Dissertations / Theses on the topic 'Atomic defect'
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Siegl, Manuel. "Atomic-scale investigation of point defect interactions in semiconductors." Thesis, University College London (University of London), 2018. http://discovery.ucl.ac.uk/10043636/.
Full textValikova, Irina, and Andrei Nazarov. "Pressure effects on point defect diffusion features in cubic metals: atomic simulation." Diffusion fundamentals 6 (2007) 48, S. 1-2, 2007. https://ul.qucosa.de/id/qucosa%3A14227.
Full textLee, Donghun. "Atomic Scale Gate Electrode Formed by a Charged Defect: Scanning Tunneling Microscopy of Single Impurities in GaAs Semiconductors." The Ohio State University, 2010. http://rave.ohiolink.edu/etdc/view?acc_num=osu1274913629.
Full textUppal, Hasan Javed. "Nanoscale performance, degradation and defect analysis of mos devices using high-k dielectric materials as gate stacks by atomic force microscopy." Thesis, University of Manchester, 2009. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.509394.
Full textGilbert, Mark R. "BCC metals in extreme environments : modelling the structure and evolution of defects." Thesis, University of Oxford, 2010. http://ora.ox.ac.uk/objects/uuid:d972d28d-5d2d-4392-8cf5-fc5728dc74f6.
Full textJin, Xin. "Combining RBS/Channeling, X-ray diffraction and atomic-scale modelling to study irradiation-induced defects and microstructural changes." Thesis, Limoges, 2021. http://www.theses.fr/2021LIMO0017.
Full textEnergetic particles are involved in many activities of modern society. They constitute a significant aspect of the semiconductor industry and may play important role in shaping materials in a controllable way in the future. However, their energetic nature also poses grand challenges, especially in the nuclear industry. Thus, it is crucial to have a comprehensive understanding of the underlying mechanisms of irradiation-induced defects and the associated microstructural changes. Experimentally, irradiation-induced effects can be monitored by characterization techniques including, but not limited to, Rutherford backscattering spectrometry in channeling mode (RBS/C) and X-ray diffraction (XRD), because they are extremely sensitive to changes in the crystalline structure. However, it is not straightforward to establish a clear link between the characterization results and the defect quantity and nature, and this connection is usually made according to simple phenomenological models. In this thesis work, in order to cope with this problem, we performed RBS/C and XRD atomic-scale modelling. The first step was to improve a recently developed RBS/C simulation code that can generate RBS/C signals from arbitrary atomic structures. By modifying the algorithms describing ion-solid interactions and adding new features, we enhanced the flexibility of the code and its applicability to different types of materials. Subsequently, we employed the improved RBS/C code with a XRD program to compute disordering and elastic strain kinetics of a model material, namely UO2, as a function of irradiation fluence. Radiation defects in UO2 were simulated by molecular dynamics (MD) calculations. Both the strain and disordering kinetics exhibit qualitatively close agreement with those determined experimentally, indicating the validity of the used methodology. The decomposition of the kinetics was performed in order to study the effect of each defect separately, which enables a quantitative description of the disordering and strain build-up processes. Finally, we computed RBS/C and XRD signals from Fe MD cells, each of which contains one single type of defects. A clear comparison of disorder and elastic strain induced by different types of defects in Fe was made. The relation between RBS/C yield and He energy was also studied using the Fe MD cells, which shows dependency with defect types. The global approach used in this work has the hope to be extended and tested in more materials
CARUSO, FRANCESCO. "Study of electrical conduction and defects in high-permittivity metal oxides: experiments and simulation." Doctoral thesis, Università degli Studi di Milano-Bicocca, 2022. http://hdl.handle.net/10281/382298.
