Dissertations / Theses on the topic 'Advance Device Applications'
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Hadimani, Ravi L. "Advanced magnetoelastic and magnetocaloric materials for device applications." Thesis, Cardiff University, 2009. http://orca.cf.ac.uk/54960/.
Full textChang, Ruey-dar. "Physics and modeling of dopant diffusion for advanced device applications /." Digital version accessible at:, 1998. http://wwwlib.umi.com/cr/utexas/main.
Full textAnderson, Adam Ashurst William Robert. "Designer silica layers for advanced applications processing and properties /." Auburn, Ala, 2009. http://hdl.handle.net/10415/1707.
Full textNath, Digbijoy N. "Advanced polarization engineering of III-nitride heterostructures towards high-speed device applications." The Ohio State University, 2013. http://rave.ohiolink.edu/etdc/view?acc_num=osu1376927078.
Full textde, Barros Correia Kyotoku Bernardo. "Applications of optical coherence tomography and advances into a photonic integrated device." Universidade Federal de Pernambuco, 2011. https://repositorio.ufpe.br/handle/123456789/6125.
Full textConselho Nacional de Desenvolvimento Científico e Tecnológico
Tomografia por coerência óptica (OCT) é uma técnica de imageamento não invasiva que usa radiação infravermelho para sondar alguns milímetros the profundidade de um alvo com um resolução de poucos micrômetros. Aqui, nós expomos a base teórica para entender a técnica. O texto cobre as duas variedades de OCT domínio temporal e domínio da frequência e descreve três aplicações da técnica em odontologia: a) Um na avalição the propagação rachaduras em polímeros reforçado com fibra usado em restauração dental; b) O imageamento da sobra de dentina e cavidade pulpar após excavação da dentina, com o propósito de medir a espessura da dentina, e c) uma avaliação clínica da integridade de restaurações dentais. Em todas essa aplicações, OCT gerou imagens marcantes e forneceu informações semiquatitativas sobre a estrura dentária. Com o objetivo de desenvolver um sistema de tomografia óptica integrada em um chip. Nós expomos a base teórica da plataforma de fotônica integrada. Após uma revisão literária, nós descobrimos que não existe espectrômetro integrado com a especificações necessárias para uso em OCT. Nós, então, desenvolvemos um espectrômetro com a características necessárias. Isso foi possível devido a uma nova arquitetura de espectrômetro baseada na combinação de um ressoador em anel e um espectrômetro de grade de difração
Shi, Jindan D. "Periodic fibre devices for advanced applications in all-optical systems." Thesis, University of Southampton, 2012. https://eprints.soton.ac.uk/346809/.
Full textZhou, Zhou. "An advanced gray-scale technology and its applications to micro-devices." Diss., [La Jolla] : University of California, San Diego, 2009. http://wwwlib.umi.com/cr/ucsd/fullcit?p3356395.
Full textTitle from first page of PDF file (viewed July 9, 2009). Available via ProQuest Digital Dissertations. Vita. Includes bibliographical references (p. 155-161).
CALIL, VANESSA LUZ E. "DEVELOPMENT OF ADVANCED POLYMERIC SUBSTRATES FOR APPLICATION IN FLEXIBLE ORGANIC DEVICES." PONTIFÍCIA UNIVERSIDADE CATÓLICA DO RIO DE JANEIRO, 2010. http://www.maxwell.vrac.puc-rio.br/Busca_etds.php?strSecao=resultado&nrSeq=16334@1.
Full textNeste trabalho, desenvolveram-se dois tipos de substratos flexíveis para dispositivos orgânicos. Para tal, usou-se o termoplástico comercial de alto desempenho, poli(éter imida) (PEI), e a celulose bacteriana (CB), um polímero natural e biocompatível comumente utilizado como pele artificial. Os filmes de PEI foram fabricados com boa transparência óptica no visível, flexibilidade e ausência de poros, enquanto os filmes de CB foram utilizados como recebidos. Filmes finos de óxido de índio dopado com estanho (ITO) foram depositados sobre os filmes, utilizando a técnica de rf-sputtering, a fim de torná-los condutores elétricos para serem utilizados em dispositivos. Os valores de resistividade elétrica dos substratos modificados foram aprimorados através da variação dos parâmetros de deposiçãoo dos filmes de ITO. Os menores valores de resistividade alcançados foram 3, 27 × 10(-4) omega· cm para os substratos de PEI e 3, 70×10(-4) omega· cm para os de CB, comparáveis ao valor alcançado para os substratos de vidro [3, 66×10(-4) omega·cm], utilizados como referência. Além disso, devido às ótimas propriedades térmicas da PEI, os filmes de ITO sobre este material e sobre vidro passaram por um tratamento térmico a fim de baixar ainda mais o valor da resistividade. Após este tratamento, os valores de resistividade baixaram para 2, 88×10(-4) omega·cm e 3, 41 × 10(-4) omega· cm, para a PEI e o vidro, respectivamente. Os resultados obtidos são comparáveis ou melhores àqueles obtidos por outros autores em diferentes substratos, com e sem tratamento térmico, e mostraram-se promissores para o desenvolvimento de dispositivos orgânicos flexíveis.
