Academic literature on the topic 'Advanced-Device'
Create a spot-on reference in APA, MLA, Chicago, Harvard, and other styles
Consult the lists of relevant articles, books, theses, conference reports, and other scholarly sources on the topic 'Advanced-Device.'
Next to every source in the list of references, there is an 'Add to bibliography' button. Press on it, and we will generate automatically the bibliographic reference to the chosen work in the citation style you need: APA, MLA, Harvard, Chicago, Vancouver, etc.
You can also download the full text of the academic publication as pdf and read online its abstract whenever available in the metadata.
Journal articles on the topic "Advanced-Device"
Smathers, Ralph L. "Advanced Breast Biopsy Instrumentation Device." American Journal of Roentgenology 175, no. 3 (September 2000): 801–3. http://dx.doi.org/10.2214/ajr.175.3.1750801.
Full textPriporov, I. E. "ADVANCED DEVICE FOR FEED’S MIXING." Техника и технологии в животноводстве, no. 3 (2022): 63–68. http://dx.doi.org/10.51794/27132064-2022-3-63.
Full textHicham, Magri, Noreddine Abghour, and Mohammed Ouzzif. "Device-To-Device (D2D) Communication Under LTE-Advanced Networks." International Journal of Wireless & Mobile Networks 8, no. 1 (February 29, 2016): 11–22. http://dx.doi.org/10.5121/ijwmn.2016.8102.
Full textLei Lei, Zhangdui Zhong, Chuang Lin, and Xuemin Shen. "Operator controlled device-to-device communications in LTE-advanced networks." IEEE Wireless Communications 19, no. 3 (June 2012): 96–104. http://dx.doi.org/10.1109/mwc.2012.6231164.
Full textLiu, Jiajia, Nei Kato, Jianfeng Ma, and Naoto Kadowaki. "Device-to-Device Communication in LTE-Advanced Networks: A Survey." IEEE Communications Surveys & Tutorials 17, no. 4 (2015): 1923–40. http://dx.doi.org/10.1109/comst.2014.2375934.
Full textZhang, Dan, Xiaojing Su, Hao Chang, Hao Xu, Xiaolei Wang, Xiaobin He, Junjie Li, et al. "Advanced process and electron device technology." Tsinghua Science and Technology 27, no. 3 (June 2022): 534–58. http://dx.doi.org/10.26599/tst.2021.9010049.
Full textSingh, Sonali. "Advanced CO2 Sensing Device in Vehicle." International Journal for Research in Applied Science and Engineering Technology 8, no. 7 (July 31, 2020): 28–33. http://dx.doi.org/10.22214/ijraset.2020.7007.
Full textLee, A., T. Usmonov, B. Norov, and S. Melikuziev. "Advanced device for cleaning drain wells." IOP Conference Series: Materials Science and Engineering 883 (July 21, 2020): 012181. http://dx.doi.org/10.1088/1757-899x/883/1/012181.
Full textIWASAKI, Kiyotaka. "Advanced Medical Device and Regulatory Science." Journal of the Society of Mechanical Engineers 118, no. 1155 (2015): 85–88. http://dx.doi.org/10.1299/jsmemag.118.1155_85.
Full textHasegawa, Hideki. "Advanced mesoscopic device concepts and technology." Microelectronic Engineering 53, no. 1-4 (June 2000): 29–36. http://dx.doi.org/10.1016/s0167-9317(00)00262-8.
Full textDissertations / Theses on the topic "Advanced-Device"
Feng, Junyi. "Device-to-Device Communications in LTE-Advanced Network." Télécom Bretagne, 2013. http://www.telecom-bretagne.eu/publications/publication.php?idpublication=14215.
