacitance densities and lower operating voltages, the latter making it more difficult to implement conventional transmitter circuits. Therefore there is a need for passive transmitter systems that maximise the output power to the load by minimising the voltage overhead on the output signal. This thesis proposes and demonstrates that it is possible to use a digital to analogue converter that performs RF up conversion using direct capacitive discharge to the load, which takes advantage of the large capacitance densities of a modern 40nm CMOS process. The DAC uses charge sharing in a similar manner to a charge sharing DAC without the bandwidth limitations imposed by an output amplifier. The RF frequency up conversion at the DAC data clock rate is produced using two DACs that differentially output the complement of each other on different halves of the clock cycle (one outputting while the other is charging) thereby emulating a passive switched mixer. The thesis shows that an 8 bit capacitive discharge DAC of 0.16mm2 can output 3dBm into a 50Ω load at 2.15GHz using a clock rate of 2GHz with MTPR of greater than 30dBc.
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Goruppa, Alexander. "Modifications of radiofrequency capacitive discharge for deposition of carbon coatings." Thesis, Open University, 2002. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.251396.
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Barman, Ishan. "Effect of permeation of discharge characteristics of capacitive deionization process." Thesis, Massachusetts Institute of Technology, 2007. http://hdl.handle.net/1721.1/42302.
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Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Mechanical Engineering, 2007."June 2007."
Includes bibliographical references (leaves 88-90).
Cost-effective desalination of seawater can be a panacea for the growing freshwater crisis that ranks alongside the problems of shortage of viable energy resources and global warming in terms of its frightening global spread and magnitude. However, the energy guzzling nature of the existing desalination technologies has resulted in very limited relief characterized by a meager 0.3% contribution to the annual water use. In recent years, capacitive deionization (CDI) has been reported to potentially solve some of the crucial issues that have plagued the classical desalination processes. CDI is a low-pressure, non-membrane desalination technology that employs the basic electrochemical principle of adsorbing ions in a capacitive fashion to high surface-area electrodes such that the outgoing stream becomes devoid of the ions that were present in the incoming stream. Although the power efficiency of CDI is nearly an order-of-magnitude superior to the existing processes, it is plagued by the problem of low water recovery ratio. The costs of pumping and pre- and post-treatment of water added to the rising costs of surface water makes maximizing the recovery ratio a priority. Moreover, the throughput of the plant is related to the water recovery ratio. To drastically reduce the problem of low water recovery ratio while still maintaining the sizeable power consumption advantage of the CDI process, we propose a capacitive deionization process with permeating flow discharge (PFD). In PFD, the waste water is permeated through the porous electrodes rather than flowing in-between the electrodes as is the case in the conventional axial flow discharge (AFD) process.
(cont.) We hypothesize that the rate of removal of ions from a channel setup is higher for a process that is influenced by solvent drag (PFD) than for one which is diffusion limited (AFD), given the same flow conditions. A table-top setup, designed to simulate the AFD and PFD processes, is used to obtain precise experimental evidence for the ion removal rate for each process. A mathematical model based on unsteady convection-diffusion process for AFD and membrane transport process for PFD is presented. We find that over smaller time scales, permeating flow is much more efficient in removing the ions detached from the electrical double layer in the porous electrode. Based on our experimental observations, we observe that the use of the PFD process, under conventional operational conditions, can cause a discharge time reduction by at least a factor of two. Numerical simulations carried out on the basis of this model are shown to compare favorably with the experimental observations. The model predicts that the reduction in discharge time translates to an increase in water recovery ratio by approximately 30 percent. Moreover, the clear superiority in power efficiency is not surrendered by employing this new scheme.
by Ishan Barman.
S.M.
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Abdel-Fattah, E., and H. Sugai. "Electron heating mode transition observed in a very high frequency capacitive discharge." American Institute of Physics, 2003. http://hdl.handle.net/2237/7247.
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Jäverberg, Nadejda. "On simulation of surface discharges at variable voltage frequency." Thesis, KTH, Electromagnetic Engineering, 2007. http://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-4618.
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Isolationsdiagnostik är ett redskap som är av stor betydelse för underhållsoptimering av elektriska anläggningar. Ett av de möjliga mått på isolationsförsämring som kan användas i diagnosticeringssyfte är partiella urladdningar. Det här examensarbetet beskriver ett modelleringsförsök av ett resistivt-kapacitivt nätverk för simulering av partiella yturladdningar i Matlab. Tyvärr blev försöket misslyckat på grund av ett oväntat stort beroende av högspänningskapacitanser på ytresistiviteten. Ytterligare ett försök genomfördes i COMSOL Multiphysics, ett program baserat på finita elementmetoden ämnat för simuleringar av fysikaliska processer. Den huvudsakliga nackdelen med COMSOL Multiphysics modellen är långa simuleringstider. Det visade sig vara möjligt att simulera urladdningar i COMSOL Multiphysics. Här modellerades ytresistansen med hjälp av ett resistivt skikt. Yturladdningar simulerades genom att ändra det resistiva skiktets konduktivitet. Här upptäcks ytterligare ett problem: mycket långa simuleringstider vid användandet av olinjära konduktivitetsuttryck som beror på det elektriska fältet.
Alla simuleringar, både i Matlab och COMSOL Multiphysics, utfördes på en dator med Intel dual-core processor: 2.13 GHz, 0.99 GB of RAM.
Insulation diagnostics is a very important tool in optimization of electric installations’ maintenance. One of the possible measures of insulation deterioration that can be used for diagnostic purposes are partial discharges. This thesis work describes an attempt to model a resistive-capacitive network for simulating partial surface discharges in Matlab. Unfortunately this attempt proved to be a failure due to an unexpectedly considerable dependency of high voltage capacitances on surface resistivity. Another attempt described here was performed in COMSOL Multiphysics, a finite-element based program for simulation of physical processes. The main drawback with COMSOL Multiphysics model is long simulation times. It proved to be possible to simulate discharges in COMSOL Multiphysics. Here surface resistance was modeled with the help of a resistive layer. Discharges were simulated by changing conductivity of the mentioned layer. Here another problem was discovered: very long simulation times when using non-linear, electric field dependent expressions for conductivity.
All the simulations, both in Matlab and COMSOL Multiphysics, were performed on a computer with Intel dual-core processor: 2.13 GHz, 0.99 GB of RAM.
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Couedel, Lenaic Gael Herve Fabien. "Nanoparticle formation and dynamics in a complex (dusty) plasma: from the plasma ignition to the afterglow." Thesis, The University of Sydney, 2008. http://hdl.handle.net/2123/4121.
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Complex (dusty) plasmas are a subject of growing interest. They areionized gases containing charged dust particles. In capacitively-coupled RF discharges, dust growth can occur naturally and two methods can be used to grow dust particles: chemically active plasmas or sputtering. The growth of dust particles in argon discharges by RF sputtering and the effect of dust particles on theplasma have been investigated from the plasma ignition to the afterglow. It was shown that plasma and discharge parameters are greatly affected by the dust particles. Furthermore, plasma instabilities can be triggered by the presence of the dust particles. These instabilities can be due to dust particle growth or they can be instabilities of a well established dust cloud filling the interelectrode space. When the discharge is switched off, the dust particles act like a sink for the charge carrier and consequently affect the plasma losses. It was shown that the dust particles do keep residual chargeswhich values are greatly affected by the diffusion of the charge carriers and especially the transition from ambipolar to free diffusion.
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Couedel, Lenaic Gael Herve Fabien. "Nanoparticle formation and dynamics in a complex (dusty) plasma: from the plasma ignition to the afterglow." University of Sydney, 2008. http://hdl.handle.net/2123/4121.
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Doctor of Philosophy(PhD)Complex (dusty) plasmas are a subject of growing interest. They areionized gases containing charged dust particles. In capacitively-coupled RF discharges, dust growth can occur naturally and two methods can be used to grow dust particles: chemically active plasmas or sputtering. The growth of dust particles in argon discharges by RF sputtering and the effect of dust particles on theplasma have been investigated from the plasma ignition to the afterglow. It was shown that plasma and discharge parameters are greatly affected by the dust particles. Furthermore, plasma instabilities can be triggered by the presence of the dust particles. These instabilities can be due to dust particle growth or they can be instabilities of a well established dust cloud filling the interelectrode space. When the discharge is switched off, the dust particles act like a sink for the charge carrier and consequently affect the plasma losses. It was shown that the dust particles do keep residual chargeswhich values are greatly affected by the diffusion of the charge carriers and especially the transition from ambipolar to free diffusion.
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Abrahams, Dhielnawaaz. "Charge Transfer and Capacitive Properties of Polyaniline/ Polyamide Thin Films." University of the Western Cape, 2018. http://hdl.handle.net/11394/6361.
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Magister Scientiae - MSc (Chemistry)Blending polymers together offers researchers the ability to create novel materials that have a combination of desired properties of the individual polymers for a variety of functions as well as improving specific properties. The behaviour of the resulting blended polymer or blend is determined by the interactions between the two polymers. The resultant synergy from blending an intrinsically conducting polymer like polyaniline (PANI), is that it possesses the electrical, electronic, magnetic and optical properties of a metal while retaining the poor mechanical properties, solubility and processibility commonly associated with a conventional polymer. Aromatic polyamic acid has outstanding thermal, mechanical, electrical, and solvent resistance properties that can overcome the poor mechanical properties and instability of the conventional conducting polymers, such as polyaniline.
