Journal articles on the topic 'ALD precursors'
Create a spot-on reference in APA, MLA, Chicago, Harvard, and other styles
Consult the top 50 journal articles for your research on the topic 'ALD precursors.'
Next to every source in the list of references, there is an 'Add to bibliography' button. Press on it, and we will generate automatically the bibliographic reference to the chosen work in the citation style you need: APA, MLA, Harvard, Chicago, Vancouver, etc.
You can also download the full text of the academic publication as pdf and read online its abstract whenever available in the metadata.
Browse journal articles on a wide variety of disciplines and organise your bibliography correctly.
Norman, John A., Melanie Perez, Xinjian Lei, and Hansong Cheng. "New Precursors for Copper ALD." ECS Transactions 3, no. 15 (December 21, 2019): 161–70. http://dx.doi.org/10.1149/1.2721485.
Full textKurek, Agnieszka, Peter G. Gordon, Sarah Karle, Anjana Devi, and Seán T. Barry. "Recent Advances Using Guanidinate Ligands for Chemical Vapour Deposition (CVD) and Atomic Layer Deposition (ALD) Applications." Australian Journal of Chemistry 67, no. 7 (2014): 989. http://dx.doi.org/10.1071/ch14172.
Full textZhao, Ming-Jie, Zhi-Xuan Zhang, Chia-Hsun Hsu, Xiao-Ying Zhang, Wan-Yu Wu, Shui-Yang Lien, and Wen-Zhang Zhu. "Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy." Nanomaterials 11, no. 4 (April 10, 2021): 978. http://dx.doi.org/10.3390/nano11040978.
Full textClancy, Phil, Lisa S. Milstein, Hugh Gotts, Dan Cowles, Piyamit Chitrathorn, Zhiwen Wan, Lynn Vanatta, and Qingqing Bales. "Analytical Characterization of ALD Thin Film Precursors." ECS Transactions 28, no. 1 (December 17, 2019): 349–59. http://dx.doi.org/10.1149/1.3375621.
Full textWada, Senji, Tetsuji Abe, Atsushi Sakurai, Takashi Higashino, Ryuusaku Fujimoto, and Masako Shimizu. "Development of ALD Precursors for Semiconductor Devices." ECS Transactions 16, no. 4 (December 18, 2019): 103–11. http://dx.doi.org/10.1149/1.2979985.
Full textBielinski, Ashley R., and Alex B. F. Martinson. "(Invited) Investigating Surface Reaction Thermodynamics: In Situ Calorimetry for Atomic Layer Deposition." ECS Meeting Abstracts MA2022-02, no. 31 (October 9, 2022): 1124. http://dx.doi.org/10.1149/ma2022-02311124mtgabs.
Full textLee, Wen-Jen, and Yong-Han Chang. "Growth without Postannealing of Monoclinic VO2 Thin Film by Atomic Layer Deposition Using VCl4 as Precursor." Coatings 8, no. 12 (November 27, 2018): 431. http://dx.doi.org/10.3390/coatings8120431.
Full textBarr, Maissa K. S., Sonja Stefanovic, Negar Gheshlaghi, David Zanders, Anjana Devi, and Julien Bachmann. "Direct Patterning of ZnO Deposition By Atomic-Layer Additive Manufacturing Using a Safe and Economical Precursor." ECS Meeting Abstracts MA2022-02, no. 31 (October 9, 2022): 1133. http://dx.doi.org/10.1149/ma2022-02311133mtgabs.
Full textShevate, Rahul, Vepa Rozyyev, Rajesh Pathak, Anil U. Mane, Seth B. Darling, and Jeffrey W. Elam. "Tailoring the Interfacial Interactions of Porous Polymer Membranes to Accelerate Atomic Layer Deposition: The Latent Path to Antifouling Membranes." ECS Meeting Abstracts MA2022-02, no. 31 (October 9, 2022): 1160. http://dx.doi.org/10.1149/ma2022-02311160mtgabs.
Full textPark, Jeongwoo, Neung Kyung Yu, Donghak Jang, Eunae Jung, Hyunsik Noh, Jiwon Moon, Deoksin Kil, and Bonggeun Shong. "Adsorption of Titanium Halides on Nitride and Oxide Surfaces during Atomic Layer Deposition: A DFT Study." Coatings 10, no. 8 (July 23, 2020): 712. http://dx.doi.org/10.3390/coatings10080712.
Full textWada, Senji, Atsushi Sakurai, Naoki Yamada, Tsuyoshi Watanabe, and Hiroyuki Uchiuzo. "Recent Development of ALD Precursors for Semiconductor Devices." ECS Transactions 25, no. 4 (December 17, 2019): 209–16. http://dx.doi.org/10.1149/1.3205056.