Full textOriginally investigated in the electronic manufacturing to replace the SiO2 insulating layer, metal oxides are now extensively used as insulating or active layers in a multitude of electronics devices. It is known that the electrical properties are strongly correlated to atomic defects, which generate localized electronic states inside the band gap that act as charge traps. Therefore, the understanding of the physical mechanisms and the role of defects governing the charge transport in metal oxide stacks is of utmost importance for the optimization of nano-electronic devices. However, the charge transport and role of defects in metal oxides is still under debate and a complete and self-consistent understanding over large thickness, temperature and voltage regimes is not reached. In this thesis I investigated the conduction mechanisms in metal-insulator-metal (MIM) capacitors incorporating three model materials Al2O3, HfO2 and Al-doped-HfO2 (AlHfO) deposited by atomic layer deposition (ALD), in three different thicknesses 5, 10, and 20 nm. Furthermore, Hf-based oxides deposited using either water or ozone as ALD oxygen source, as well as AlHfO at two Al concentrations (5% and 17%) were analyzed. The aim of this study is to identify the charge traps properties of each material and investigate the path that electrons take within metal oxide dielectrics under applied electric field. Moreover, the impact of different manufacturing processes and film thicknesses on the material properties is discussed. Traps properties are extracted from experimental current-voltage characteristics of MIM capacitors, over a broad temperature and voltage regime, using a comprehensive charge transport model implemented in the Ginestra® (Applied Materials, Inc.) simulation software. Defects in Al2O3 are characterized by a thermal ionization energy ET≈3.5 eV below the dielectric conduction band minimum (CBM) and a relaxation energy EREL≈1 eV, in agreement with the ab-initio calculations of oxygen vacancies reported in literature. Two kinds of defects are identified in each 10 and 20 nm-thick Hf-based oxide, characterized by ET≈1.8eV for "shallow" traps, and ET≈3eV for "deep" traps. The use of water as oxygen source during the oxide ALD introduces fixed positive charges in the oxide. The introduction of Al atoms in HfO2 increases the oxide energy band gap, without significantly impacting on the density and properties of defects. The analysis allowed to identify the location of traps most involved in the conduction and the dominant transport mechanism in 20 nm-thick oxides, at each applied electric field. Despite the different properties, in each material transient displacement currents occur at low electric fields, originating from electron trapping and emission at traps near the metal/oxide interface. The transport of electrons through the oxide occurs only at higher electric fields, in two different ways. If a large density of traps is energetically located near the electrodes Fermi level (as in HfO2), the electrons tunnel from trap to trap until they reach the anode. Otherwise, when traps are closer to the conduction band (as in Al2O3 and AlHfO), the electrons tunnel from the cathode into one trap and then into the oxide conduction band, interacting only with traps near the cathode. These findings may have profound implications for the functional optimization of future nano-electronics devices. Furthermore, since in metal oxides trapping, defects generation and breakdown processes are strongly related, results can provide new insight in the breakdown process of metal oxides, impacting on device reliability.
Bagués, Salguero Núria. "Atomic and electronic structure of self-organized defects in epitaxial films of functional perovskite-type oxides." Doctoral thesis, Universitat Autònoma de Barcelona, 2017. http://hdl.handle.net/10803/405668.