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Reinicke, Marco. "Investigation of physical and chemical interactions during etching of silicon in dual frequency capacitively coupled HBr/NF3 gas discharges." Doctoral thesis, Dresden Techn. Univ, 2009. http://d-nb.info/998661384/04.
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Tawidian, Hagop-Jack. "Formation et comportement de nanoparticules dans un plasma : instabilités dans les plasmas poudreux." Thesis, Orléans, 2013. http://www.theses.fr/2013ORLE2033/document.
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L'objectif de cette thèse est l'étude de la formation de nanoparticules carbonées dans un plasma basse pression. Les poussières sont créées par pulvérisation d'une couche de polymère déposée sur l'électrode d'une décharge radio fréquence à couplage capacitif. La présence des poudres perturbe et modifie les propriétés du plasma. La croissance des poudres peut notamment déclencher des instabilités basse fréquence qui évoluent avec la taille et la densité des poudres. Au centre du plasma, une région sans poudre, appelée void, est souvent observée. Cette région se caractérise en particulier par une forte luminosité. Différents diagnostics (mesures électriques, imagerie vidéo rapide, Fluorescence Induite par Laser) sont utilisées afin d'analyser ces différents comportements résultant des interactions entre le plasma et les poussières. L'analyse approfondie des instabilités a permis de mettre en évidence plusieurs régimes et d'extraire leurs principales caractéristiques comme leur durée et l'évolution de leurs fréquences. Ces instabilités se traduisent par la formation de petites "boules" de plasma qui se déplacent et interagissent au sein de celui-ci. Des phénomènes particulièrement surprenants de fusion et de division de ces boules ont été mis en évidence. Concernant le void, nos travaux ont confirmé la forte excitation présente dans cette zone. Dans la dernière partie de la thèse, la dissociation de l'aluminium triisopropoxide(ATI) est étudiée dans un plasma à l'aide de la Spectroscopie infrarouge à Transformée de Fourier. Ce diagnostic nous a permis de mettre en évidence l'évolution de la densité d'ATI en fonction des paramètres de la décharge. Nous avons également quantifié les différents composants hydrocarbonés formés par polymérisationThe objective of this thesis is to study the formation of carbonaceous nanoparticles in a low pressure plasma. Dust particles are created by sputtering a polymer layer deposited on the bottom electrode of a capacitively coupled radio-frequency discharge. The presence of dust particles disturbs and changes the plasma properties. The growth of dust particles can trigger low frequency instabilities that evolve with the dust particle size and density. In the center of the discharge, the void, a dust-free region, is observed. It is characterized by an enhanced luminosity. Different diagnostics (electrical measurements, high speed imaging, Laser Induced Fluorescence) are used in order to understand these different behaviors resulting from plasma-dust particle interactions. Dust particle growth instabilities are investigated showing the existence of different instability regimes. Their main characteristics are extracted such as their duration and their evolution frequency. These instabilities are characterized by the formation of small plasma spheroids moving and interacting in the discharge. Several interesting phenomena are evidenced such as the merging and splitting of these plasma spheroids. Concerning the void, our investigations confirmed the high excitation occurring in this region. In the last part of the thesis, the dissociation of aluminium triisopropoxide (ATI) is studied in a plasma using Fourier Transform InfraRed spectroscopy. Thanks to this diagnostic, the evolution of ATI density has been studied as a function of the discharge parameters. We have also quantified the different hydrocarbon compounds formed by polymerization
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Ku, Victor Po-Tsung. "Experimental studies of capacitively coupled RF discharges." Thesis, University of Oxford, 1996. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.318752.
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Ravel, Guillaume. "Conception et caractérisation d'une décharge capacitive à 13,56 MHz utilisant une cathode à champ magnétique dynamique intégré pour la gravure sèche des microcircuits." Grenoble 1, 1987. http://www.theses.fr/1987GRE10135.
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Ce memoire decrit la mise en oeuvre, l'etude et la caracterisation d'un reacteur de gravure seche pour le traitement de substrats en microelectronique. Apres une analyse tres schematique des parametres d'une action de gravure et des influences respectives sur ces parametres de diverses structures de decharge, nous avons developpe un dispositif experimental utilisant deux electrodes excitees en radiofrequence et un champ magnetique externe. Une phase d'evaluation sur des gravures de silicium polycristallin en plasma de sf::(6) nous a conduit a un reacteur prototype dote d'une cathode originale a champ magnetique dynamique integre. Les caracteristiques de ce reacteur dans deux modes de fonctionnement ont ete etudies par une methode optique de spectrometrie d'emission et une methode nouvelle de mesures d'impedance de decharges en radiofrequence. Des gains importants ont ete observes sur les caracteristiques de fonctionnement en sf::(6) et cl::(2) (vitesse de gravure, densites de courant d'ions) par l'application du champ magnetique sur la decharge
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Plazenet, Thibaud. "Contribution à l'analyse de défauts de roulement induits par les défauts électriques de machines tournantes." Electronic Thesis or Diss., Université de Lorraine, 2019. http://www.theses.fr/2019LORR0187.
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Le vieillissement prématuré des roulements est une des causes les plus fréquentes d’arrêts forcés des machines tournantes notamment lorsqu’elles sont alimentées par onduleurs de tension. Ce travail de thèse contribue à l’analyse et à la détection du défaut de roulement de type rugosité généralisée des machines de faible puissance (jusqu’à 20 kW) alimentées par onduleurs de tension. Dans cette configuration, ce défaut est causé principalement par la présence de décharges capacitives créant une électroérosion des chemins de roulement. En vue de la détection de ce défaut, nous avons proposé une méthode de vieillissement d’un roulement in-situ en reproduisant de manière réaliste et accélérée le stade précoce du défaut de rugosité généralisée. Cette méthode est élaborée expérimentalement par le biais d’un onduleur de tension disposé entre les bagues d’un roulement et dimensionné pour augmenter l’activité de décharge tout en limitant l’énergie d’une décharge individuelle à un seuil réaliste. Les conditions de fonctionnement de la machine qui accélèrent le vieillissement en augmentant l’activité de décharge ont été déterminées expérimentalement. Dans ce manuscrit, nous répondons également à la problématique de la détection de ce défaut. Selon les contraintes industrielles du domaine de la maintenance et les effets produits par le défaut sur les signaux vibratoires, nous avons sélectionné des outils de traitement de signal adaptés. Le développement de signaux vibratoires de synthèse présentant des propriétés caractéristiques du défaut a permis d’effectuer une étude comparative des méthodes de détection proposées qui se basent sur le filtre de Wiener, la soustraction spectrale et le kurtosis spectralPremature bearing aging is one of the main reasons of forced outages of electrical machines, especially under converter operation. This work contributes to the analysis and the detection of the generalized roughness bearing fault in small machines (up to 20 kW) under converter operation. In this configuration, this fault is caused by capacitive discharges creating an electroerosion of the raceways. To detect this fault, we proposed a realistic aging process that reproduces the emerging state of the generalized roughness bearing fault. This experimental process consists of an inverter located between the raceways and designed to increase the discharge activity while limiting the energy of a single discharge to a realistic threshold. Operating conditions, which accelerate the bearing aging by increasing the discharge activity, are experimentally determined. In this thesis, we also tackle the problem of detecting the generalized roughness bearing fault. In accordance with the maintenance constraints and the effects produced by the fault on vibration signals, we selected appropriate signal processing tools. The creation of synthetic vibration signals, enriched with some properties of the fault, allowed a comparative study of the proposed detection methods, which are based on the Wiener filter, the spectral subtraction and the spectral kurtosis
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Pencheva, Mariana. "Modelling of atmospheric pressure argon plasmas: application to capacitive RF and surface microwave discharges." Doctoral thesis, Universite Libre de Bruxelles, 2013. http://hdl.handle.net/2013/ULB-DIPOT:oai:dipot.ulb.ac.be:2013/209451.
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This work is focused on modelling of atmospheric pressure high frequency (HF) discharges operated at relatively low power densities. Two types of devices are considered – the radio frequency capacitively coupled atmospheric pressure plasma jet and the microwave discharge sustained by surface electromagnetic waves. They are addresses as the plasma shower and the surface-wave discharge (SWD). Both of the considered devices operate in argon at atmospheric pressure (p = 1 bar). However, the difference in the frequency of the power coupling mechanism induces a big difference in plasma properties. This implies also that different modelling approaches have to be employed.Doctorat en Sciences de l'ingénieur
info:eu-repo/semantics/nonPublished
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Kouprine, Androus. "Thin film coating of nano-particles in a capacitively coupled RF discharge." Thèse, Université de Sherbrooke, 2003. http://savoirs.usherbrooke.ca/handle/11143/1753.