Full textDevice-to-device (D2D) communication is a promising new feature in LTE-Advanced networks. It is brought up to enable efficient discovery and communication between proximate devices. With D2D capability, devices in physical proximity could be able to discover each other using LTE radio technology and to communicate with each other via a direct data path. This thesis is concerned with the design, coordination and testing of a hybrid D2D and cellular network. Design requirements and choices in physical and MAC layer functions to support D2D discovery and communication underlaying LTE networks are analyzed. In addition, a centralized scheduling strategy in base station is proposed to coordinate D2D data communication operating in LTE spectrum. The scheduling strategy combines multiple techniques, including mode selection, resource and power allocation, to jointly achieve an overall user performance improvement in a cell. Finally the performances of D2D data communication underlaying LTE system are calibrated in a multi-link scenario via system-level simulation
Wu, Yue. "Advanced technologies for device-to-device communications underlaying cellular networks." Thesis, University of Sheffield, 2016. http://etheses.whiterose.ac.uk/15391/.
Full textLin, Meifang. "Robust organic light emitting device with advanced functional materials and novel device structures." HKBU Institutional Repository, 2008. http://repository.hkbu.edu.hk/etd_ra/939.
Full textHadimani, Ravi L. "Advanced magnetoelastic and magnetocaloric materials for device applications." Thesis, Cardiff University, 2009. http://orca.cf.ac.uk/54960/.
Full textRickard, Jonathan James Stanley. "Advanced micro-engineered platforms for novel device technologies." Thesis, University of Birmingham, 2018. http://etheses.bham.ac.uk//id/eprint/8303/.
Full textWu, Dongping. "Novel concepts for advanced CMOS : Materials, process and device architecture." Doctoral thesis, KTH, Microelectronics and Information Technology, IMIT, 2004. http://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-3805.
Full textThe continuous and aggressive dimensional miniaturization ofthe conventional complementary-metal-oxide semiconductor (CMOS)architecture has been the main impetus for the vast growth ofIC industry over the past decades. As the CMOS downscalingapproaches the fundamental limits, unconventional materials andnovel device architectures are required in order to guaranteethe ultimate scaling in device dimensions and maintain theperformance gain expected from the scaling. This thesisinvestigates both unconventional materials for the gate stackand the channel and a novel notched-gate device architecture,with the emphasis on the challenging issues in processintegration.
High-κ gate dielectrics will become indispensable forCMOS technology beyond the 65-nm technology node in order toachieve a small equivalent oxide thickness (EOT) whilemaintaining a low gate leakage current. HfO2and Al2O3as well as their mixtures are investigated assubstitutes for the traditionally used SiO2in our MOS transistors. These high-κ filmsare deposited by means of atomic layer deposition (ALD) for anexcellent control of film composition, thickness, uniformityand conformality. Surface treatments prior to ALD are found tohave a crucial influence on the growth of the high-κdielectrics and the performance of the resultant transistors.Alternative gate materials such as TiN and poly-SiGe are alsostudied. The challenging issues encountered in processintegration of the TiN or poly-SiGe with the high-k are furtherelaborated. Transistors with TiN or poly-SiGe/high-k gate stackare successfully fabricated and characterized. Furthermore,proof-of-concept strained-SiGe surface-channel pMOSFETs withALD high-κ dielectrics are demonstrated. The pMOSFETs witha strained SiGe channel exhibit a higher hole mobility than theuniversal hole mobility in Si. A new procedure for extractionof carrier mobility in the presence of a high density ofinterface states found in MOSFETs with high-κ dielectricsis developed.
A notched-gate architecture aiming at reducing the parasiticcapacitance of a MOSFET is studied. The notched gate is usuallyreferred to as a local thickness increase of the gatedielectric at the feet of the gate above the source/drainextensions. Two-dimensional simulations are carried out toinvestigate the influence of the notched gate on the static anddynamic characteristics of MOSFETs. MOSFETs with optimizednotch profile exhibit a substantial enhancement in the dynamiccharacteristics with a negligible effect on the staticcharacteristics. Notched-gate MOSFETs are also experimentallyimplemented with the integration of a high-κ gatedielectric and a poly-SiGe/TiN bi-layer gate electrode.
Key words:CMOS technology, MOSFET, high-κ, gatedielectric, ALD, surface pre-treatment, metal gate, poly-SiGe,strained SiGe, surface-channel, buried-channel, notchedgate.
Chang, Ruey-dar. "Physics and modeling of dopant diffusion for advanced device applications /." Digital version accessible at:, 1998. http://wwwlib.umi.com/cr/utexas/main.