In this work, it has developed two types of flexible substrates for organic devices. For this purpose, it was used the commercial high-performance thermoplastic, poly(ether imide) (PEI), and a natural and biocompatible polymer commonly used as artificial skin, bacterial cellulose (BC). PEI films were fabricated with good optical transparency in the visible range of spectra, flexibility and absence of pores, while the CB films were used as received. Thin films of indium tin oxide (ITO) were deposited on those films using rf magnetron sputtering in order to turn them electrical conductors for using in organic devices. The electrical resistivity of the modified substrates was improved by varying the ITO films deposition parameters. The lowest achieved resistivity was 3.27 × 10(-4) omega· cm for PEI substrates and 3.70×10(-4) omega·cm for CB substrates, comparable to the reference substrate (glass) 3.66 × 10(-4) omega· cm. In addition, due to the excellent thermal properties of PEI, ITO films on this material and on glass substrates were thermally treated to further improvement of its electrical properties. After this treatment, the resistivity values decreased to 2.88 × 10-4 ! · cm and 3.41× 10(-4) omega· cm for PEI and glass substrates, respectively. The obtained results are comparable or better than those obtained by other authors on different substrates, with and without heat treatment, establishing these materials as outstanding substrates for the development of flexible organic devices.
Crozier, Stuart. "The design and application of advanced field generating devices for magnetic resonance /." [St. Lucia, Qld.], 2001. http://www.library.uq.edu.au/pdfserve.php?image=thesisabs/absthe16299.pdf.
Full textLim, ChangDuk. "Materials properties of ruthenium and ruthenium oxides thin films for advanced electronic applications." Thesis, University of North Texas, 2006. https://digital.library.unt.edu/ark:/67531/metadc5592/.
Full textLahr, Rebecca Halvorson. "Advanced Applications of Raman Spectroscopy for Environmental Analyses." Diss., Virginia Tech, 2014. http://hdl.handle.net/10919/54010.
Full textPh. D.
Asadi, Peyman. "Development and application of an advanced switched reluctance generator drive." [College Station, Tex. : Texas A&M University, 2006. http://hdl.handle.net/1969.1/ETD-TAMU-1102.
Full textCheng, Cheng. "Semiconductor colloidal quantum dots for photovoltaic applications." Thesis, University of Oxford, 2014. http://ora.ox.ac.uk/objects/uuid:07baccd0-2098-4306-8a9a-49160ec6a15a.
Full textSalem, Ali F. "Advanced numerical simulation modeling for semiconductor devices and it application to metal-semiconductor-metal photodetectors." Diss., Georgia Institute of Technology, 1995. http://hdl.handle.net/1853/13834.
Full textMat, Jubadi Warsuzarina. "Modelling of advanced submicron gate InGaAs/InAlAs pHEMTs and RTD devices for very high frequency applications." Thesis, University of Manchester, 2016. https://www.research.manchester.ac.uk/portal/en/theses/modelling-of-advanced-submicron-gate-ingaasinalas-phemts-and-rtd-devices-for-very-high-frequency-applications(4688a951-f235-4720-93e4-441eabcce44a).html.
Full textHua, Xin. "ADVANCED STUDIES ON TRANSFER IMPEDANCE WITH APPLICATION TO AFTER-TREATMENT DEVICES AND MICRO-PERFORATED PANEL ABSORBERS." UKnowledge, 2013. http://uknowledge.uky.edu/me_etds/30.
Full textKovacik, Peter. "Vacuum deposition of organic molecules for photovoltaic applications." Thesis, University of Oxford, 2012. http://ora.ox.ac.uk/objects/uuid:98461a90-5ae3-4ae3-9245-0f825adafa72.
Full textDalcanale, Stefano. "Reliability analysis of GaN HEMT for space applications and switching converters based on advanced experimental techniques and two dimensional device simulations." Doctoral thesis, Università degli studi di Padova, 2017. http://hdl.handle.net/11577/3425311.