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Presently, nanocomposite materials have numerous applications, especially in the fields of materials for electronics, aerospace industry, biotechnologies and medicine. Utilization of plasma technologies can offer new production methods of such materials, in particular, the use of non-thermal plasmas for the treatment of hydrocarbons, which makes it possible to obtain a wide variety of thin films with a range of different characteristics. The goal of the presented thesis is an application of the non-thermal plasma for the fabrication of nano-structured materials on the basis of ceramic nanopowders (SiO[subscript 2], TiO[subscript 2]) introduced into the plasma of hydrocarbon gases. For this purpose an experimental installation with a capacitively coupled plasma (CC RF) has been designed and constructed. The operating parameters are: the plasma pressure, P = 1000-10 000 Pa, plasma power: 300-2500 W (specific power: 2-20 W/cm[superscript 3]), plasma gas flow rate: 0.01-0.1 slpm. Nanometric particles of SiO[subscript 2], either TiO[subscript 2] were introduced into CC RF methane or ethane plasmas to perform the deposition of thin film hydrocarbon coatings onto their surfaces. The presence of newly formed 5-30 nm thick layers on the surface of the plasma treated particles was detected by TEM. The analysis of these coatings by infrared spectroscopy, thermo-gravimetry, differential scanning calorimetry, has demonstrated the features of amorphous hydrocarbon coatings (a-C:H). No contamination of the product powder by amorphous carbon was detected. The reproducibility of the process has also been demonstrated. The main original contributions of the present thesis may be presented as: (1) the design and construction of the capacitively coupled low pressure RF plasma facility, this being able to provide in-flight treatments of the introduced nanoparticles, and which may be integrated in series into a more complex, technological process. (2) the development of the process for nano-structured materials, produced on the base of ceramic nanopowders introduced into CC RF plasma, sustained in hydrocarbon gases. (3) development of the chemical kinetics model for the formation of solid phases in the hydrocarbon CC RF plasma: a phase consisting of the C:H coating on the nanoparticles' surface and a phase of amorphous carbon, the latter being a contaminating product. Validation of the model by experimental observations.--Résumé abrégé par UMI.
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Hering, Maria. "Überschlagsverhalten von Gas-Feststoff-Isoliersystemen unter Gleichspannungsbelastung." Doctoral thesis, Saechsische Landesbibliothek- Staats- und Universitaetsbibliothek Dresden, 2016. http://nbn-resolving.de/urn:nbn:de:bsz:14-qucosa-200879.
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Gasisolierte Systeme im Gleichspannungsbetrieb vereinen für Anwendungen moderner Energieübertragung die Forderungen nach kleinräumigen Anlagen und verlustarmem Energietransport über große Entfernungen. Für einen zuverlässigen und sicheren Betrieb muss das Verhalten der eingesetzten Gas-Feststoff-Isolierung im technologischen System bis an die Grenzen des Isolationsvermögens bekannt sein. Gegenstand der vorliegenden Arbeit ist deshalb das Überschlagsverhalten von Gas-Feststoff-Isoliersystemen unter Gleichspannungsbelastung. Dabei stehen zwei wesentliche Einflussfaktoren im Vordergrund: die Temperatur, motiviert durch reale Stromwärmeverluste, und eine feste Störstelle auf der Gas-Feststoff-Grenzfläche, motiviert durch in der Praxis nicht völlig auszuschließende, metallische Partikel. Die Effekte dieser beiden Parameter auf die Feldverteilung, die Oberflächen- und Raumladungsbildung sowie das Isolationsvermögen bei Gleichspannung werden zunächst in zwei Versuchsanordnungen separat experimentell untersucht. Anschließend wird deren Zusammenwirken und gegenseitige Beeinflussung im Gesamtsystem analysiert. Die betriebsbedingte Erwärmung der Leiter gasisolierter Systeme führt zu einer inhomogenen Temperaturverteilung, die sich auf die Eigenschaften der Isolierstoffe Gas und Epoxidharz auswirkt. Die von der Temperatur abhängige Leitfähigkeit der Feststoffisolatoren führt zu einer temperaturabhängigen Feldverteilung, bei der sich der Ort der Höchstfeldstärke verschiebt. Dabei kann sich der Absolutwert der Höchstfeldstärke erhöhen und somit das Isolationsvermögen verringern. Gleichzeitig weist das Isoliergas nahe des erwärmten Leiters lokal eine geringere Dichte und damit eine geringere dielektrische Festigkeit auf. Die thermisch bedingte Minderung des Isolationsvermögens bei Gleichspannung beträgt in der untersuchten Anordnung (25 ... 35) %. In den schwach inhomogenen Feldern gasisolierter Anlagen erweisen sich metallische Partikel auf Isolatoren ab drei Millimetern Länge als besonders kritisch. Bei einem Gasdruck unterhalb von 0,3 MPa setzen an den Partikelspitzen zum Teil bereits ab 50 % der Durchschlagsspannung ohne Partikel Teilentladungen ein, sodass die Koronastabilisierung zu einer vergleichsweise hohen Überschlagsspannung führt. Durch diese stabilen Glimmentladungen kann die Störstelle bei Gleichspannung durch die üblichen Detektionsverfahren jedoch nicht zweifelsfrei nachgewiesen werden. Oberhalb von 0,3 MPa treten vor dem Überschlag keine Teilentladungen auf. Aufgrund der fehlenden Koronastabilisierung kann die Isolationsfestigkeit durch einen erhöhten Gasdruck nicht oder nur stark unterproportional gesteigert werden. Die mit der Modellanordnung gewonnenen Erkenntnisse sind nachweislich auf Isolatoren kommerzieller Anlagen übertragbar. Das in der vorliegenden Arbeit untersuchte Überschlagsverhalten von Gas-Feststoff-Isoliersystemen unter Gleichspannungsbelastung wird maßgeblich durch die Temperaturverteilung und durch feste Störstellen auf der Grenzfläche beeinflusst. Oberflächen- und Raumladungen verändern das üblicherweise ohmsch-kapazitiv beschriebene Verhalten des Isolierstoffsystems bei Gleich- und Mischspannungsbelastung. Der Einfluss zusätzlicher Ladungsträger auf die stark temperaturabhängige Feldumbildung demonstriert, dass das Isoliergas in diesem Fall mit teilchendichte- und feldstärkeabhängigen Drift- und Diffusionsprozessen zur Modellierung des transienten Verhaltens von Gleichspannungssystemen berücksichtigt werden muss. Die Untersuchung des Systemverhaltens an den Grenzen des Isolationsvermögens ist wichtiger Bestandteil bei der Entwicklung innovativer Technologien der modernen Energieübertragung bei steigender ÜbertragungsleistungDC operated gas-insulated systems combine the demand for space saving installations and lowloss energy transport over long distances for applications of recent energy transmission. In order to ensure a reliable and safe operation, the behaviour of the gas-solid insulation, which is used in the technological system, has to be known up to the limits of the insulation properties. Hence, this thesis deals with the flashover behaviour of gas-solid insulation systems under DC voltage stress. Thereby, it focuses on two main influence factors: the temperature, due to real current heat losses, and an adhesive defect on the gas-solid interface, due to metallic particles that cannot be fully excluded in practice. Firstly, it is investigated experimentally in two test arrangements, how each parameter separately affects the electrical field distribution, the surface and volume charge accumulation and the insulation performance under DC voltage stress. Following that, their interaction and mutual influence is analysed in the whole system. Due to operating currents, the heating of the conductors in gas-insulated systems causes an inhomogeneous temperature distribution, that affects the properties of the insulating materials gas and epoxy resin. The temperature-dependent conductivity of the solid insulators leads to a temperature-dependent field distribution. Thereby, the location of the highest field strength is shifted. Since the absolute value of the highest field strength can increase, the insulation performance can decrease. Simultaneously, the insulating gas close to the heated conductor locally has a lower gas density and therefore a lower dielectric strength. The thermal related reduction of the insulation performance under DC voltage stress amounts to (25 ... 35) % in the investigated arrangement. Metallic particles, with a length of more than three millimetres and adhering on spacers, turn out to be particularly critical in the weakly inhomogeneous field of gas-insulated systems. At pressures below 0,3 MPa, partial discharges at the particle tips partly ignite already at 50 %of the breakdown voltage without a particle. The corona stabilisation leads to a relatively high flashover voltage. However, due to these stable glow discharges under DC voltage stress, the defect can not be unequivocally proven by usual detection methods. Above 0,3 MPa, no partial discharges occur before the flashover. Due to the missing corona stabilisation, with a higher gas pressure, the insulation strength is not or only disproportionately low increasing. The findings gained with the model arrangement are evidently applicable to spacers of commercial installations. The flashover behaviour of gas-solid insulation systems under DC voltage stress, examined in this thesis, is influenced significantly by the temperature distribution and adhesive particles on the interface. Surface and volume charges change the generally resistive-capacitive described behaviour of the insulation system under DC and superimposed voltage stress. The influence of additional charge carriers on the strongly temperature-dependent field transition demonstrates, that in this case, the insulating gas with its drift and diffusion processes, depending on the particle density and the field strength, has to be considered, when modelling the transient behaviour of DC operated systems. Investigating the system behaviour to the limits of the insulation properties is a crucial element of developing innovative technologies of the modern energy transmission at increasing transmissions powers
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Küllig, Christian [Verfasser]. "Negative Ions and Operation Modes in Capacitively Coupled RF Oxygen Discharges / Christian Küllig." Greifswald : Universitätsbibliothek Greifswald, 2013. http://d-nb.info/1041972199/34.
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Maritz, Ashley Amy. "Investigating the limitations of the discharge-head relationship of compound crump weirs exceeding their hydraulic capacities." Diss., University of Pretoria, 2020. http://hdl.handle.net/2263/79278.