Full textXu, Zhenxue. "Advanced Semiconductor Device and Topology for High Power Current Source Converter." Diss., Virginia Tech, 2003. http://hdl.handle.net/10919/11068.
Full textPh. D.
Wong, Chun Wai. "Device technology and baseband switch for the advanced on-board processing satellites." Thesis, University of Surrey, 1988. http://epubs.surrey.ac.uk/843454/.
Full textTanenbaum, Laura Melanie. "Design of an intraperitoneal drug-release device for advanced ovarian cancer therapy." Thesis, Massachusetts Institute of Technology, 2016. http://hdl.handle.net/1721.1/104610.
Full textCataloged from PDF version of thesis.
Includes bibliographical references (pages 111-121).
More than 14,000 women in the United States die from ovarian cancer each year. The standard of care is tumor-debulking surgery followed by adjuvant chemotherapy. Combination intraperitoneal (IP) and intravenous (IV) chemotherapy has been shown to lengthen survival over IV therapy alone. Large-volume infusions, drug-associated toxicity, and catheter-associated complications, however, increase morbidity and limit patient adherence, often resulting in discontinuation of IP therapy. The technical skill required for catheter implantation and IP chemotherapy administration has also limited its clinical adoption. The proposed solution is an implantable IP device capable of localized drug delivery that maintains the efficacy of the standard of care and overcomes current clinical challenges. A reservoir-based device was developed to release cisplatin at a constant rate. In vivo studies demonstrated that continuous dosing reduces tumor burden to the same extent as weekly IP injections. The implanted device induced significantly less systemic toxicity compared to IP injections, despite administration of higher cumulative doses. A subsequent in vitro study revealed that greater tumor shrinkage following continuous cisplatin exposure was achieved with smaller tumor nodules. These results support that an implanted device would be maximally effective against microscopic residual disease. In vitro results also illustrated that a human-scale device fabricated from orifice-lined silicone can be designed to release cisplatin continuously at the desired rate. The promising preclinical results in this thesis highlight the potential for this novel IP dosing regimen to improve the treatment of late-stage ovarian cancer and set the stage for development of the proposed human device.
by Laura Melanie Tanenbaum.
Ph. D. in Medical Engineering and Medical Physics
Books on the topic "Advanced-Device"
C, Hopkins Robert, and United States. National Aeronautics and Space Administration. Scientific and Technical Information Branch., eds. Advanced underwater lift device. [Washington, DC]: National Aeronautics and Space Administration, Scientific and Technical Information Branch, 1993.
Find full textG, Einspruch Norman, and Gildenblat Gennady Sh, eds. Advanced MOS device physics. San Diego: Academic Press, 1989.
Find full textTibor, Grasser, ed. Advanced device modeling and simulation. Singapore: World Scientific, 2003.
Find full textHanrahan, Jamie E. VMS advanced device driver techniques. Spring House, PA: Professional Press, 1988.
Find full textBaliga, B. Jayant. Advanced High Voltage Power Device Concepts. New York, NY: Springer New York, 2012. http://dx.doi.org/10.1007/978-1-4614-0269-5.
Full textAdvanced semiconductor device physics and modeling. Boston: Artech House, 1993.
Find full textSchenk, Andreas. Advanced physical models for silicon device simulation. Wien: Springer, 1998.
Find full textSchenk, Andreas. Advanced Physical Models for Silicon Device Simulation. Vienna: Springer Vienna, 1998. http://dx.doi.org/10.1007/978-3-7091-6494-5.
Full textSemenov, Oleg, Hossein Sarbishaei, and Manoj Sachdev. ESD Protection Device and Circuit Design for Advanced CMOS Technologies. Dordrecht: Springer Netherlands, 2008. http://dx.doi.org/10.1007/978-1-4020-8301-3.
Full textHossein, Sarbishaei, and Sachdev Manoj, eds. ESD protection device and circuit design for advanced CMOS technologies. [Dordrecht]: Springer, 2008.
Find full textBook chapters on the topic "Advanced-Device"
Jiang, Fengyi. "Advanced Optoelectronic Device Processing." In Handbook of GaN Semiconductor Materials and Devices, 285–301. Boca Raton : Taylor & Francis, CRC Press, 2017. | Series: Series in optics and optoelectronics: CRC Press, 2017. http://dx.doi.org/10.1201/9781315152011-8.