Full textIl nitruro di gallio è un promettente materiale a semiconduttore con ampio energy gap. Tramite dispositivi bastai su GaN è possibile raggiungere frequenze operative e densità di potenza maggiori in confronto al silicio. Il primo transistor HEMT (High Electron Mobility Transistor) basato su GaN è stato sviluppato nel 1995, e dopo vent'anni questa tecnologia inizia ad essere pronta a competere sul mercato con dispositivi basati su silicio. Ci sono diversi motivi per cui è servito del tempo per ottenere una tecnologia stabile. A differenza del silicio, non è possibile crescere cristalli di nitruro di gallio partendo da un seme, non almeno con costi, qualità e dimensioni ragionevoli. Perciò è necessario crescere il nitruro di gallio su substrati diversi, come il carburo di silicio, lo zaffiro o il silicio. Perciò, i cristalli ottenuti hanno una concentrazione di difetti che limita le prestazioni dei dispositivi. Con l'ottimizzazione del processo e l'introduzione di un adeguato strato di transizione, detto nucleation layer, è possibile ottenere dei wafer con una difettività tollerabile. Il problema principale introdotto dai difetti sono gli stati trappola e questioni di affidabilità. Gli stati trappola danno problemi durante il funzionamento dei transistor, creando un calo temporaneo della caratteristica di uscita. Oltre a questo fenomeno temporaneo gli HEMT basati su GaN presentano problemi di affidabilità, ampiamente studiati in passato. Al giorno d'oggi il tempo di vita medio stimato delle ultime generazioni di transistor permette la produzione di dispositivi elettronici sia per il settore commerciale che per applicazioni spaziali. In questo lavoro sarà presentato un riassunto delle attività di ricerca svolte durante il dottorato. Nella prima parte è presentato un riepilogo dello stato dell'arte della tecnologia GaN-HEMT. Negli ultimi due anni in letteratura sono stati dimostrati nuovi risultati, rivelando un notevole miglioramento tecnologico. Verrà poi presentato un breve riassunto sui fenomeni di trapping e sull'affidabilità, che risulterà fondamentale per comprendere al meglio i risultati ottenuti. Le attività di ricerca hanno coinvolto le due applicazioni principali dei transistor GaN-HEMT: i dispositivi RF e i transistor di potenza. Per applicazioni RF il transistor è usato come amplificatore, in un range di frequenze tra 1 GHz e 100 GHz. Le applicazioni principali sono radar e telecomunicazioni per telefonia mobile, radio e satellitare. Ho collaborato in un progetto dell'Agenzia Spaziale Europea dal titolo: “Preliminary Validation of Space Compatible Foundry Processes”. Verranno presentati i risultati della valutazione dell'affidabilità svolta in questo progetto. Lo scopo era di validare la tecnologia GaN-HEMT per applicazioni spaziali, provando a stimare il tempo di vita dei dispositivi e i meccanismi di guasto. Vedremo come la tecnologia analizzata sia stabile, con un tempo di vita stimato che oltrepassa i vent'anni. Ciò nonostante, non sono ancora chiari tutti i meccanismi di guasto, ma è stata trovata qualche caratteristica tipica del degrado legata alla metallizzazione di gate. Dal lato dei transistor di potenza verranno riportati prima i risultati ottenuti nella collaborazione con ON Semiconductor, nello sviluppo di dispositivi MISHEMT normally-on. Il nostro ruolo era di dare un feedback all'azienda riguardo alle performance dei dispositivi, in particolare in termini di resistenza in on-state. Questo rappresenta infatti uno dei problemi maggiori dei transistor GaNHEMT che lavorano in condizioni switching ed è dovuto a fenomeni di trapping. Poi, è stato sviluppata una nuova procedura di misura che permette di testare i dispositivi in condizione vicine a quelle operative. Questo nuovo setup è stato d'aiuto per dimostrare l'eccezionale stabilità delle ultime generazioni di transistor. Ora questa tecnologia è pronta per lavorare a 600 V con prestazioni migliori di quelle del silicio. La seconda parte relativa ai dispositivi di potenza parlerà del lavoro svolto presso il Ferdinand-Braun-Institut, Leibniz-Institut für Hochfrequenztechnik (FBH), a Berlino. L'obiettivo principale era quello di investigare l'affidabilità dei dispositivi p-GaN sviluppati presso il centro di ricerca, tramite stress in on-state a lungo termine. La corrente di leakage di gate è sospettata di essere uno dei problemi principali per l'affidabilità di questo tipo di dispositivi in on-state. Tuttavia, non ci sono tanti lavori in letteratura che analizzano il problema, e si vedrà come i test svolti aiutano a consolidare uno dei modelli proposti. In questa analisi è stato fondamentale il ruolo delle simulazioni, a cui è stato riservato un capitolo a parte. Le simulazioni sono state di grande aiuto nella comprensione dei meccanismi di guasto e hanno permesso di avere una visione completa dei meccanismi di conduzione e dei punti deboli del dispositivo. In questo modo possono essere date informazioni essenziali a chi sviluppa i transistor, in particolare quali sono le regioni del dispositivo che andrebbero migliorate.
Avdić, Amer [Verfasser]. "Development and Application of Numerical Methods for the Simulation of Advanced Combustion Processes within Complex Devices / Amer Avdic." Aachen : Shaker, 2015. http://d-nb.info/1067734716/34.
Full textChoi, Hyeok. "Novel Preparation of Nanostructured Titanium Dioxide Photocatalytic Particles, Films, Membranes, and Devices for Environmental Applications." University of Cincinnati / OhioLINK, 2007. http://rave.ohiolink.edu/etdc/view?acc_num=ucin1176943161.