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The variability of the South African (SA) climate results in abrupt changes in river discharge rates. Compound weirs have been implemented as an attempt to ensure accurate discharge calculations over an extended, but limited, range of flows. It would be financially and practically impossible to design compound weirs that can measure the entire range of flow rates that are experienced in SA rivers to the same degree of accuracy. Extensive research on the accuracy of weirs, within their intended hydraulic capacity, has been done over the years. However, when weirs operate above this capacity, three-dimensional flow is observed as a result of the presence of the divider and flank walls. The observed three-dimensional flow causes uncertainty in the application of the current discharge-head relationships, as these relationships were developed with the assumption of parallel flow lines. In this dissertation, a physical model study was done at the Department of Water and Sanitation hydraulic laboratories. The results indicated that the flow rates, calculated using the current discharge-head relationships, consistently over-estimates the input flow rates.
Additionally, a numerical model study using Computational Fluid Dynamics (CFD) software STAR-CCM+ was done. CFD proved to be a valuable tool for extending the domain of the study. A comparison of the physical model and numerical model results is shown with some comments on shortcomings identified in the user-defined volume mesh inputs that could not be addressed in this study due to time and resource limitations.Dissertation (MEng)--University of Pretoria, 2020.
Water Resources Engineering
MEng
Unrestricted
19
Nowak, Joshua Michael. "Examination of the Strontium Catalysis of Hydrino Reactions in a Capacitively-Coupled Audio-Frequency Cylindrical Plasma Discharge." NCSU, 2009. http://www.lib.ncsu.edu/theses/available/etd-04102009-130523/.
Full textAbstract:
Strontium catalysis may be an important aspect of a novel method of power production involving hydrino reactions. These reactions allow for the release of energy from hydrogen atoms as its electron falls to an energy state below the ground state. The thermal behavior of He-H plasmas with and without Sr present was examined. The plasmas were modeled as capacitors using the Drude model for the dielectric constant. The Joule heating of the plasmas was determined and compared with differential thermal energy to see what effect the addition of strontium had on the thermal output. Most results were inconclusive, but it was clear that plasmas with 1.01% H had a marked increase in thermal output when Sr was added. This means that there may be strontium catalysis of the hydrino process in this case and further experimentation should be done to rule out other explanations for this increase.
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Kurucu, Salur Riza. "A New Design Of Excitation Mechanism To Be Exploited By Modern Rf Excited Co2 Lasers." Master's thesis, METU, 2004. http://etd.lib.metu.edu.tr/upload/12605394/index.pdf.
Full textAbstract:
On this thesis work, design and construction of an up to date complete RF excitation system was intended. This excitation system is mainly based on highly efficient switching power generators and proper coupling of the power to the object plasma. This new excitation system design should answer the demands of today's progressed CO2 lasers on various power ranges. Though it could be used by a large variety of applications including RF plasma and RF heating, on the first occasion in order to define design considerations, this system is to be exploited by RF excited fast flow and RF excited slab CO2 laser constructions.
21
Ling, Li. "Plasma etching of dielectirc [dielectric] materials using inductively and capacitively coupled fluorocarbon discharges: mechanistic studies of the surface chemistry." College Park, Md. : University of Maryland, 2006. http://hdl.handle.net/1903/3455.
Full textAbstract:
Thesis (Ph. D.)--University of Maryland, College Park, 2006.Thesis research directed by: Material Science and Engineering. Title from t.p. of PDF. Includes bibliographical references. Published by UMI Dissertation Services, Ann Arbor, Mich. Also available in paper.
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Adabi, Firouzjaee Jafar. "Remediation strategies of shaft and common mode voltages in adjustable speed drive systems." Thesis, Queensland University of Technology, 2010. https://eprints.qut.edu.au/39293/1/Jafar_Adabi_Firouzjaeel_Thesis.pdf.
Full textAbstract:
AC motors are largely used in a wide range of modern systems, from household appliances to automated industry applications such as: ventilations systems, fans, pumps, conveyors and machine tool drives. Inverters are widely used in industrial and commercial applications due to the growing need for speed control in ASD systems. Fast switching transients and the common mode voltage, in interaction with parasitic capacitive couplings, may cause many unwanted problems in the ASD applications. These include shaft voltage and leakage currents.
One of the inherent characteristics of Pulse Width Modulation (PWM) techniques is the generation of the common mode voltage, which is defined as the voltage between the electrical neutral of the inverter output and the ground. Shaft voltage can cause bearing currents when it exceeds the amount of breakdown voltage level of the thin lubricant film between the inner and outer rings of the bearing. This phenomenon is the main reason for early bearing failures.
A rapid development in power switches technology has lead to a drastic decrement of switching rise and fall times. Because there is considerable capacitance between the stator windings and the frame, there can be a significant capacitive current (ground current escaping to earth through stray capacitors inside a motor) if the common mode voltage has high frequency components. This current leads to noises and Electromagnetic Interferences (EMI) issues in motor drive systems.
These problems have been dealt with using a variety of methods which have been reported in the literature. However, cost and maintenance issues have prevented these methods from being widely accepted. Extra cost or rating of the inverter switches is usually the price to pay for such approaches. Thus, the determination of cost-effective techniques for shaft and common mode voltage reduction in ASD systems, with the focus on the first step of the design process, is the targeted scope of this thesis. An introduction to this research – including a description of the research problem, the literature review and an account of the research progress linking the research papers – is presented in Chapter 1.
Electrical power generation from renewable energy sources, such as wind energy systems, has become a crucial issue because of environmental problems and a predicted future shortage of traditional energy sources. Thus, Chapter 2 focuses on the shaft voltage analysis of stator-fed induction generators (IG) and Doubly Fed Induction Generators DFIGs in wind turbine applications. This shaft voltage analysis includes: topologies, high frequency modelling, calculation and mitigation techniques. A back-to-back AC-DC-AC converter is investigated in terms of shaft voltage generation in a DFIG. Different topologies of LC filter placement are analysed in an effort to eliminate the shaft voltage.
Different capacitive couplings exist in the motor/generator structure and any change in design parameters affects the capacitive couplings. Thus, an appropriate design for AC motors should lead to the smallest possible shaft voltage. Calculation of the shaft voltage based on different capacitive couplings, and an investigation of the effects of different design parameters are discussed in Chapter 3. This is achieved through 2-D and 3-D finite element simulation and experimental analysis.
End-winding parameters of the motor are also effective factors in the calculation of the shaft voltage and have not been taken into account in previous reported studies. Calculation of the end-winding capacitances is rather complex because of the diversity of end winding shapes and the complexity of their geometry. A comprehensive analysis of these capacitances has been carried out with 3-D finite element simulations and experimental studies to determine their effective design parameters. These are documented in Chapter 4. Results of this analysis show that, by choosing appropriate design parameters, it is possible to decrease the shaft voltage and resultant bearing current in the primary stage of generator/motor design without using any additional active and passive filter-based techniques.
The common mode voltage is defined by a switching pattern and, by using the appropriate pattern; the common mode voltage level can be controlled. Therefore, any PWM pattern which eliminates or minimizes the common mode voltage will be an effective shaft voltage reduction technique. Thus, common mode voltage reduction of a three-phase AC motor supplied with a single-phase diode rectifier is the focus of Chapter 5. The proposed strategy is mainly based on proper utilization of the zero vectors.
Multilevel inverters are also used in ASD systems which have more voltage levels and switching states, and can provide more possibilities to reduce common mode voltage. A description of common mode voltage of multilevel inverters is investigated in Chapter 6.
Chapter 7 investigates the elimination techniques of the shaft voltage in a DFIG based on the methods presented in the literature by the use of simulation results. However, it could be shown that every solution to reduce the shaft voltage in DFIG systems has its own characteristics, and these have to be taken into account in determining the most effective strategy.
Calculation of the capacitive coupling and electric fields between the outer and inner races and the balls at different motor speeds in symmetrical and asymmetrical shaft and balls positions is discussed in Chapter 8. The analysis is carried out using finite element simulations to determine the conditions which will increase the probability of high rates of bearing failure due to current discharges through the balls and races.
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Hsiao, Chih-Hung, and 蕭志宏. "Magnetically Enhanced Dual Frequency Capacitive Discharge." Thesis, 2003. http://ndltd.ncl.edu.tw/handle/41686023723778605140.
Full textAbstract:
碩士國立東華大學
電機工程學系
91
Abstract According to the technical roadmap, the density of transistor will be double in every 18 months, therefore the size of the transistor ruled keep shrinking 0.7 in every generation. Plasma processes must be served at low enough pressure for anisotropic process relative to device scale, but the plasma density corresponding etching rate will be extremely low. A new high density plasma source with independently controlled density and ion current is needed for the future development. Magnetically enhanced dual frequency capacitive discharge has been used in oxide etcher for enhancing plasma density, decreasing ion bombardment damage, and enhancing selectivity. In this study, we calculate the parameters of the magnetically enhanced dual frequency capacitive discharge, and model the system in an equivalent circuit. Theoretically derive the sheath width, conductivity, equivalent resistance and equivalent capacitance with intensity of magnetic field, pressure and magnitude of RF power variations. An exactly solution for a dynamic variable is our attempt. The purpose is to separate linear and nonlinear effects in the discharge and try to minimize the un-predicable variation in the manufacturing process. From the plasma parameters with the intensity of magnetic field variation, we can know the plasma density increased by the magnetic enhanced capacitive discharge due to more collision chance induced from magnetic confinement, therefore ionization rate increases. These results could be obtained from our equivalent dual frequency circuit model which is mainly dominated by sheath thickness. In which, the plasma generated is controlled by the high frequency source and the low frequency source mainly control ion current. Power consumption ratio of the high frequency source and low frequency source has been computed in the plasma bulk and sheath from the equivalent circuit model.