Full textDegiorgis, Giorgio, and Francesca Illuzzi. "Advanced Technologies for ULSI Device Production." In High Energy Density Technologies in Materials Science, 133–38. Dordrecht: Springer Netherlands, 1990. http://dx.doi.org/10.1007/978-94-009-0499-6_11.
Full textJeong, Yong Mu, Ki-Taek Lim, and Seung Eun Lee. "Advanced Sensing Device for Gesture Recognition." In Lecture Notes in Electrical Engineering, 63–66. Berlin, Heidelberg: Springer Berlin Heidelberg, 2012. http://dx.doi.org/10.1007/978-3-642-27296-7_11.
Full textKolbesen, B. O. "Defect Aspects of Advanced Device Technologies." In Crucial Issues in Semiconductor Materials and Processing Technologies, 3–25. Dordrecht: Springer Netherlands, 1992. http://dx.doi.org/10.1007/978-94-011-2714-1_1.
Full textLi, Simon, and Yue Fu. "Advanced Theory of TCAD Device Simulation." In 3D TCAD Simulation for Semiconductor Processes, Devices and Optoelectronics, 41–80. New York, NY: Springer New York, 2011. http://dx.doi.org/10.1007/978-1-4614-0481-1_3.
Full textCham, Kit Man, Soo-Young Oh, John L. Moll, Keunmyung Lee, Paul Vande Voorde, and Daeje Chin. "Simulation Techniques for Advanced Device Development." In The Kluwer International Series in Engineering and Computer Science, 167–95. Boston, MA: Springer US, 1988. http://dx.doi.org/10.1007/978-1-4613-1695-4_8.
Full textKazmerski, Lawrence L. "Advanced Materials and Device Analytical Techniques." In Advances in Solar Energy, 1–123. Boston, MA: Springer US, 1986. http://dx.doi.org/10.1007/978-1-4613-2227-6_1.
Full textSivula, Kevin. "Advanced Device Architectures and Tandem Devices." In Photoelectrochemical Solar Fuel Production, 493–512. Cham: Springer International Publishing, 2016. http://dx.doi.org/10.1007/978-3-319-29641-8_12.
Full textDas, Koushik. "Advanced Topic 1: Adding Device Management Functions." In Create an Enterprise-Level Test Automation Framework with Appium, 271–310. Berkeley, CA: Apress, 2022. http://dx.doi.org/10.1007/978-1-4842-8197-0_17.
Full textNishi, Yoshitake, and Kazunori Tanaka. "Advanced CFRM Joint Device for Mover Engineering." In Solid State Phenomena, 185–88. Stafa: Trans Tech Publications Ltd., 2007. http://dx.doi.org/10.4028/3-908451-33-7.185.
Full textConference papers on the topic "Advanced-Device"
"Advanced Device Structures." In 2006 International Semiconductor Conference. IEEE, 2006. http://dx.doi.org/10.1109/smicnd.2006.284000.
Full textChang, Chih-Sheng, and Akira Hokazono. "CMOS Devices - Advanced Device Structures." In 2007 IEEE International Electron Devices Meeting. IEEE, 2007. http://dx.doi.org/10.1109/iedm.2007.4419091.
Full textHumphreys, Heather, Wayne J. Book, and Grace Deetjen. "Advanced patient transfer assist device." In 2018 International Symposium on Medical Robotics (ISMR). IEEE, 2018. http://dx.doi.org/10.1109/ismr.2018.8333290.
Full textDoppler, K., M. P. Rinne, P. Janis, C. Ribeiro, and K. Hugl. "Device-to-Device Communications; Functional Prospects for LTE-Advanced Networks." In 2009 IEEE International Conference on Communications Workshops. IEEE, 2009. http://dx.doi.org/10.1109/iccw.2009.5208020.
Full textThrimurthulu, V., and N. S. Murti Sarma. "Device-to-device communications in long term evaluation-advanced network." In 2017 International Conference on Intelligent Computing and Control Systems (ICICCS). IEEE, 2017. http://dx.doi.org/10.1109/iccons.2017.8250577.