Full textWu, Yimin A. "Towards large area single crystalline two dimensional atomic crystals for nanotechnology applications." Thesis, University of Oxford, 2012. http://ora.ox.ac.uk/objects/uuid:bdb827e5-f3fd-4806-8085-0206e67c7144.
Full textMING-RU, YEN, and 顏民儒. "Relief Device Applications of Advanced High-tech Plant of Influencing FactorsRelief Device Applications of Advanced High-tech Plant of Influencing Factors." Thesis, 2013. http://ndltd.ncl.edu.tw/handle/31300651964686326925.
Full text中州科技大學
工程技術研究所
101
With the development of technology, human’s reliability on a growing technology convenience has increase. Technology not only bring in convenience buy also brings enormous benefits worth. As the development of high-tech industry companies, the incoming disasters are more serious and dangerous compare to traditional industry plant. This research is focusing on the safety device in these high-tech plants. The multi directions research will suggest the safety device for these high tech plants. In this study, are surveys base on people who related to these high-tech facility. After analysis the result, suggesting high-tech plants by focusing on the safety device operator training when they purchase these safety device. Increase the safety device usage efficiency, and economical cost. In the future research, the researchers are able to increase the research area throughout the country with similar high-tech plants. This research can be the basic data for the future research, and able to focus on research analysis on other influence effect, or difference between each background effect.
Mashraei, Yousof. "Advanced MTJ Sensory Devices for Industrial and Healthcare Applications." Diss., 2019. http://hdl.handle.net/10754/653126.
Full textXi, Peng-bo, and 奚鵬博. "Study of Advance Tungsten Nano-crystal for Non-Volatile Memory Device Application." Thesis, 2007. http://ndltd.ncl.edu.tw/handle/8ctkby.
Full text國立中山大學
光電工程研究所
95
Recently, memory-cells employing discrete traps as the charge storage media have been attracting a lot of attention as a promising candidate to replace conventional DRAM or Flash memories. Conventional floating gate (FG) non-volatile memories (NVMs) present critical issues on device scalability beyond the sub-50nm node. In achieving non-volatility in conventional FG memories, thicker control and tunnel oxide (~8nm) are required to guarantee longer retention time. Relatively, nano-dots memories causes more resistant leakage charges by localized storage sites, thus improving the device retention characteristics. Hence, nano-dots memories allow more aggressive scaling of the tunnel oxide and exhibit superior characteristics compared to Flash memories in term of operation voltage, write / erase speed, retention time and endurance. The advantages of metal nano-dots compared with other material counterparts include higher density of states , stronger coupling with the channel, better size scalability, and the design freedom of engineering the work function to optimize device characteristics. However, tungsten nano-dots are the most interested in all of metal dots is that tungsten metal has more extra attractive advantages, such as ultra high melting point make high process temperature caused superior thermal stability of device and wide application in VLSI technology nowadays caused real possibility of tungsten nano-dots NVMs fabricated in industry in practice. This dissertation is divided into four sections: (1) discussion of basic properties for tungsten nano-dots memory devices; (2) Tunneling Oxide Engineering,; (3) Improvement by novel processes; and (4) The influence with supercritical CO2 (SCCO2) and vapor treatment. Initially, formative mechanism of tungsten nano-dots and electrical characteristics of devices was investigated in the first section. Tungsten nano-dots were formed by oxidizing tungsten silicide / amorphous silicon double stack film at high temperature condition. From electrical measurement, the better characteristics have been achieved for oxidation condition at 1050°C / 120 sec. Secondly, the rapid thermal anneal (RTA) oxidation is used to grow tunnel oxide by two different forming gas (O2/N2O). Comparison of electrical characteristics, program characteristics of the device using tunnel oxide with N2O process is inferior than the common device. However, endurance is a important electrical characteristics in the semiconductor device especially apply on the non-volatile memory. Thirdly, novel processes were employed into fabrication of tungsten nano-dots memory devices, include the N2O oxidation and NH3 plasma treatment. The purpose of novel processes is production additional trapping states in nonvolatile memories, which is considerably as combination nano-dots with SONOS structure. In the final section, the application of supercritical CO2 with vapor on tungsten nano-dots memoery devices have been studying. It is found that the device treated by SCCO2 which electrical characteristics is improved obviously. Furthermore, this technology also can fabricate the nano-dots memory which is like the device used high temperature oxidation process. It suggests that the SCCO2 with vapor treatment could oxidize silicide film under a low temperature environment. This novel oxidation process has some advantages and could be noticed in the semiconductor industry.
Gu, Chia-Chen, and 古佳朕. "The Study of Advanced Energy Storage Device Applications in Distributed Generator System." Thesis, 2011. http://ndltd.ncl.edu.tw/handle/17624932343399031620.