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Kaltenboeck, Georg. "Investigation of Capacitive Discharge Heating of Metallic Glasses." Thesis, 2016. https://thesis.library.caltech.edu/9718/7/kaltenboeck_georg_2016.pdf.
Full textAbstract:
In recent years, the discovery of bulk metallic glasses with exceptional properties has generated much interest. One of their most intriguing features is their capacity for viscous flow above the glass transition temperature. This characteristic allows metallic glasses to be formed like plastics at modest temperatures. However, crystallization of supercooled metallic liquids in the best bulk metallic glass-formers is much more rapid than in most polymers and silicate glass-forming liquids. The short times to crystallization impairs experimentation on and processing of supercooled glass-forming metallic liquids. A technique to rapidly and uniformly heat metallic glasses at rates of 105 to 106 kelvin per second is presented. A capacitive discharge is used to ohmically heat metallic glasses to temperatures in the super cooled liquid region in millisecond time-scales. By heating samples rapidly, the most time-consuming step in experiments on supercooled metallic liquids is reduced orders of magnitude in length. This allows for experimentation on and processing of metallic liquids in temperature ranges that were previously inaccessible because of crystallization.
A variety of forming techniques, including injection molding and forging, were coupled with capacitive discharge heating to produce near net-shaped metallic glass parts. In addition, a new forming technique, which combines a magnetic field with the heating current to produce a forming force, was developed. Viscosities were measured in previously inaccessible temperature ranges using parallel plate rheometry combined with capacitive discharge heating. Lastly, a rapid pulse calorimeter was developed with this technique to investigate the thermophysical behavior of metallic glasses at these rapid heating rates.
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Chen, Chih-Wei, and 陳致瑋. "An Implementation Of A Single Pulsed Corona Ignited Capacitive Discharge Machining." Thesis, 2012. http://ndltd.ncl.edu.tw/handle/67201405193288605881.
Full textAbstract:
碩士臺北城市科技大學
機電整合研究所
100
The spark of Electrical discharge machining(EDM) can locally produce high temperature, which is able to erode any conductive material. Currently used EDM transfers limited energy into the gap of discharging to avoid abnormal discharging. A corona ignited capacitive discharging(CICD) method is proposed in this thesis, the method can prevent the limitation of gap energy. To study the efficiency of CICD single pulse discharging is and a testing platform is designed and manufactured in this thesis. The platform is consisted of mechanism and controller. The controller is implemented by TMS F2808 eZdsp emulation board, control code is produced via Real-Time Workshop of MATLAB, transferred from designed SIMULINK model which is designed to progress the single pulse discharging of CICD by controlling a servo motor to move electrodes. In this thesis, single pulse discharges of CICD are applied to SKD11 with different gap distance . By inspecting the eroded spot to evaluate the correlation between the efficient of CICD and discharging distance. It is found the platform and the evaluation of single pulsed CICD in this thesis will be a good reference for the innovative CICD discharging method.
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You, Jia-Wei, and 游家瑋. "Full Wave Analysis of the Electrostatic Discharge on the Capacitive Touch Panel for Cellular Phones." Thesis, 2013. http://ndltd.ncl.edu.tw/handle/71753685882498696030.
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Chang, Hsin-Chang, and 張信昌. "Numerical simulation study of hollow cathode discharge enhanced dual-frequency capacitively coupled plasma discharges." Thesis, 2018. http://ndltd.ncl.edu.tw/handle/n5xzjn.
Full textAbstract:
碩士國立清華大學
工程與系統科學系
106
Capacitively coupled plasma (CCP) sources have been widely used for material processing. The purpose of this study is to investigate the plasma characteristics and the parametric analysis of dual- frequency on HCD-CCP, and is comprehend physical mechanism. The research method is numerical simulation analysis, it adopts the two dimensional fluid model. The simulation model takes into account 3 gaseous species and 4 reactions for argon plasma. One of study is investigated the hollow cathode discharge effect (HCD) of the trench at ground electrode by operating at 27.12 MHz with CCP discharged. The simulation results show that if the width of the trench is wider than the sum of twice the thickness of the plasma sheath and electron-neutral mean free path (2ds+λ), HCD obviously generates and this result corresponds with the conditions from the HCD in the literatures. Therefore, HCD generates at the trench of ground electrode and it can tune the distribution of radial plasma density. This study has further discussion for the effect of trench size and operating parameters on HCD. The simulation results show that HCD rises with the increase of the trench depth, operating pressure, power and frequency parameters etc. The plasma discharge mechanism: When the trench depth increases, the area of trench is increased and the electron density at position of trench is promoted; As the operating pressure rises, the collisions probability between electrons and neutral particles decreases and the mean free path drops with the increase of the electron density at the position of trench; When bumping the applied power up, increasing the electron density causes the sheath thickness to become thinner; Though driving frequency rises, the plasma density is promoted with the reduce of the sheath thickness. To sum up, the above simulation results influence the plasma characteristic and effectively improve the hollow cathode discharge. In the simulation analysis of the characteristics of dual-frequency HCD-CCP, the dual radio frequency voltage of power electrode are 27.12 MHz and 2 MHz. In CCP, simulation analysis show that the low frequency voltage increases, Ion energy distribution function (IEDF) shifts to high energy level and drops; ion energy is promoted and the electron density depends slightly on the LF amplitude. Hence, the independently control effect in electron density and ion energy is better in dual frequency CCP; In HCD-CCP, the low frequency voltage increases with the electron density obviously enhanced in the position of trench and still has the HCD effect. However, compared with the results of CCP, the thickness of the sheath increases due to the plasma density decreases with the decrease of low frequency voltage, therefore, the HCD effect has a downward trend.
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Min, Timothy T. "Computational studies of electron transport and reaction rate models for argon plasma." Thesis, 2010. http://hdl.handle.net/2152/ETD-UT-2010-08-1877.
Full textAbstract:
A validation study was performed on a capacitively coupled argon discharge
to determine the most suitable models for chemistry and electron
transport. Chemical reaction rate and electron transport models choices include
equilibrium or non-equilibrium electron EDFs. Experimental studies
performed by our collaborative partners in the Colorado School of Mines.
Conditions for the studies are 138, 315, and 618 mTorr where the cycle averaged
power varied at 20, 50, and 80 Watts in which the voltage supply
was driven at 13.56 MHz. Simulations were performed using pressures and
voltage used in experiments. The most accurate case was for 138 mTorr
at 50 Watts using a non-Maxwellian EDF based chemistry (called Bolsig+
chemistry) and a constant electron momentum transfer cross section of 20
Angstroms which was computed from Boeuf’s paper; this model accurately
modeled power deposition to within 2.6%. Furthermore, species number densities, electron temperature, and sheath thicknesses are obtained. Using
Bolsig+ chemistry resulted in 20,000K higher electron temperatures than
using Arrhenius chemistry rates. Results indicate that power deposition occurs
due to electrons gaining energy from the sheath which in turn bombard
neutral species producing metastable argon.text
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Hering, Maria. "Überschlagsverhalten von Gas-Feststoff-Isoliersystemen unter Gleichspannungsbelastung." Doctoral thesis, 2015. https://tud.qucosa.de/id/qucosa%3A29421.
Full textAbstract:
Gasisolierte Systeme im Gleichspannungsbetrieb vereinen für Anwendungen moderner Energieübertragung die Forderungen nach kleinräumigen Anlagen und verlustarmem Energietransport über große Entfernungen. Für einen zuverlässigen und sicheren Betrieb muss das Verhalten der eingesetzten Gas-Feststoff-Isolierung im technologischen System bis an die Grenzen des Isolationsvermögens bekannt sein. Gegenstand der vorliegenden Arbeit ist deshalb das Überschlagsverhalten von Gas-Feststoff-Isoliersystemen unter Gleichspannungsbelastung. Dabei stehen zwei wesentliche Einflussfaktoren im Vordergrund: die Temperatur, motiviert durch reale Stromwärmeverluste, und eine feste Störstelle auf der Gas-Feststoff-Grenzfläche, motiviert durch in der Praxis nicht völlig auszuschließende, metallische Partikel. Die Effekte dieser beiden Parameter auf die Feldverteilung, die Oberflächen- und Raumladungsbildung sowie das Isolationsvermögen bei Gleichspannung werden zunächst in zwei Versuchsanordnungen separat experimentell untersucht. Anschließend wird deren Zusammenwirken und gegenseitige Beeinflussung im Gesamtsystem analysiert.
Die betriebsbedingte Erwärmung der Leiter gasisolierter Systeme führt zu einer inhomogenen Temperaturverteilung, die sich auf die Eigenschaften der Isolierstoffe Gas und Epoxidharz auswirkt. Die von der Temperatur abhängige Leitfähigkeit der Feststoffisolatoren führt zu einer temperaturabhängigen Feldverteilung, bei der sich der Ort der Höchstfeldstärke verschiebt. Dabei kann sich der Absolutwert der Höchstfeldstärke erhöhen und somit das Isolationsvermögen verringern. Gleichzeitig weist das Isoliergas nahe des erwärmten Leiters lokal eine geringere Dichte und damit eine geringere dielektrische Festigkeit auf. Die thermisch bedingte Minderung des Isolationsvermögens bei Gleichspannung beträgt in der untersuchten Anordnung (25 ... 35) %.