Full textKanjolia, Ravi K., J. Anthis, R. Odedra, P. Williams, and P. N. Heys. "Design and Development of ALD Precursors for Microelectronics." ECS Transactions 16, no. 4 (December 18, 2019): 79–86. http://dx.doi.org/10.1149/1.2979983.
Full textXia, Xueming, Alaric Taylor, Yifan Zhao, Stefan Guldin, and Chris Blackman. "Use of a New Non-Pyrophoric Liquid Aluminum Precursor for Atomic Layer Deposition." Materials 12, no. 9 (May 2, 2019): 1429. http://dx.doi.org/10.3390/ma12091429.
Full textWang, Xinwei. "(Invited) ALD of FeSe2, CoSe2, and NiSe2." ECS Meeting Abstracts MA2022-02, no. 31 (October 9, 2022): 1147. http://dx.doi.org/10.1149/ma2022-02311147mtgabs.
Full textSwatowska, Barbara, Wiesław Powroźnik, Halina Czternastek, Gabriela Lewińska, Tomasz Stapiński, Rafał Pietruszka, Bartłomiej S. Witkowski, and Marek Godlewski. "Application Properties of ZnO and AZO Thin Films Obtained by the ALD Method." Energies 14, no. 19 (October 1, 2021): 6271. http://dx.doi.org/10.3390/en14196271.
Full textMa, Qiang, Hansheng Guo, Roy G. Gordon, and Francisco Zaera. "Uptake of Copper Acetamidinate ALD Precursors on Nickel Surfaces." Chemistry of Materials 22, no. 2 (January 26, 2010): 352–59. http://dx.doi.org/10.1021/cm9027447.
Full textHatanpää, Timo, Marko Vehkamäki, Mikko Ritala, and Markku Leskelä. "Study of bismuth alkoxides as possible precursors for ALD." Dalton Transactions 39, no. 13 (2010): 3219. http://dx.doi.org/10.1039/b918175j.
Full textDarapaneni, Pragathi, Anil U. Mane, Zachary D. Hood, and Jeffrey W. Elam. "Conversion Reactions and Redox Changes on the Surface of Lithium-Ion Battery Cathode Materials during Chemical Vapor Treatment for ALD." ECS Meeting Abstracts MA2022-02, no. 31 (October 9, 2022): 1140. http://dx.doi.org/10.1149/ma2022-02311140mtgabs.
Full textMohammad, Adnan, Deepa Shukla, Saidjafarzoda Ilhom, Brian Willis, Ali Kemal Okyay, and Necmi Biyikli. "Comparative Study on in-situ Ellipsometric Monitoring of III-Nitride Film Growth via Plasma-Enhanced Atomic Layer Deposition." International Journal of High Speed Electronics and Systems 28, no. 03n04 (September 2019): 1940020. http://dx.doi.org/10.1142/s0129156419400202.
Full textHagen, D. J., L. Mai, A. Devi, J. Sainio, and M. Karppinen. "Atomic/molecular layer deposition of Cu–organic thin films." Dalton Transactions 47, no. 44 (2018): 15791–800. http://dx.doi.org/10.1039/c8dt03735c.
Full textBlagoev, B. S., D. A. Delibatov, V. B. Mehandzhiev, P. Sveshtarov, P. Terziyska, I. Avramova, and P. M. Rafailov. "Optimization of atomic layer deposition of Al2O3 films as possible template for graphene transfer." Journal of Physics: Conference Series 2240, no. 1 (March 1, 2022): 012002. http://dx.doi.org/10.1088/1742-6596/2240/1/012002.
Full textSeweryn, Aleksandra, Krystyna Lawniczak-Jablonska, Piotr Kuzmiuk, Sylwia Gieraltowska, Marek Godlewski, and Robert Mroczynski. "Investigations of Structural and Electrical Properties of ALD Films Formed with the Ozone Precursor." Materials 14, no. 18 (September 18, 2021): 5395. http://dx.doi.org/10.3390/ma14185395.
Full textHan, Seong Ho, Raphael Edem Agbenyeke, Ga Yeon Lee, Bo Keun Park, Chang Gyoun Kim, Young Kuk Lee, Seung Uk Son, and Taek-Mo Chung. "Synthesis and characterization of novel zinc precursors for ZnO thin film deposition by atomic layer deposition." Dalton Transactions 49, no. 14 (2020): 4306–14. http://dx.doi.org/10.1039/c9dt04644e.
Full textBarr, Maissa K. S., Baolin Zhao, Peter Von Grundherr, Vanessa Koch, Jaroslav Charvot, Marcus Halik, Filip Bures, and Julien Bachmann. "Solution ALD: A Versatility Process for the Growth of Sulfides and Selenides." ECS Meeting Abstracts MA2022-02, no. 31 (October 9, 2022): 1148. http://dx.doi.org/10.1149/ma2022-02311148mtgabs.