Full text清雲科技大學
電機工程所
99
The aim of this study is to create a self sufficient, environmentally friendly, and sustainable energy source by using solar fuel cells and advanced energy storage devices as the primary energy source for a distributed power system. Solar energy is affected by time of the day and climate changes. As a result, fuel concentration is inconsistent and the power is unstable. The advanced energy storage system stores electricity generated from solar panels, fuel cells in batteries. The charging and discharging system controls the energy storage to keep the power system stable. This is especially important when solar energy and fuel cell are in low voltage. To achieve a stable power system the digital signal processor (TMS320LF2407) of digital power conversion solar changing system is the main control centre in the system. It''s energy conversion efficiency is 84.5%. Using the advanced energy storage devices and distributed power generation systems, we can reduce electricity usage during peak hours, thus reducing cost. The results reinforces the current ideas of environmental preservation and sustainability.
Yu, Chen-Chieh, and 游振傑. "Applications of Advanced Lithography on Chemical Sensors and Optoelectronic Devices." Thesis, 2010. http://ndltd.ncl.edu.tw/handle/06366049407770191639.
Full text臺灣大學
材料科學與工程學研究所
98
Advanced lithography has been widely applied on the field of optoelectroincs. Because of the advantages of fast manufacturing and convenience, advanced lithography is competive againest tranditional photolithography and e-beam lithography. In this article, we successfully fabricated one-dimensional corrugated structure and two-dimensional hexagonal hole array on gold films. Because these subwavelength periodical metal structures are capable to induce surface plasmon resonance, they have the potential to be chemical sensors. We fabricate a chemical sensor based on one-dimensional corragted gold film and demonstrate that this chemical sensor possesses extremely high sensitivity. Moreover, the comparison between the chemical sensors based on one-dimensional and two dimensional strucuture is also carried out in this article. Besides, we used the dual side nanoimprint lithography to fabricate a high aspect ratio gratings strucuture on PC substrate. This subwavlength gratings structure has demonstrated the form birefringence, and thus has the potential to be optical wave plate. With contolling the filling factor and trench depth of the gratings structure, we successfully fabricate a 1/8 wave plate that works at 633nm. Moreover, with stacking numerical wave plate together, we can obtain any amount of phase retardation. This stacking-wave plate method is suitable for any working wavelength if we presicely control the trench depth of each gratings-based wave plate. In the last, we use the colloidal lithography to fabricate a transparent electrode based on metal nanomesh structure. For applying on photovoltaic devices, the nanomesh metal electrode has the advantages of highly optical transmittance and excellent conductivity. The period and diameter of the hexagonal hole array on nanomesh can be tuned by the fabricating parameters of colloidal lithography. The organic solar cells associated with the transparent nanomesh electrode demonstrate a high power conversion efficiency, and we conclude that the metal nanomesh electrode is a promising candidate for replacing traditional conductive oxide such as ITO.
(7887626), Wonil Chung. "Integration of Ferroelectricity into Advanced 3D Germanium MOSFETs for Memory and Logic Applications." Thesis, 2019.
Find full textKuo, Yung-Ting, and 郭昀庭. "Application of Advanced Capacity Spectrum to Structure Equipped with Damping Devices." Thesis, 2006. http://ndltd.ncl.edu.tw/handle/24363242139568100017.
Full text逢甲大學
土木工程所
94
In recent year, the cost of conventional design is raised with promoting the earthquake-resist standard and economic benefits has not been found as before. Government and academia are actively to encourage and investigate how to promote the earthquake-resist capability of structure. Passive control technology has been proved as the efficient method in seismic mitigation by analysis, experiment and real application. Among earthquake proof devices, reinforced added damping and stiffness (RADAS) with sufficient ductility and stable behavior is acknowledged as the efficient energy dissipation device, and this device possess some advantages such as low cost in fabrication, convenient for installation and maintenance. Therefore, RADAS is widely used to absorb the energy induced by earthquake on the real life practice. In this thesis, the transform method which replaces the properties of RADAS is used to construct the capacity spectrum of structure with RADAS, and expect to simplify the nonlinear analysis process for structure with RADAS.
Lin, Chia-Chun, and 林家駿. "Advanced Electronic Devices Development and Applications Based on Metal-Insulator-Metal Structure." Thesis, 2014. http://ndltd.ncl.edu.tw/handle/9g42u3.