In den schwach inhomogenen Feldern gasisolierter Anlagen erweisen sich metallische Partikel auf Isolatoren ab drei Millimetern Länge als besonders kritisch. Bei einem Gasdruck unterhalb von 0,3 MPa setzen an den Partikelspitzen zum Teil bereits ab 50 % der Durchschlagsspannung ohne Partikel Teilentladungen ein, sodass die Koronastabilisierung zu einer vergleichsweise hohen Überschlagsspannung führt. Durch diese stabilen Glimmentladungen kann die Störstelle bei Gleichspannung durch die üblichen Detektionsverfahren jedoch nicht zweifelsfrei nachgewiesen werden. Oberhalb von 0,3 MPa treten vor dem Überschlag keine Teilentladungen auf. Aufgrund der fehlenden Koronastabilisierung kann die Isolationsfestigkeit durch einen erhöhten Gasdruck nicht oder nur stark unterproportional gesteigert werden. Die mit der Modellanordnung gewonnenen Erkenntnisse sind nachweislich auf Isolatoren kommerzieller Anlagen übertragbar.
Das in der vorliegenden Arbeit untersuchte Überschlagsverhalten von Gas-Feststoff-Isoliersystemen unter Gleichspannungsbelastung wird maßgeblich durch die Temperaturverteilung und durch feste Störstellen auf der Grenzfläche beeinflusst. Oberflächen- und Raumladungen verändern das üblicherweise ohmsch-kapazitiv beschriebene Verhalten des Isolierstoffsystems bei Gleich- und Mischspannungsbelastung. Der Einfluss zusätzlicher Ladungsträger auf die stark temperaturabhängige Feldumbildung demonstriert, dass das Isoliergas in diesem Fall mit teilchendichte- und feldstärkeabhängigen Drift- und Diffusionsprozessen zur Modellierung des transienten Verhaltens von Gleichspannungssystemen berücksichtigt werden muss. Die Untersuchung des Systemverhaltens an den Grenzen des Isolationsvermögens ist wichtiger Bestandteil bei der Entwicklung innovativer Technologien der modernen Energieübertragung bei steigender Übertragungsleistung.DC operated gas-insulated systems combine the demand for space saving installations and lowloss energy transport over long distances for applications of recent energy transmission. In order to ensure a reliable and safe operation, the behaviour of the gas-solid insulation, which is used in the technological system, has to be known up to the limits of the insulation properties. Hence, this thesis deals with the flashover behaviour of gas-solid insulation systems under DC voltage stress. Thereby, it focuses on two main influence factors: the temperature, due to real current heat losses, and an adhesive defect on the gas-solid interface, due to metallic particles that cannot be fully excluded in practice. Firstly, it is investigated experimentally in two test arrangements, how each parameter separately affects the electrical field distribution, the surface and volume charge accumulation and the insulation performance under DC voltage stress. Following that, their interaction and mutual influence is analysed in the whole system. Due to operating currents, the heating of the conductors in gas-insulated systems causes an inhomogeneous temperature distribution, that affects the properties of the insulating materials gas and epoxy resin. The temperature-dependent conductivity of the solid insulators leads to a temperature-dependent field distribution. Thereby, the location of the highest field strength is shifted. Since the absolute value of the highest field strength can increase, the insulation performance can decrease. Simultaneously, the insulating gas close to the heated conductor locally has a lower gas density and therefore a lower dielectric strength. The thermal related reduction of the insulation performance under DC voltage stress amounts to (25 ... 35) % in the investigated arrangement. Metallic particles, with a length of more than three millimetres and adhering on spacers, turn out to be particularly critical in the weakly inhomogeneous field of gas-insulated systems. At pressures below 0,3 MPa, partial discharges at the particle tips partly ignite already at 50 %of the breakdown voltage without a particle. The corona stabilisation leads to a relatively high flashover voltage. However, due to these stable glow discharges under DC voltage stress, the defect can not be unequivocally proven by usual detection methods. Above 0,3 MPa, no partial discharges occur before the flashover. Due to the missing corona stabilisation, with a higher gas pressure, the insulation strength is not or only disproportionately low increasing. The findings gained with the model arrangement are evidently applicable to spacers of commercial installations. The flashover behaviour of gas-solid insulation systems under DC voltage stress, examined in this thesis, is influenced significantly by the temperature distribution and adhesive particles on the interface. Surface and volume charges change the generally resistive-capacitive described behaviour of the insulation system under DC and superimposed voltage stress. The influence of additional charge carriers on the strongly temperature-dependent field transition demonstrates, that in this case, the insulating gas with its drift and diffusion processes, depending on the particle density and the field strength, has to be considered, when modelling the transient behaviour of DC operated systems. Investigating the system behaviour to the limits of the insulation properties is a crucial element of developing innovative technologies of the modern energy transmission at increasing transmissions powers.
30
Schulze, Felix Julian [Verfasser]. "Electron heating in capacitively coupled radio frequency discharges / von Felix Julian Schulze." 2009. http://d-nb.info/999505157/34.
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Luo, Pei Siou, and 羅培修. "Study of Indirect Capacitively Coupled Hydrogen/Argon Plasma Discharge -Experimental Study and Simulation Analysis." Thesis, 2017. http://ndltd.ncl.edu.tw/handle/nyyp6v.
Full textAbstract:
碩士國立清華大學
工程與系統科學系
105
Plasma whichs adding additional energy on gas decomposes gas molecules being ionized. Ions are accelerated and produce ion bombardment by adding an applied electric field. Ion bombardment have an important influence in the semiconductor manufacturing process. On the sputtering process, atoms on the target can be stroken by ion bombardment in plasma, and then deposited on the substrate by sputter. In the etching process, we can remove non-volatile residue eliminations by ion bombardment. In the coating process , however, the effect of ion bombardment will make surface defect to cause nonuniformity coating quality. In my study, I add a mesh which grounds in the middle of parallel electrode plates to reduce the ion flux to substrate and decrease ion bombardment by CCP. The purpose of this study is to investigate the argon/hydrogen plasma discharge for atomic layer deposition process. This plasma simulation using 2D-fluid model Included 8 reactive particles and 35 reactions. When using different pressure, the change of the H radical flux. This is main part of this study is simulation. In simulation studies, RF plasma was operated at 13.56 MHz. The electron density, electron temperature, and H number density were reached to steady state after 0.2 second. The plasma potential near two electrodes will accelerate electron and ions. There are three pressures of the simulation, changing different total pressure (400Pa、300Pa、200Pa) of the simulation. The simulation results show the pressure increasing, cause electron temperature and average potential increasing. It’s worth to mention. This case electron density is reversed. Pressure increases as the electron density increases in top chamber. Pressure increases as the electron density decrease in bottom chamber. H radicals flux are also increase when power increase. Representative more precursors reacted with the active radicals, so that the uniformity of the films can be improved. But relative to other ion flux increase, it means the ion bombardment effect increases. There is another simulation which is changing input gas ratio of H2/Ar. The simulation result is that the ratio of H2/Ar increase the H radicals flux increase. In this simulation study, if we want to let the films more uniform, in addition to increasing H radicals flux but also need to consider the ion bombardment. So it should be find an optimum balance. This study constructs a CCP system in order to create H2/Ar plasma discharge. During H2/Ar plasma discharge, Optical Emission Spectroscopy can record plasma spectrum. Those plasma spectrums are used to understand reactive particles feature.
32
Lin, Chen-I., and 林政毅. "Deposition of Hydrophobic Film with 1,1,1,2-tetrafluoroethane Plasma Based on RF-Capacitively Couple Mode Discharge." Thesis, 2011. http://ndltd.ncl.edu.tw/handle/57801278816790478386.
Full textAbstract:
碩士元智大學
化學工程與材料科學學系
99
This paper uses low pressure plasma polymerization technique to deposit fluorocarbon thin film on three substrates including in silicon wafer, polyethylene terephthalate (PET) and carbon paper. The low-pressure plasma was generated with radio frequency power at 13.56 MHz , and monomer selected for the single bond of 1,1,1,2 tetrafluoroethane (C2H2F4). The investigation studied different operational parameters including in deposition time, RF plasma power level, and system pressure. The surface characteristics of the plasma polymerized films have been analyzed by static contact static angle measurement (CA). In addition, the contact angle results based on Owen method, Advancing and receding angles method revealed that surface free energy would decrease after plasma treatment. The deposited coatings were analyzed by optical thin-film thickness detector, Atomic Force Microscopy (AFM), Fourier Transform Infrared Spectroscopy (FTIR), X-ray Photoelectron Spectroscopy (XPS) and Optical Emission Spectroscopy (OES). The luminous gas phase of plasma state in deposition process was detected by digital camera. The static contact angle of C2H2F4 plasma polymerized film can reach over 150∘. In addition, surface energy of plasma polymerized film decreased to 5 mJ/m2.. According to AFM analysis, the roughness of plasma polymerized films doesn’t change a lot. XPS and FTIR analysis indicate that the C2H2F4 plasma polymerized film mainly contains CF2 and CF species.