Full textThe epitaxial thin films of functional perovskite-type oxides (ABO3) present interfacial coupling and misfit relaxation mechanisms governed by a complex interplay of chemical, electronic and structural degrees of freedom. The relaxation mechanisms of strained films may accommodate defects, such as misfit dislocations or twin walls, which exhibit a strong tendency towards self-organization with characteristic length scales of tens of nanometres. The core lattice structure of these defects is different from the bulk of the material and thus may be considered as a nano-phase with likely different physical properties, leading to the formation of functional nanostructures. The correlation between defect structure and functionality, together with the capacity of these defects to self-organize, offers a unique opportunity for the bottom-up elaboration of functional complex oxides nanodevices. This thesis focuses on the characterization of the microstructure, interface and self-organized defects of epitaxial films and functional nanostructures of oxide materials by using advanced transmission electron microscopy. Special emphasis is put on the atomic and chemical structure of the interfaces and generated defects, such as dislocations, twin walls and phase segregations, as well as on the strain fields and their correlation with chemical heterogeneities. In this regard, two different systems composed of lanthanum manganites are considered: LaMnO3:MnOx nanocomposite grown on (001)SrTiO3 and on (001)LaAlO3 substrates; and La0.7Sr0.3MnO3 films with self-organized defects grown on (001)SrTiO3 and on (001)LaAlO3. The materials studied in this work may be regarded as nanostructured films resulting from the self-organization of misfit relieving defects as follows: nanoinclusions of a MnOx phase (volume defects) in LaMnO3; twin walls between twin domains (planar defects) in La0.7Sr0.3MnO3 on SrTiO3; and misfit dislocations (line defects) in La0.7Sr0.3MnO3 on LaAlO3. In the LaMnO3:MnOx nanocomposite, the formation of regular vertically aligned nanoinclusions of a manganese oxide (MnOx) embedded in an LaMnO3 film is analysed via microstructural characterization. This analysis includes the determination of the LaMnO3 matrix microstructure with respect to the substrate together with the identification of the manganese oxide phase and a secondary phase: a La-rich layer close to LaMnO3-substrate interface. In the case of La0.7Sr0.3MnO3 on (001)SrTiO3 substrates, a detailed analysis of twin walls and their implications on the functional properties is performed. Local changes in the physical and structural properties of the TWs lead to the view of a twinned film as a self-organized nanostructure consisting of vertical nano-sheets of strongly compressed La0.7Sr0.3MnO3 embedded in a matrix of tensile strained La0.7Sr0.3MnO3. In the case of La0.7Sr0.3MnO3 ultrathin films grown on (001)LaAlO3, the relaxation mechanism of this films is analysed. These films relieve the misfit strain by the formation of misfit dislocations above a critical film thickness of 2.5 nm. A detailed study of structural, chemical and electronic changes associated with the dislocation is also performed paying particular attention to the influence of strain fields on chemical composition at the nanoscale. A chemical reorganization occurs to accommodate the strain at the dislocations core region. The dependence of the degree of order of the dislocation pattern on film thickness is also explored. Finally, the implications of the dislocation strain field on surface topography and electrical transport are analysed, demonstrating that the multiscale nature of dislocations holds great promise for the creation of spontaneous surface ordered functional nanostructures in complex oxide thin films.The results and main conclusions obtained in this work open new perspectives for the development of functional self-organized nanostructures based on strain relieving defects.
Khazaka, Rami. "From atomic level investigations to membrane architecture : an in-depth study of the innovative 3C-SiC/Si/3C-SiC/Si heterostructure." Thesis, Tours, 2016. http://www.theses.fr/2016TOUR4023/document.
Full textDue to its outstanding physico-chemical properties, the cubic polytype of silicon carbide (3C-SiC) gained significant interest in several fields. In particular, this material emerged as a potential candidate to replace Si in MEMS devices operating in harsh environment. The development of 3C-SiC/Si/3C-SiC heterostructures on top of Si substrate can pave the road towards original and novel MEMS devices profiting from the properties of the 3C-SiC. However, such epitaxial system suffers from wide range of defects characterizing each layer. Thus, we first tried to improve the quality of each layer in this heterostructure. This was achieved relying on two levers; (i) the optimization of the growth parameters of each layer and (ii) the understanding of the nature of defects present in each layer. These two key points combined together allowed an in-depth understanding of the limit of improvement of the overall quality of this heterostructure. After the development of the complete heterostructure, the fabrication of 3C-SiC microstructures was performed. Furthermore, we presented an unprecedented method to form free-standing 3C-SiC membranes in-situ during its growth stage. This novel technique is expected to markedly simplify the fabrication process of suspended membranes by reducing the fabrication time and cost
Drain, John Frederick. "Development of magnetic bond-order potentials for Mn and Fe-Mn." Thesis, University of Oxford, 2013. http://ora.ox.ac.uk/objects/uuid:68a01493-4a20-4d78-ad4a-6c3c2fe072d6.