Full text國立清華大學
工程與系統科學系
103
This thesis focuses on the advanced devices based on the metal-insulator-metal (MIM) structure, the first one is MIM capacitor, and another one is resistive random access memory (RRAM). The first part is MIM capacitor, our works revolve around how to suppress the quadratic voltage coefficient of capacitance, so called, VCC-α. However, VCC-α will become larger as the dielectric constant of oxide increases that brings out our main goal, how to increase the capacitance density but suppress VCC-α at the same time. In this part, we adopted amorphous TiO2 and Y2O3 stack as dielectric of MIM capacitor, the main reason is that yttrium has larger atom radius would let TiO2 maintain in amorphous phase. Hence, after annealed TiO2/Y2O3 shows higher capacitance density but TiO2 stays in amorphous state at the same time. Due to capacitance density and VCC-α has an inverse relationship, so we need to utilize another way called “canceling effect” of VCC-α. Canceling effect is achieved by two different oxide films, one has positive VCC-α and another one has negative VCC-α. Compare to adopt only one oxide film, once stack these two oxide films the effective VCC-α will become smaller due to positive VCC-α and negative VCC-α compensates each other. Furthermore, by utilizing the crystalline TiO2 to get higher capacitance density, but the VCC-α will become larger rapidly at the same time. To reduce the VCC-α, nitrogen plasma treatment on the surface of crystalline TiO2 was adopted; moreover, to further suppress the VCC-α, SiO2 is stacked on the crystalline TiO2 because of SiO2 has negative VCC-α that can compensate the positive VCC-α introduced by crystalline TiO2. In this work, MIM capacitor shows 30 ppm/V2 of VCC-α, 11.2 fF/μm2 of capacitance density, these results fit the requirements of MIM capacitor in 2018 by ITRS. But compare to novel metal oxide, SiO2 has much lower dielectric constant (κ) value, so the next part is replacing SiO2 to ZrTiOx. It is worth to mention that ZrTiOx demonstrates negative VCC-α characteristic like SiO2, but has much higher κ value, 22.5. Thus, the results of this work we got a much higher capacitance density of 14.38 fF/μm2 and 68 ppm/V2 of VCC-α. In the RRAM topic, we spent lots of effort to discuss how the property of ZrTiOx affects the electrical characteristics of RRAM. First, we explored the influence of crystalline ZrTiOx compared to amorphous one. Second, we examined how the position of IL effects switching mechanism, based on this, we planned three experiments each has different IL position, one has no IL, another has an IL on the bottom electrode and the last one has IL on the both top and bottom electrode. In this series experiments, we found that amorphous ZrTiOx demonstrates better uniformity, lower switching voltage, faster switching speed and larger sense margin; on the other hand, the position of IL is a critical factor that affects switching voltage, thus, IL could be modulated to achieve higher switching speed and better power consumption. In summary, one-sided IL shows better electrical characteristics. In addition, if we want to achieve higher storage capacity, 3D stack structure is an inevitable solution; however, to avoid the misread situation due to unexpected current flow, for one RRAM device we need another diode to form a 1D1R structure. In this work, we combined a simple metal-semiconductor diode and a RRAM to a TaN/ZrTiOx/Ni/n+-Si structure, the advantages are following, first, this structure is compatible with the incumbent ULSI technology; second, reduced the cost due to discard the expensive and hardly processing metal, such as W and Pt. Additionally, this structure is combined the one-sided IL formation that will further improve the electrical characteristics of RRAM.
Shuo-MaoChen and 陳碩懋. "Studies of CMOS Process Comparable Novel Devices for Advanced Radio Frequency Applications." Thesis, 2011. http://ndltd.ncl.edu.tw/handle/97073244577784517759.
Full textLee, Cheng-Han, and 李承翰. "SiGe Epitaxial Growth by Ultra-high Vacuum Chemical Vapor Deposition and the Advanced Device Applications." Thesis, 2011. http://ndltd.ncl.edu.tw/handle/28715082626403206268.
Full text國立臺灣大學
電子工程學研究所
99
SiGe epitaxial growth by ultra-high vacuum chemical vapor deposition has been investigated in this dissertation. The SiGe quantum dots (QDs) and nanorings were fabricated for the applications of the photodetectors, while the SiGe quantum wells (QWs) and the SiGe graded buffer layers (GBLs) were fabricated for the applications of the metal-oxide-semiconductor field effect transistors (MOSFETs) and the insulator-gate field effect transistors (IGFETs). In the first part of this thesis, the growth mechanisms of the SiGe QWs and SiGe QDs have been discussed. The carrier gas effects on the growth of the QWs and QDs are also discussed. The hydrogen passivation, which can influence the Ge concentration and the strain in the SiGe nanostructures, plays a crucial role in the SiGe QWs and SiGe QDs growth. Moreover, the device applications are also introduced. The MOSFETs fabricated from the SiGe QWs grown on Si(100), Si(110), and Si(111) have been discussed. The higher mobility in the <110> direction of Si and SiGe is due to the smaller conductive effective mass. The quantum dot infrared photodetectors (QDIPs) made by the multi-layer SiGe QDs substrate have also been demonstrated. After the discussion on the growth of the SiGe QWs and QDs, the SiGe nanorings have also been investigated. The Si surface diffusion mechanism and the Ge out-diffusion mechanism were proposed for nanorings formation at 600oC and 500oC, respectively. The SiGe nanorings created by Ge out-diffusion show controllable depth and well-defined Ge content at edges. The novel nanoring structures can be used in new optoelectronic devices. Moreover, the surface orientation effects on SiGe QDs and nanorings formation are investigated. The base shapes of SiGe QDs and nanorings can be controlled by different surface orientation. In the third part of this thesis, the two dimensional electron gas (2DEG) devices with the world record high 2DEG mobility have been investigated. The 2DEG in a Si QW on SiGe GBLs with the world record high mobility of 1.6×106 cm2/Vs at carrier densities n~1.5×1011 /cm2. On the other hand, the complementary devices on an undoped Si/SiGe substrate where both 2D electrons and holes have also been investigated. A p-channel FET is characterized and the operation of an inverter is demonstrated. Moreover, the limitations of the two dimensional electron densities and 2DEG mobility have been discussed. The scattering from remote dopants, background impurities, interface roughness, and threading dislocations can all degrade the mobility in SiGe heterostructures. Based on the knowledge above, we have successfully improved the 2DEG mobility to 2×106 cm2/Vs by changing the substrate structures. Finally, the growth mechanism of the Si on Ge growth was investigated. The transition from 3-dimensional (3D) to 2-dimensional (2D) growth for Si on Ge, which is different from the Ge on Si case, was observed for the first time. The Si quantum dots can be observed in the initial Si growth on Ge. With the increasing Si deposition, the ring-like structures appeared. Finally, the flat surface without any nanostructures above can be observed. The tensile strain to enhance surface mobility of Si atoms favors proposedly the lateral growth, and leads to the three to two dimensional growth. The flatter Si layer growth directly on Ge can be used for the application of novel nanoelectronics and optoelectronics devices.