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Chang, Teng Yen, and 張登彥. "Study of an indirect capacitively coupled hydrogen/argon plasma discharge for atomic layer deposition process." Thesis, 2015. http://ndltd.ncl.edu.tw/handle/57333031999203764864.
Full textAbstract:
碩士國立清華大學
工程與系統科學系
103
In the recent years, the semiconductor component size getting smaller and smaller. The metal oxide semiconductor field effect manufacturing process, after the size of less than 22 nm, the semiconductor process technology will face a big challenge. So Atomic Layer Deposition(ALD) process was interested and more popular in the recent years. There are some benefits of ALD process, one of this technology can be deposited the films at the atomic size, the other can be deposited films more uniform because of gas can be reached to anywhere of the surface, and it can also deposit on non-planar. The purpose of this study is to investigate the argon/hydrogen plasma discharge for atomic layer deposition process. When using different size of the mesh size, the change of the H radical flux. There are two part of this study, simulation and experiment. In simulation studies, RF plasma was operated at 13.56 MHz. The electron density, electron temperature, and H number density were reached to steady state after 0.2 second. The plasma potential near two electrodes will accelerate electron and ions. There are three parts of the simulation, changing different mesh size (0.25mm, 0.5mm, 2mm) of the structure. And then using different power to start the simulation. The simulation results, when the power increase, the electron density, electron temperature, average potential increase. H radicals flux are also increase when power increase. Representative more precursor reacted with the active radicals, so that the uniformity of the films can be improve. But relative to other ion flux increase, it means the ion bombardment effect increases. There is another simulation which is changing input gas ratio of H2/Ar. The simulation result is that the ratio of H2/Ar increase the H radicals flux increase. In spectrum analysis, the intensity of characteristic spectral lines of Hα and Hβ decrease when pressure increase. And argon intensity of characteristic spectral lines also the same trend. In this simulation study, if we want to let the films more uniform, in addition to increasing H radicals flux but also need to consider the ion bombardment. So it should be find an optimum balance.
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Chen, Chia-Yu, and 陳佳瑜. "Numerical Simulation Study of Capacitively Coupled RF Plasma Discharges– Effect of Hollow Cathode Structure." Thesis, 2017. http://ndltd.ncl.edu.tw/handle/a96476.
Full textAbstract:
碩士國立清華大學
工程與系統科學系
105
Capacitively coupled plasma (CCP) sources have been widely used for material processing. The purpose of this study is to investigate the effect of trench on the plasma properties. In this study, CCP discharges have been investigated by fluid model numerical simulations (CFD-ACE+, ESI Corp.).In order to produce the hollow cathode discharge (HCD) to tune the plasma distribution and uniformity. This study is divided into two parts, respectively, using Argon and Carbon tetrafluoride, the discharge is generated by a 27 MHz radio frequency power.. The two-dimensional fluid model was used to simulate the plasma behavior in the plasma etching system, and the correlation between the plasma properties and the operating parameters was compared by analyzing the simulation results. The simulation model takes into account 3 gaseous species and 4 reactions for Ar. Simulation results show that, for typical operation conditions(electrode without trench),the electrons ,is around 1.11017 1/m-3,are evenly concentrated in the plasma chamber, and the sheath width on the grounded electrode is 1.2 mm. When a trench of dimension 4 mm x 8 mm is added, simulation results reveal that there is a significant modification the spatial profile of the plasma density(2.41017 1/m-3), as a result of the hollow cathode effect：Simulation results show that, for typical operation conditions, the plasma density of the CCP is enhanced by the “hollow cathode“ effect of the trench if the width of the trench is wider than twice the thickness of the plasma sheath, as expected. In addition, simulation results also demonstrate that the plasma uniformity can also be tailored by the hollow cathode effect due to a grounded electrode (GE) trench. The simulation model takes into account 11 gaseous species and 43 reactions for Ar. First, the basic plasma model (without trench) was established. The simulation results show that the F- density is concentrated in the central a very narrow region with a large spatial density gradient, so the numerical convergence results is not good . We have been tested: adjust the convergence range and change the initial value of the plasma ... but there is still the simulation calculation problem.
35
Nowak, Joshua Michael. "Examination of the strontium catalysis of hydrino reactions in an audio-frequency, capacitively coupled cylindrical plasma discharge." 2009. http://www.lib.ncsu.edu/theses/available/etd-04102009-130523/unrestricted/etd.pdf.
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Gu, Fu-Wei, and 古馥瑋. "Study of a capacitively coupled silane/hydrogen discharge by computer simulation - physical/chemical mechanism and parametric analysis." Thesis, 2011. http://ndltd.ncl.edu.tw/handle/62333466204638169793.
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碩士國立清華大學
工程與系統科學系
100
Plasma Enhance Chemical Vapor Deposition (PECVD) system is the mainly method to deposit amorphous silicon and micro-crystal film currently. It is a difficult task to enhance the deposition rate, quality of thin film and high uniformity deposition at the same time, because the quality of plasma in chamber is not easy to control. Besides, the qualities of plasma varies under different parameters, which increase the difficulty to predict them. Also, it is hard to measure and analyze the variation of particles in plasma experimentally; therefore, this study applies two dimensional fluid model in ESI CFD-ACE+ to simulate SiH4/H2 plasma. Though simulation, we can understand the basic qualities of plasma and the density and distribution of radicals, and analyze the variations of different powers, pressures and H2 dilution ratios in plasma. In the results of simulations, the different distributions of the important radicals ( SiH2 and SiH3 ) in plasma chiefly due to different production mechanisms. SiH2 is produced by the collisions between SiH4 and electrons; SiH3 is generated by the chemical reaction between SiH4 and H. With further analyzing, we realize that SiH2 and SiH3 have opposite density trend with the variation of pressure is because of different production mechanisms. In other words, with the increase of pressure, SiH2 decrease while SiH3 increase. Thus, the SiH* spectrum intensity measured by OES can't accurately response to the effects on SIH3 particles under different pressures. Finally, the change of SiH3 flux under different variation of parameters is used to represent the effect of deposition rates of thin silicon film. The ratio of H/SiH3 flux represents the variation of crystallized rate of silicon thin film. Compared with the experiment, comparative results are achieved in the simulations .
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連頌恩. "Study of a VHF capacitively coupled silane/hydrogen discharge by computer simulation – physical/chemical mechanism and parametric analysis." Thesis, 2013. http://ndltd.ncl.edu.tw/handle/19293902287493605588.
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碩士國立清華大學
工程與系統科學系
101
In the recent years, micro crystal silicon thin film is more popular on thin film solar cell. Because higher plasma density and lower ion energy, the frequency of PECVD is turning from RF region to VHF region. The goal of our study is to build a VHF-PECVD model and to find out how the plasma behavior change with control variables by simulation. For the VHF plasma in 80 MHz, electron density, electron temperature, and number density of H and SiH3 go to steady state before 60 ms. H and SiH2 are produced by electron collision reaction with SiH4, and SiH3 is produced by the reaction of H and SiH4. Because the different production reaction, the distribution of the density of H, SiH2 and SiH3 is different: the density of H and SiH2 is two-peak distribution and the density of SiH3 is bell-shaped distribution. The plasma is uniform in the radial direction in the range of a radius of 3.0 cm. In one period, the plasma potential changes with the potential of power electrode. The electric field would be created by the voltage between the plasma and electrode, and accelerate electrons and ions. When the power increase, electron density, electron temperature, number densities and fluxes of H, SiH2, and SiH3 are increased. The ratio of H and SiH3 flux is increased, too. By the result, we may say that the deposition rare and crystallization rate would increase with power. It's good for thin film deposition. When the gap between two electrodes is enlarged, the plasma density, number densities and fluxes of H, SiH2, and SiH3 and ratio of H and SiH3 flux are decreased. The result is not good for the deposition rare and crystallization rate. When the pressure is increased, the plasma density and number density of H and SiH2 are decreased. The flux of H, SiH3 and SiH2 and the ratio of H and SiH3 flux are also decreased. It means that the deposition rare and crystallization rate decrease with pressure increased. Only the number density of SiH3 doesn't change with pressure. The plasma density and electron temperature do not change when the SiH¬4 flow rate increase. But the number density of SiH3 and flux of H, SiH3 and SiH2 increase with the SiH4 flow rate. Because the flux of SiH3 increase faster than H, the ratio of H and SiH3 flux is decreased with increased SiH4 flow rate. It makes good deposition rate, but bad crystallization rate. Compare with the case in 27.12 MHz, the result shows that the voltage between plasma and electrode is much lower in 80 MHz. It makes the electron temperature lower, but higher electron density. The SiH3 density in 80 MHz grows faster with power than in 27.12 MHz. It means that the deposition rate is more sensitive with change of power. The ratio of H and SiH3 flux in 80 MHz is higher than in 27.12 MHz. We may say that crystallization rate in 80 MHz is better than in 27.12 MHz. Compare the case with pressure changing in 27.12 MHz and 80 MHz, we can find out that most of the behaviors of plasma have same tendency, beside SiH3 density. The density of SiH3 is increased with pressure in 27.12 MHz, but constant in 80 MHz. The reason might be that the producing rate of SiH3 is increased with pressure in 27.12 MHz but decrease in 80 MHz. From the simulation result, we can say that the deposition rate and crystallization rate are better with higher power, smaller gap, lower pressure and higher frequency. Increasing the flow rate of SiH4 would increase the deposition rate, but decrease the crystallization rate.