Full textXu, Shuo. "A study of irradiation damage in iron and Fe-Cr alloys." Thesis, University of Oxford, 2013. http://ora.ox.ac.uk/objects/uuid:fec4b2d0-411e-4c20-862d-e5fd884367f3.
Full textLiu, Qiong. "Mechanical properties of Ti-o based ceramic nanowires." Thesis, Queensland University of Technology, 2020. https://eprints.qut.edu.au/201954/1/Qiong_Liu_Thesis.pdf.
Full textBouillaud, Pascal. "Irradiation aux ions lourds de films minces nanocristallins d'alliages FeCo et FeAl." Grenoble 2 : ANRT, 1988. http://catalogue.bnf.fr/ark:/12148/cb37612171v.
Full textDe, Souza Maria Merlyne. "Atomic level diffusion mechanisms in silicon." Thesis, University of Cambridge, 1993. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.319817.
Full textZhang, Shu Yan. "High energy white beam X-ray diffraction studies of strains in engineering materials and components." Thesis, University of Oxford, 2008. http://ora.ox.ac.uk/objects/uuid:957786c6-114c-40f1-8ee7-649c8b2522bc.
Full textRobertson, Alexander William. "Synthesis and characterisation of large area graphene." Thesis, University of Oxford, 2013. http://ora.ox.ac.uk/objects/uuid:aee750dd-41b8-4462-9efa-4e89e06e0ed7.
Full textAtkinson, Kurt James William. "Atomic scale simulation of defects in bulk materials and monolayer surfaces." Thesis, Imperial College London, 2002. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.397160.
Full textFILHO, HENRIQUE DUARTE DA FONSECA. "SEMICONDUCTOR NANOSTRUCTURE FABRICATION IN MECHANICAL DEFECTS PRODUCED BY ATOMIC FORCE MICROSCOPY." PONTIFÍCIA UNIVERSIDADE CATÓLICA DO RIO DE JANEIRO, 2008. http://www.maxwell.vrac.puc-rio.br/Busca_etds.php?strSecao=resultado&nrSeq=12973@1.
Full textA combinação de alta densidade, locais seletivos de nucleação e controle da distribuição de tamanho de nanoestruturas semicondutoras tem acelerado o desenvolvimento de dispositivos ópticos e eletrônicos. Para construir estruturas satisfazendo essas necessidades, várias combinações de técnicas deposição de pontos quânticos e nanolitografia foram desenvolvidas. A nanolitografia por AFM foi aplicada em diversos materiais abrindo uma possibilidade para fabricar dispositivos opto-eletrônicos.Nesta tese de Doutorado, apresentamos um estudo sistemático de crescimento de nanoestruturas de InAs em buracos produzidos na superfície (100) de substratos de InP por nanoindentação com o AFM. Para isto, a ponta precisa exercer uma força no InP que produz deformações plásticas na superfície. A pressão aplicada entre a extremidade da ponta de AFM e a superfície da amostra pode ser variada de modo controlado através do ajuste de alguns parâmetros operacionais do microscópio tais como setpoint, raio da ponta e constante de mola do cantilever. A habilidade para controlar a forma do padrão indentado assim como a natureza dos defeitos cristalinos permite controlar o crescimento seletivo de InAs por epitaxia em fase de vapor de metais orgânicos. Também é apresentada a fabricação de nanoestruturas de InAs/InP alinhadas em uma dimensão. A nanoindentação é produzida pelo arraste da ponta do AFM sob força constante ao longo das direções <100> e <110> do InP. Observamos que o número e o tamanho das nanoestruturas nucleadas são dependentes da distância entre as linhas litografadas. Esses resultados sugerem que o mecanismo de crescimento das nanoestruturas de InAs não é governado por degraus atômicos gerados durante a indentação. Os dados sugerem que, a densidade de defeitos induzidos mecanicamente, tais como discordâncias e fraturas, é o responsável pelo número de nanoestruturas nucleadas.