Radauscher, Erich Justin. "Design, Fabrication, and Characterization of Carbon Nanotube Field Emission Devices for Advanced Applications." Diss., 2016. http://hdl.handle.net/10161/12256.
Full textCarbon nanotubes (CNTs) have recently emerged as promising candidates for electron field emission (FE) cathodes in integrated FE devices. These nanostructured carbon materials possess exceptional properties and their synthesis can be thoroughly controlled. Their integration into advanced electronic devices, including not only FE cathodes, but sensors, energy storage devices, and circuit components, has seen rapid growth in recent years. The results of the studies presented here demonstrate that the CNT field emitter is an excellent candidate for next generation vacuum microelectronics and related electron emission devices in several advanced applications.
The work presented in this study addresses determining factors that currently confine the performance and application of CNT-FE devices. Characterization studies and improvements to the FE properties of CNTs, along with Micro-Electro-Mechanical Systems (MEMS) design and fabrication, were utilized in achieving these goals. Important performance limiting parameters, including emitter lifetime and failure from poor substrate adhesion, are examined. The compatibility and integration of CNT emitters with the governing MEMS substrate (i.e., polycrystalline silicon), and its impact on these performance limiting parameters, are reported. CNT growth mechanisms and kinetics were investigated and compared to silicon (100) to improve the design of CNT emitter integrated MEMS based electronic devices, specifically in vacuum microelectronic device (VMD) applications.
Improved growth allowed for design and development of novel cold-cathode FE devices utilizing CNT field emitters. A chemical ionization (CI) source based on a CNT-FE electron source was developed and evaluated in a commercial desktop mass spectrometer for explosives trace detection. This work demonstrated the first reported use of a CNT-based ion source capable of collecting CI mass spectra. The CNT-FE source demonstrated low power requirements, pulsing capabilities, and average lifetimes of over 320 hours when operated in constant emission mode under elevated pressures, without sacrificing performance. Additionally, a novel packaged ion source for miniature mass spectrometer applications using CNT emitters, a MEMS based Nier-type geometry, and a Low Temperature Cofired Ceramic (LTCC) 3D scaffold with integrated ion optics were developed and characterized. While previous research has shown other devices capable of collecting ion currents on chip, this LTCC packaged MEMS micro-ion source demonstrated improvements in energy and angular dispersion as well as the ability to direct the ions out of the packaged source and towards a mass analyzer. Simulations and experimental design, fabrication, and characterization were used to make these improvements.
Finally, novel CNT-FE devices were developed to investigate their potential to perform as active circuit elements in VMD circuits. Difficulty integrating devices at micron-scales has hindered the use of vacuum electronic devices in integrated circuits, despite the unique advantages they offer in select applications. Using a combination of particle trajectory simulation and experimental characterization, device performance in an integrated platform was investigated. Solutions to the difficulties in operating multiple devices in close proximity and enhancing electron transmission (i.e., reducing grid loss) are explored in detail. A systematic and iterative process was used to develop isolation structures that reduced crosstalk between neighboring devices from 15% on average, to nearly zero. Innovative geometries and a new operational mode reduced grid loss by nearly threefold, thereby improving transmission of the emitted cathode current to the anode from 25% in initial designs to 70% on average. These performance enhancements are important enablers for larger scale integration and for the realization of complex vacuum microelectronic circuits.
Dissertation
Neves, João Pedro Silva. "Application of Mixed Reality Devices for Robot Manipulator Programming: Aspects Related to Graphical Animations." Master's thesis, 2018. http://hdl.handle.net/10316/86080.