Full textSegal-Peretz, Tamar. "(Invited) ALD-Based Infiltration and Growth of Inorganic Materials in Polymers." ECS Meeting Abstracts MA2022-02, no. 31 (October 9, 2022): 1158. http://dx.doi.org/10.1149/ma2022-02311158mtgabs.
Full textLiu, Kuang-I., Chi-Chung Kei, Mrinalini Mishra, Po-Hsun Chen, Wei-Szu Liu, and Tsong-Pyng Perng. "Uniform coating of TiO2 on high aspect ratio substrates with complex morphology by vertical forced-flow atomic layer deposition." RSC Advances 7, no. 55 (2017): 34730–35. http://dx.doi.org/10.1039/c7ra04853j.
Full textObuchovsky, S., I. Deckman, M. Moshonov, T. Segal Peretz, G. Ankonina, T. J. Savenije, and G. L. Frey. "Atomic layer deposition of zinc oxide onto and into P3HT for hybrid photovoltaics." J. Mater. Chem. C 2, no. 42 (2014): 8903–10. http://dx.doi.org/10.1039/c4tc01629g.
Full textPowell, Rory, Jungwoo Lim, Alex R. Neale, Paul R. Chalker, and Laurence J. Hardwick. "Atomic Layer Vs. Sol-Gel Deposited Coatings for Long Cycle-Life Li-Ion Battery Positive Electrodes." ECS Meeting Abstracts MA2022-01, no. 4 (July 7, 2022): 515. http://dx.doi.org/10.1149/ma2022-014515mtgabs.
Full textBlakeney, Kyle J., Philip D. Martin, and Charles H. Winter. "Aluminum dihydride complexes and their unexpected application in atomic layer deposition of titanium carbonitride films." Dalton Transactions 47, no. 32 (2018): 10897–905. http://dx.doi.org/10.1039/c8dt02508h.
Full textHanrahan, Brendan, Cosme Milesi-Brault, Asher Leff, Alexis Payne, Shi Liu, Mael Guennou, and Nicholas Strnad. "The other model antiferroelectric: PbHfO3 thin films from ALD precursors." APL Materials 9, no. 2 (February 1, 2021): 021108. http://dx.doi.org/10.1063/5.0035730.
Full textViolet, Perrine, Ioana Nuta, Christian Chatillon, and Elisabeth Blanquet. "On gaseous phase of ALD precursors by means of thermodynamics." ECS Transactions 25, no. 8 (December 17, 2019): 567–73. http://dx.doi.org/10.1149/1.3207641.
Full textHatanpää, Timo, Viljami Pore, Mikko Ritala, and Markku Leskelä. "Alkylsilyl Compounds of Selenium and Tellurium: New Precursors for ALD." ECS Transactions 25, no. 8 (December 17, 2019): 609–16. http://dx.doi.org/10.1149/1.3207647.
Full textLeskelä, Markku, and Mikko Ritala. "Atomic layer deposition (ALD): from precursors to thin film structures." Thin Solid Films 409, no. 1 (April 2002): 138–46. http://dx.doi.org/10.1016/s0040-6090(02)00117-7.
Full textRushworth, Simon, Kathleen Coward, Hywel Davies, Peter Heys, Thomas Leese, Louis Kempster, Rajesh Odedra, Fuquan Song, and Paul Williams. "Thermal stability studies for advanced Hafnium and Zirconium ALD precursors." Surface and Coatings Technology 201, no. 22-23 (September 2007): 9060–65. http://dx.doi.org/10.1016/j.surfcoat.2007.04.050.
Full textKaur, Parmish, Arbresha Muriqi, Jan-Lucas Wree, Ramin Ghiyasi, Muhammad Safdar, Michael Nolan, Maarit Karppinen, and Anjana Devi. "Atomic/molecular layer deposition of cerium(iii) hybrid thin films using rigid organic precursors." Dalton Transactions 51, no. 14 (2022): 5603–11. http://dx.doi.org/10.1039/d2dt00353h.
Full textHuang, Liang, Bo Han, Maohong Fan, and Hansong Cheng. "Design of efficient mono-aminosilane precursors for atomic layer deposition of SiO2 thin films." RSC Advances 7, no. 37 (2017): 22672–78. http://dx.doi.org/10.1039/c7ra02301d.
Full textKatamreddy, Rajesh, Ronald Inman, Gregory Jursich, Axel Soulet, and Christos Takoudis. "Atomic layer deposition of HfO2, Al2O3, and HfAlOx using O3 and metal(diethylamino) precursors." Journal of Materials Research 22, no. 12 (December 2007): 3455–64. http://dx.doi.org/10.1557/jmr.2007.0439.