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Huang, Syuan-Wen, and 黃宣文. "Simulation Study of Capacitively Coupled Radio Frequency Silane/Hydrogen Plasma Discharges -Effect of Tailored Voltage Waveforms." Thesis, 2018. http://ndltd.ncl.edu.tw/handle/rre4r8.
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碩士國立清華大學
工程與系統科學系
107
Capacitively coupled plasma (CCP) has been widely employed for etching and deposition processes. The purpose of this study is to investigate the effect of Tailored Voltage Waveforms (TVWs) on the plasma characteristics of SiH4/H2 plasma, a fluid model based numerical simulation analysis is employed to investigate the fundamental discharge characteristics of the basic physical and chemical mechanisms occurring in the plasma reactor. The TVWs in this study divided into two categories: consist of two frequencies and four frequencies. The first type of TVWs are consist of two equal-voltage sine waves, which are the fundamental frequency 13.56 MHz and the second harmonic frequency 27.12 MHz. Different waveforms can be generated by tuning the relative phase between two frequencies. When the absolute values of positive and negative extremes in TVWs are different, the voltages across the two sheaths are different. At the phase θ = 45° and θ =135°, the difference between the absolutes of positive and negative extreme is maximum. Define these waveforms are V45 and V135, when phase angle are 45 and 135 degree. Simulation results show that when the waveform is V45, the sheath voltage in front of ground electrode is 63 and 49% lower than V135 and single frequency 13.56 MHz, respectively. It is because of the voltage in front of powered is bigger, resulting in higher electron temperature and power density at the side of power electrode. Due to the sheath voltage in front of ground electrode is smaller, thus decrease the potential gradient and ion bombardment effect. In addition to the analysis of the plasma characteristics. This study also analyzes the flux ratio of SiH2/SiH3 and H/SiH3 reaching the substrate. Simulation results showed that the SiH2/SiH3 ratio decreased approximately 50% when the waveform is V45 compared to V135. This is because the electron temperature at the ground electrode is lower when the waveform is V45, which in turn reduces the rate of formation of SiH2. However, the H/SiH3 ratio reaching the substrate is within 10% of the V135 and the single frequency 13.56 MHz. Since the defect density and crystallinity of the film directly proportional to flux ratio of SiH2/SiH3 and H/SiH3, respectively, the simulation results show that TVWs V45 can reduce the defect density in the film without affecting the crystallinity. The second type of TVWs consists of 13.56MHz and its second, third and fourth harmonic frequencies. When θ is 0 and π, the waveform define as “peak” and “valley”. Comparing with V45 and V135, these waveforms having a larger difference ratio between the absolute values of the positive voltage and the negative voltage. Simulation results show that the ion energy is the smallest in waveform “peak”, and the SiH2/SiH3 flux ratio reaching the substrate is 10% and 40% lower than V45 and single frequency 13.56 MHz, respectively. Therefore, the simulation results show that TVWs "peak" can reduce the defect density in the film but does not affect the crystallinity compared to V45 and single frequency 13.56 MHz. Finally, TVWs "peak" simulation results show that the decrease of flux ratio SiH2/SiH3 can explain the microstructure ratio decrease in the literature [3], so the film quality improve under the TVWs “peak”.
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Reinicke, Marco [Verfasser]. "Investigation of physical and chemical interactions during etching of silicon in dual frequency capacitively coupled HBr/NF3 gas discharges / Marco Reinicke." 2009. http://d-nb.info/1008186929/34.
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Heil, Brian George [Verfasser]. "Effects of the dynamic interaction between the plasma sheaths and bulk on electron heating in capacitively coupled radio-frequency discharges / von Brian George Heil." 2008. http://d-nb.info/990400093/34.
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Τσιγάρας, Ιωάννης. "Ανάπτυξη της μεθόδου μέτρησης της ισχύος και της εμπέδησης του πλάσματος στην διεργασία εναπόθεσης μικροκρυσταλλικού πυριτίου." Thesis, 2014. http://hdl.handle.net/10889/7988.
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Τις τελευταίες δεκαετίες, οι διεργασίες πλάσματος με τάση διέγερσης ραδιοσυχνότητας χρησιμοποιούνται ολοένα και περισσότερο και απαντώνται σε διάφορες εφαρμογές όπως στην εναπόθεση υλικών, στην επεξεργασία επιφανειών κα. Αυτό έχει ως αποτέλεσμα οι εκκενώσεις αίγλης ραδιοσυχνότητας να προσελκύσουν έντονο επιστημονικό ενδιαφέρον. Μπορεί τα τελευταία χρόνια να έχει σημειωθεί σημαντική πρόοδος στον τομέα αυτό ωστόσο υπάρχει ακόμα και σήμερα ενδιαφέρον που αφορά το σχεδιασμό των συστημάτων αυτών καθώς και την ανάπτυξη μεθόδων που αφορούν την επαναληψιμότητα των διεργασιών καθώς και τον έλεγχο των ιδιοτήτων του πλάσματος. Ένας από αυτούς τους τομείς είναι ο ηλεκτρικός χαρακτηρισμός ηλεκτροδίων ραδιοσυχνότητας πηγών πλάσματος και η εύρεση της κατανεμημένης εμπέδησής τους και ακολούθως ο υπολογισμός της καταναλισκόμενης ισχύος σε εκκενώσεις αίγλης. Αυτές οι τεχνικές μπορούν να μας προσφέρουν σημαντικές πληροφορίες για τους μηχανισμούς και τα φαινόμενα που λαμβάνουν χώρα σε εκκενώσεις ραδιοσυχνότητας, οι οποίες αν στη συνεχεία αξιοποιηθούν να μας οδηγήσουν στον ακριβή προσδιορισμό και έλεγχο των συνθηκών.
Στην εργασία αυτή αναλύονται μέθοδοι από τις οποίες προκύπτουν αποτελέσματα που αφορούν παραμέτρους του πλάσματος μέσω μετρήσεων τάσης, ρεύματος και διαφοράς φάσης σε κάποιο σημείο εξωτερικά του αντιδραστήρα. Παρουσιάζονται τα αποτελέσματα ηλεκτρικών μετρήσεων σε εκκενώσεις αργού που πραγματοποιήθηκαν σε μια χωρητικά συζευγμένη πηγή πλάσματος. Αρχικά παρουσιάζεται ο ηλεκτρικός χαρακτηρισμός της πηγής και αναλύονται τρεις μέθοδοι για τη μέτρηση και τον υπολογισμό της καταναλισκόμενης ισχύος της εκκένωσης. Στην πρώτη μέθοδο οι ηλεκτρικές μετρήσεις χρησιμοποιούνται για το προσδιορισμό ενός ισοδύναμου ηλεκτρικού κυκλώματος με κατανεμημένα στοιχεία (πυκνωτές, πηνία αντιστάσεις) το οποίο μπορεί να περιγράψει την εμπέδηση ανάμεσα στο σημείο μέτρησης εξωτερικά του αντιδραστήρα και την επιφάνεια του ηλεκτροδίου ραδιοσυχνότητας. Το ισοδύναμο αυτό κύκλωμα επιλύεται με βάση τους κανόνες του Kirchhoff και προκύπτουν οι τιμές της μιγαδικής τάσης και ρεύματος της εκκένωσης. Στη δεύτερη μέθοδο, η τάση καθώς και το ρεύμα της εκκένωσης υπολογίζονται μέσω ενός πίνακα ABCD, τα στοιχεία του οποίου έχουν υπολογιστεί από μετρήσεις σε ανοικτό και βραχυκυκλωμένο κύκλωμα. Η τρίτη μέθοδος, μοιάζει αρκετά με τη δεύτερη μόνο που έχει το πλεονέκτημα να είναι πιο απλή λόγω του ότι δεν απαιτεί τη μέτρηση της φάσης της εμπέδησης (της φάσης της τάσης σε σχέση με την τάση του ρεύματος).Over the last decades, plasma processing has been widely used in various applications such as the deposition of thin films, surface modification, dry etching etc. As a result, radio-frequency discharges have attracted particular scientific interest. Despite the steps forward, there are still open issues especially concerning the design of plasma systems and the effective control of plasma parameters. A part of these issues is related to the electrical characterization of the stray impedance of the plasma electrode and the subsequent measurement and calculation of the real power consumption during the process. These techniques can lead to better understanding of the plasma processes and can also lead to more stable, reliable and almost ideal performing plasma systems. The aim of this study is to point out externally measured non-intrusive plasma parameters that could ease design, control and transferability of plasma conditions. In this work we demonstrate results of electrical characteristics of argon discharges carried out in a high vacuum capacitively coupled parallel plate reactor. Initially, the electrical characterization of the plasma reactor is presented and three methods for measuring and calculating the real power consumed in the discharge are analyzed.. At the first method, the electrical measurements are used to determine a simple equivalent circuit that can describe the parasitic impedances that interfere between the point of measurement and the RF electrode’s surface. The equivalent circuit model is then solved through Kirchhoff’s laws and values of the complex electrode’s voltage and current are obtained from the measured voltage and current at some point located outside the reactor. At the second method, the reactor is treated as a two-port network. The electrode’s voltage and current are calculated through the ABCD matrix of the reactor whose values a, b, c, d are extracted from open and short circuit measurements. The third method is a simplification of the second method as it does not require the phase of the impedance (the phase of the voltage relative to the current) for the calculations.