Full textO objetivo desta dissertação consiste na descrição do projeto desenvolvido com o propósito de criar uma interface completamente nova, que implementa tecnologias de Realidade Mista para a programação e monitorização de robôs manipuladores. Esta interface tem como intuito principal expandir o número de pessoas com capacidades para programar e monitorizar robôs manipuladores, ao tornar o conhecimento avançado de linguagens de programação um requerimento opcional e não fundamental. A motivação para este projeto começa pela vontade de proporcionar avanços em interfaces de comunicação Homem-Máquina (IHM), e na demonstração das vantagens proporcionadas pelas tecnologias de Realidade Mista na monitorização e programação de processos robóticos avançados (Produção aditiva, robôs colaborativos, entre outros). Ter acesso direto a informação como conteúdo visual aplicado no espaço e em tempo real, antecipar trajetórias, ou até modificar o movimento de um robô através de som ou gestos manuais, são algumas das grandes vantagens proporcionadas por esta tecnologia.O projeto desenvolvido durante a realização desta tese de mestrado resultou na criação de duas aplicações para um Microsoft HoloLens, ambas com propósitos diferentes. A primeira aplicação (Path Visualization) consiste numa interface de realidade mista que permite aos utilizadores o total controlo sobre um robô manipulador e ao mesmo tempo uma completa monitorização das trajetórias realizadas pelo mesmo. A segunda aplicação (Graphical Path Manipulation) consiste num novo ambiente de realidade mista que permite que os utilizadores criem uma trajetória nova para o robô, facilmente ajustável sempre que necessário, e também proporciona a possibilidade de alterar os parâmetros inerentes ao movimento do robô. Todas as trajetórias são depois enviadas pela aplicação para o robô real que as executa como definido. Esta dissertação apenas terá foco no desenvolvimento realizado pelo escritor, que consiste nas aplicações de realidade mista para o Microsoft HoloLens. As aplicações foram realizadas utilizando os softwares Unity3D, Vuforia e Visual Studio.Apesar do projeto não ser direcionado para uma tarefa especifica, pode ser facilmente adaptado para uma, estando o conceito disponível para avanços futuros.
The main goal of this Master Thesis’ dissertation consists in describing a new project developed with the purpose to create a completely new interface, which provides a generic implementation of Mixed Reality to monitor, optimize and program robot manipulators’ tasks. This interface will hopefully expand the range of people with capabilities to program industrial robots, since the advanced knowledge of programming languages will be an optional requirement. The motivation for this project begins with the will to improve Human-Machine Interfaces (HMI) and to demonstrate that an approach with Mixed Reality can lead to huge improvements in monitoring and programming advanced robotic tasks, such as Additive-manufacturing, collaborative robots, amongst others. Perceiving information as direct visual content, in real time, anticipate trajectories, or even apply modifications to a robot motion with gesture or sound inputs, are some of the great advantages of this technology. The project developed in this master thesis resulted in two apps for a Microsoft HoloLens each with different purposes. The first (Path Visualization) is a Mixed Reality interface that allows users to control a robotic manipulator, visualize its movement and fully monitor the task assigned to the robot. The second app (Graphical Path Manipulation) is a new Mixed Reality environment that allows users to create a completely new path or adjust one, as well as enabling the possibility to change motion parameters and teach the new/adjusted path trajectory to the robot. This Master Thesis will focus on all the development, made by the writer, to create the Mixed Reality applications for the Microsoft HoloLens. This was possible using the Unity3D, Vuforia and Visual Studio software interfaces.Although this project’s purpose is not to focus on a specific industrial task, it can be easily adapted posteriorly to any kind of robotic task desired. The concept however is open for further studies.
"Epitaxial Development of Advanced Group IV Materials and High Performance Optical Devices for Applications in Si-photonics and Photovoltaics." Doctoral diss., 2012. http://hdl.handle.net/2286/R.I.15923.
Full textDissertation/Thesis
Ph.D. Chemistry 2012
Evangelista, Alessandro. "Towards the next generation of advanced technical documentation in augmented reality: the case of MILL 4.0." Doctoral thesis, 2021. http://hdl.handle.net/11589/225858.
Full textAugmented Reality (AR) promises to create direct, automatic, and actionable links between the physical world and electronic information. It provides an immediate and straightforward user interface to an electronically enhanced physical world. In particular, Industrial AR allows the integration between knowledge-based information, traditionally used by operators and provided mainly in paper documentation and data available from sensors on equipment. This approach is suggested by companies, especially small and medium-sized enterprises, who want a gradual introduction of Industry 4.0 technologies within their established practices. The scope of this work is to develop an advanced technical documentation system in AR for a flour milling plant. The work discussed in this dissertation aims to bring added value to the existing literature in the field of industrial AR and advanced technical documentation. Besides, an attempt will be made to shed light on the role of AR as an enabling technology for the industry of the future. First, we focused on different industrial AR interfaces in order to understand established practices to guide IAR interface design. Then, we investigate the AR key technology with a novel approach based on patent research. Finally, the main result of this work is the design and development of two AR systems for a flour milling plant that following two different design approaches.