The combination of high density, site selective nucleation, and size distribution control of semiconductor nanostructures has become a challenge in the development of effective optical and electronic devices. In order to build structures satisfying these requirements, various combinations of quantum dot deposition and nanolithography techniques have been developed. The AFM nanolithography technique has been applied on several materials opening a possibility to fabricate opto-electronic devices. In this Phd Thesis, we present a systematic study of growth of InAs nanostructures on pits produced on (100) InP by nanoindentation with the AFM. For that purpose, the AFM tip needs to exert a force on the InP that produces plastic deformation on the surface. The applied pressure between the very end of the AFM tip and the sample surface may be varied in a controlled way by adjusting some of the microscope operational parameters like set point, tip radius and cantilever normal bending constant. The ability to control the shape of the indentation pattern as well as the nature of the crystalline defects allows control of the selective growth of InAs by metal organic vapor phase epitaxy. We also report the fabrication of one-dimensional arrays of InAs/InP nanostructures. The nanoindentation is produced by dragging the AFM tip under constant force of the substrate, along the <100> and <110> InP crystallographic directions. We have observed that the number and the size of nucleated nanostructures are dependent on the distance between the lithographed lines. These results suggest that the growth mechanism of the InAs nanostructures on the pits produced by AFM on InP is not governed by the number of atomic steps generated during the scratching. Instead, the data suggests that, the density of mechanically induced defects, like dislocations and cracks, are responsible for the number of nucleated nanostructures.
Chen, Qu. "Structural studies of defects in two-dimensional materials with atomic resolution." Thesis, University of Oxford, 2017. https://ora.ox.ac.uk/objects/uuid:392f2b1d-0488-4d10-96d9-817def04db2a.
Full textWatson, Stuart. "Structural relaxation at defects by Ab initio molecular dynamics." Thesis, University of Oxford, 1996. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.320648.
Full textXu, Tao. "Low-dimensional atomic-scale multiferroics in nonmagnetic ferroelectrics from lattice defects engineering." Kyoto University, 2017. http://hdl.handle.net/2433/227622.
Full textGrinolds, Michael Sean. "Nanoscale Magnetic Resonance Imaging and Magnetic Sensing Using Atomic Defects in Diamond." Thesis, Harvard University, 2014. http://dissertations.umi.com/gsas.harvard:11544.
Full textPhysics
Dudda, Bruna. "Morphology of leds by atomic force microscopy." Bachelor's thesis, Alma Mater Studiorum - Università di Bologna, 2014. http://amslaurea.unibo.it/6647/.
Full textBottomley, Joseph Anthony. "Novel application of atomic force microscopy to the analysis of barrier film defects." Thesis, University of Birmingham, 2012. http://etheses.bham.ac.uk//id/eprint/3672/.
Full textRahman, Shams ur. "Probing the effect of oxygen vacancies in strontium titanate single crystals." Thesis, University of Oxford, 2014. http://ora.ox.ac.uk/objects/uuid:0b153fd2-3aa8-4fe5-b811-8ac42b4457fa.
Full textTuesday, Andrew J. "Modeling Atomic Defects in a Two-Dimensional Lennard-Jones Lattice Using Molecular Dynamics Simulations." University of Akron / OhioLINK, 2012. http://rave.ohiolink.edu/etdc/view?acc_num=akron1334579948.
Full textSöngen, Hagen [Verfasser]. "Atomic force microscopy at mineral-water interfaces : hydration, chemical identification and point defects / Hagen Söngen." Mainz : Universitätsbibliothek Mainz, 2018. http://d-nb.info/1160611017/34.
Full textGong, Chuncheng. "Atomic structure and dynamics study of defects in graphene by aberration-corrected transmission electron microscope." Thesis, University of Oxford, 2016. https://ora.ox.ac.uk/objects/uuid:53bd9a04-71ad-4da8-b982-cb45a005e791.