Full textYang, MiJeong, KwangRyul Jung, SoonYong Lim, and JaeWook Shin. "Development of device-to-device communication in LTE-Advanced system." In 2014 IEEE International Conference on Consumer Electronics (ICCE). IEEE, 2014. http://dx.doi.org/10.1109/icce.2014.6776080.
Full textShrestha, P., K. P. Cheung, J. P. Campbell, J. T. Ryan, and H. Baumgart. "Fast-capacitance for advanced device characterization." In 2013 IEEE International Integrated Reliability Workshop (IIRW). IEEE, 2013. http://dx.doi.org/10.1109/iirw.2013.6804147.
Full textRavaioli, Umberto. "Advanced methods for silicon device modeling." In 2010 10th Topical Meeting on Silicon Monolithic Integrated Circuits in RF Systems (SiRF). IEEE, 2010. http://dx.doi.org/10.1109/smic.2010.5422994.
Full textZolper, John C. "Advanced device technologies for defense systems." In 2012 70th Annual Device Research Conference (DRC). IEEE, 2012. http://dx.doi.org/10.1109/drc.2012.6256988.
Full textWang, Yun, Shaoyin Chen, Xiaoru Wang, and Michael Shen. "Millisecond annealing for advanced device fabrications." In 2014 20th International Conference on Ion Implantation Technology (IIT). IEEE, 2014. http://dx.doi.org/10.1109/iit.2014.6940020.
Full textReports on the topic "Advanced-Device"
Beasley, M. R., A. Kapitulnik, T. H. Geballe, and R. H. Hammond. Advanced Superconducting Materials and Device Concepts. Fort Belvoir, VA: Defense Technical Information Center, July 2001. http://dx.doi.org/10.21236/ada388285.
Full textHu, Chenming, and Jeffrey Bokor. Advanced Silicon FET Physics and Device Structures. Fort Belvoir, VA: Defense Technical Information Center, December 1998. http://dx.doi.org/10.21236/ada372474.
Full textAndrew, Marilee, and Lawrence Crum. An Acoustic Hemostasis Device for Advanced Trauma Care. Fort Belvoir, VA: Defense Technical Information Center, October 2001. http://dx.doi.org/10.21236/ada398720.
Full textStout, P., and A. J. Przekwas. An Advanced CAD Tool for Quantum Device Simulation. Fort Belvoir, VA: Defense Technical Information Center, June 1999. http://dx.doi.org/10.21236/ada364061.
Full textMekhiche, Mike, Hiz Dufera, and Deb Montagna. Advanced, High Power, Next Scale, Wave Energy Conversion Device. Office of Scientific and Technical Information (OSTI), October 2012. http://dx.doi.org/10.2172/1097434.
Full textMcCall, Alan, and Alex Fleming. Advanced Controls for the Multi-pod Centipod WEC device. Office of Scientific and Technical Information (OSTI), February 2016. http://dx.doi.org/10.2172/1237967.
Full textSchaff, William J., S. D. Offsey, and Lester F. Eastman. Advanced Technology for Improved Quantum Device Properties Using Highly Strained Materials. Fort Belvoir, VA: Defense Technical Information Center, March 1991. http://dx.doi.org/10.21236/ada233109.
Full textSchaff, W. J., S. D. Offsey, H. Park, and L. F. Eastman. Advanced Technology for Improved Quantum Device Properties Using Highly Strained Materials. Fort Belvoir, VA: Defense Technical Information Center, June 1989. http://dx.doi.org/10.21236/ada225695.
Full textLing, Bradley A. Final Technical and Scientific Report: Advanced Control of the Azura Wave Energy Device. Office of Scientific and Technical Information (OSTI), July 2018. http://dx.doi.org/10.2172/1608489.
Full textBooske, J. H., J. Scharer, R. M. Gilgenbach, and Y. Y. Lau. Instrumentation for Advanced, Slow-Waved, Microwave Vacuum Electron Device Research and Graduate Education. Fort Belvoir, VA: Defense Technical Information Center, March 2001. http://dx.doi.org/10.21236/ada389249.
Full text