Full textFontecha, Daniela, R. Blake Nuwayhid, Alexander C. Kozen, David M. Stewart, Gary W. Rubloff, and Keith E. Gregorczyk. "Low temperature plasma-enhanced atomic layer deposition of sodium phosphorus oxynitride with tunable nitrogen content." Journal of Vacuum Science & Technology A 40, no. 3 (May 2022): 032403. http://dx.doi.org/10.1116/6.0001752.
Full textSundberg, Pia, and Maarit Karppinen. "Organic and inorganic–organic thin film structures by molecular layer deposition: A review." Beilstein Journal of Nanotechnology 5 (July 22, 2014): 1104–36. http://dx.doi.org/10.3762/bjnano.5.123.
Full textZhang, Yichi, Yangyao Ding, and Panagiotis D. Christofides. "Integrating Feedback Control and Run-to-Run Control in Multi-Wafer Thermal Atomic Layer Deposition of Thin Films." Processes 8, no. 1 (December 21, 2019): 18. http://dx.doi.org/10.3390/pr8010018.
Full textWang, Ching-Yu, Kai Shen, Raymond J. Gorte, and John M. Vohs. "Preparation of SBA-15-Supported Metals by Vapor-Phase Infiltration." Inorganics 10, no. 11 (November 19, 2022): 215. http://dx.doi.org/10.3390/inorganics10110215.
Full textDey, Gangotri, Jacqueline S. Wrench, Dirk J. Hagen, Lynette Keeney, and Simon D. Elliott. "Quantum chemical and solution phase evaluation of metallocenes as reducing agents for the prospective atomic layer deposition of copper." Dalton Transactions 44, no. 22 (2015): 10188–99. http://dx.doi.org/10.1039/c5dt00922g.
Full textHeiska, Juho, Mikko Nisula, Eeva-Leena Rautama, Antti J. Karttunen, and Maarit Karppinen. "Atomic/molecular layer deposition and electrochemical performance of dilithium 2-aminoterephthalate." Dalton Transactions 49, no. 5 (2020): 1591–99. http://dx.doi.org/10.1039/c9dt04572d.
Full textNilsen, Ola. "(Tutorial) ALD Precursors and Processes for Alkali Metal-Containing Thin Films." ECS Meeting Abstracts MA2021-02, no. 29 (October 19, 2021): 846. http://dx.doi.org/10.1149/ma2021-0229846mtgabs.
Full textDussarrat, C. "Design, Synthesis and ALD Assessment of Organometallic Precursors for Semiconductor Applications." ECS Transactions 64, no. 9 (August 13, 2014): 233–41. http://dx.doi.org/10.1149/06409.0233ecst.
Full textIwanaga, Kohei, Ken-ichi Tada, Hirokazu Chiba, Toshiki Yamamoto, Atsushi Maniwa, Tadahiro Yotsuya, and Noriaki Oshima. "Development of Novel Silicon Precursors for Low-Temperature CVD/ALD Processes." ECS Transactions 41, no. 2 (December 16, 2019): 211–18. http://dx.doi.org/10.1149/1.3633670.
Full textGaskell, Jeffrey M., Anthony C. Jones, Kate Black, Paul R. Chalker, Thomas Leese, Andrew Kingsley, Rajesh Odedra, and Peter N. Heys. "Liquid injection MOCVD and ALD of ZrO2 using Zr–cyclopentadienyl precursors." Surface and Coatings Technology 201, no. 22-23 (September 2007): 9095–98. http://dx.doi.org/10.1016/j.surfcoat.2007.04.098.
Full textHatanpää, Timo, Mikko Ritala, and Markku Leskelä. "Precursors as enablers of ALD technology: Contributions from University of Helsinki." Coordination Chemistry Reviews 257, no. 23-24 (December 2013): 3297–322. http://dx.doi.org/10.1016/j.ccr.2013.07.002.
Full textVerdonck, P., A. Delabie, J. Swerts, L. Farrell, M. R. Baklanov, H. Tielens, E. Van Besien, T. Witters, L. Nyns, and S. Van Elshocht. "Chemisorption of ALD precursors in and on porous low-k films." Microelectronic Engineering 106 (June 2013): 81–84. http://dx.doi.org/10.1016/j.mee.2013.01.004.
Full textWang, Xinwei. "(Invited) Surface Thermolysis of ALD Precursors and Its Implications for Deposition." ECS Meeting Abstracts MA2020-02, no. 23 (November 23, 2020): 1667. http://dx.doi.org/10.1149/ma2020-02231667mtgabs.
Full text