Full textJohnson, Jared M. "Atomic Scale Characterization of Point Defects in the Ultra-Wide Band Gap Semiconductor β-Ga2O3." The Ohio State University, 2020. http://rave.ohiolink.edu/etdc/view?acc_num=osu1577916628182296.
Full textBîlteanu, Liviu. "Atomic scale simulation of hydrogen related defects in hydrogen implanted silicon - Smart Cut™ technology." Paris 11, 2010. http://www.theses.fr/2010PA112293.
Full textThe topic of this thesis is related to the implantation step of the Smart Cut™ technology. This technology uses hydrogen in order to transfer silicon layers on insulating substrates. The transfer is performed through a fracture induced by the formation of bidimensional defects well known in Iiterature as "platelets". More exactly, we have studied within this thesis work the defects appearing in the post implant state and the evolution of the implantation damage towards a state dominated by platelets. The study is organised into two parts: in the first part we present the results obtained by atomic scale simulations while the second part we present an infrared spectroscopy study of the evolution of defects concentrations after annealing at different temperatures. The atomic scale simulations have been performed within the density functional theory and they allowed us to compute the formation energies and the migration and recombination barriers. The defects included in our study are: the atomic and diatomic interstitials, the hydrogenated vacancies and multivacancies and the several platelets models. The obtained energies allowed us to build a stability hierarchy for these types of defects. This scheme has been confronted with some infrared analysis on hydrogen implanted silicon samples (37 keV) in a sub-dose regime which does not allow usually the formation of platelets during the implantation step. The analysis of the infrared data allowed the detailed description of the defects concentration based on the behaviour of peaks corresponding to the respective defects during annealing. The comparison between these evolutions and the energy scheme obtained previously allowed the validation of an evolution scenario of defects towards the platelet state
Messina, Luca. "Multiscale modeling of atomic transport phenomena in ferritic steels." Doctoral thesis, KTH, Reaktorfysik, 2015. http://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-177525.
Full textQC 20151123
Ghorbani, Nohadanimoghaddam Elaheh [Verfasser]. "Atomic scale defects in thin film solar cell materials from ab initio calculations / Elaheh Ghorbani Nohadanimoghaddam." Mainz : Universitätsbibliothek Mainz, 2016. http://d-nb.info/111234246X/34.
Full textGehrmann, Jan. "Transferable reduced TB models for elemental Si and N and binary Si-N systems." Thesis, University of Oxford, 2013. http://ora.ox.ac.uk/objects/uuid:002b0c99-0e9d-4d8c-a0dc-ad07383f083f.
Full textChow, Ernest Ho Hin. "The study of organic crystals by atomic force microscopy." Thesis, University of Cambridge, 2014. https://www.repository.cam.ac.uk/handle/1810/245569.
Full textEvans, Geraint Andrew. "Characterisation of point defects in SiC by microscopic optical spectroscopy." Thesis, University of Bristol, 2001. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.391196.
Full textLoth, Sebastian. "Atomic Scale Images of Acceptors in III-V Semiconductors." Doctoral thesis, Göttingen Univ.-Verl. Göttingen, 2007. http://hdl.handle.net/11858/00-1735-0000-0006-B466-2.
Full textRashetnikava, Alena, Alexander Germanov, Irina Valikova, and Andrei Nazarov. "Molecular dynamics simulation of atomic structure in the vicinity of point defects in FCC and BCC metals." Universitätsbibliothek Leipzig, 2015. http://nbn-resolving.de/urn:nbn:de:bsz:15-qucosa-190156.
Full textRashetnikava, Alena, Alexander Germanov, Irina Valikova, and Andrei Nazarov. "Molecular dynamics simulation of atomic structure in the vicinity of point defects in FCC and BCC metals." Diffusion fundamentals 11 (2009) 52, S. 1-2, 2009. https://ul.qucosa.de/id/qucosa%3A14014.
Full textChen, Jhewn-Kuang. "The role of defects during precipitate growth in a Ni-45wt% Cr alloy." Diss., This resource online, 1995. http://scholar.lib.vt.edu/theses/available/etd-06062008-162241/.
Full textNedelkoski, Zlatko. "The atomic and spin-electronic structure of interfaces and extended structural defects in the Co-based full Heusler alloys." Thesis, University of York, 2017. http://etheses.whiterose.ac.uk/16736/.
Full textHardie, Christopher David. "Micro-mechanics of irradiated Fe-Cr alloys for fusion reactors." Thesis, University of Oxford, 2013. http://ora.ox.ac.uk/objects/uuid:a3ac36ba-ca6f-4129-8f37-f1278ef8a559.
Full textBaimpas, Nikolaos. "'Hybrid' non-destructive imaging techniques for engineering materials applications." Thesis, University of Oxford, 2014. http://ora.ox.ac.uk/objects/uuid:1aa00fed-34e6-4a5e-951b-c710e21ac23c.
Full textGuttman, Jeremy. "Polymer-based Tunnel Diodes Fabricated using Ultra-thin, ALD Deposited, Interfacial Films." The Ohio State University, 2016. http://rave.ohiolink.edu/etdc/view?acc_num=osu1469125487.
Full textJackson, Christine M. "Correlations of Electronic Interface States and Interface Chemistry on Dielectric/III Nitride Heterostructures for Device Applications." The Ohio State University, 2018. http://rave.ohiolink.edu/etdc/view?acc_num=osu15257361319909.
Full textWillke, Philip [Verfasser], Martin [Akademischer Betreuer] Wenderoth, Martin [Gutachter] Wenderoth, Konrad [Gutachter] Samwer, and Rolf [Gutachter] Möller. "Atomic-scale transport in graphene: the role of localized defects and substitutional doping / Philip Willke ; Gutachter: Martin Wenderoth, Konrad Samwer, Rolf Möller ; Betreuer: Martin Wenderoth." Göttingen : Niedersächsische Staats- und Universitätsbibliothek Göttingen, 2017. http://d-nb.info/1149958421/34.
Full textReiche, Rainer. "Elektronenspektroskopie und Faktoranalyse zur Untersuchung von ionenbeschossenen Metall (Re, Ir, Cr, Fe)-Silizium-Schichten." Doctoral thesis, Saechsische Landesbibliothek- Staats- und Universitaetsbibliothek Dresden, 2000. http://nbn-resolving.de/urn:nbn:de:swb:14-994160101234-34968.
Full textPohl, Johan [Verfasser], Karsten [Akademischer Betreuer] Albe, and Hans-Werner [Akademischer Betreuer] Schock. "Structure and properties of defects in photovoltaics absorber material: Atomic scale computer simulations of Si and Cu(In,Ga)Se2 / Johan Pohl. Betreuer: Karsten Albe ; Hans-Werner Schock." Darmstadt : Universitäts- und Landesbibliothek Darmstadt, 2013. http://d-nb.info/1112268480/34.
Full textNewman, Nicholas C. "Traffic Related Air Pollution Exposure in the First Year of Life and Hyperactivity at Age Seven in a High Risk Atopic Birth Cohort." University of Cincinnati / OhioLINK, 2011. http://rave.ohiolink.edu/etdc/view?acc_num=ucin1312293718.
Full textIsik, Mehmet. "Optical And Electrical Characterization Of Ga0.75in0.25se Layered Single Crystals." Phd thesis, METU, 2013. http://etd.lib.metu.edu.tr/upload/12615314/index.pdf.
Full textReiche, Rainer. "Elektronenspektroskopie und Faktoranalyse zur Untersuchung von ionenbeschossenen Metall (Re, Ir, Cr, Fe)-Silizium-Schichten." Doctoral thesis, Technische Universität Dresden, 1999. https://tud.qucosa.de/id/qucosa%3A24738.
Full text