Bücher zum Thema „Silica films“

Innocenzi, Plinio. Mesoporous Ordered Silica Films. Cham: Springer International Publishing, 2022. http://dx.doi.org/10.1007/978-3-030-89536-5.

Center, Lewis Research, Hrsg. Mechanical protection of DLC films on fused silica slides. Cleveland, Ohio: Lewis Research Center, 1985.

Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films (8th 2005 Québec, Québec). Silicon nitride, silicon dioxide thin insulating films, and other emerging diele[c]trics VIII: Proceedings of the international symposium. Herausgegeben von Sah R. E, Electrochemical Society. Dielectric Science and Technology Division., Electrochemical Society Electronics Division und Electrochemical Society Meeting. Pennington, N.J: Electrochemical Society, 2005.

Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films (8th 2005 Québec, Québec). Silicon nitride, silicon dioxide thin insulating films, and other emerging diele[c]trics VIII: Proceedings of the international symposium. Herausgegeben von Sah R. E, Electrochemical Society. Dielectric Science and Technology Division., Electrochemical Society Electronics Division und Electrochemical Society Meeting. Pennington, N.J: Electrochemical Society, 2005.

Symposium on Silicon Nitride, Silicon Dioxide Thin Insulating Films, and Emerging Dielectrics (9th 2007 Chicago, Ill.). Silicon nitride, silicon dioxide, and emerging dielectrics 9. Herausgegeben von Sah R. E, Electrochemical Society. Dielectric Science and Technology Division. und Electrochemical Society Meeting. Pennington, N.J: Electrochemical Society, 2007.

Symposium on Silicon Nitride, Silicon Dioxide Thin Insulating Films, and Emerging Dielectrics (9th 2007 Chicago, Ill.). Silicon nitride, silicon dioxide, and emerging dielectrics 9. Herausgegeben von Sah R. E, Electrochemical Society. Dielectric Science and Technology Division. und Electrochemical Society Meeting. Pennington, N.J: Electrochemical Society, 2007.

Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films (5th 1999 Seattle, Wash.). Silicon nitride and silicon dioxide thin insulating films: Proceedings of the fifth international symposium. Pennington, NJ (10 S. Main St., Pennington 08534-2696: Electrochemical Society), 1999.

Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films (7th 2003 Paris, France). Silicon nitride and silicon dioxide thin insulating films VII: Proceedings of the international symposium. Herausgegeben von Sah R. E, Electrochemical Society. Dielectric Science and Technology Division., Electrochemical Society Electronics Division und Electrochemical Society Meeting. Pennington, NJ: Electrochemical Society, 2003.

Angeles, CA) International Symposium on the Physics and Chemistry of SiO₂ and the Si-SiO₂ Interface (5th 2005 Los. The physics and chemistry of SiO₂ and the Si-SiO₂ interface--5. Pennington, NJ: Electrochemical Society, 2005.

International Symposium on the Physics and Chemistry of SiO₂ and the Si-SiO₂ Interface (3rd 1996 Los Angeles, Calif.). The physics and chemistry of SiO₂ and the Si-SiO₂ interface-3, 1996: Proceedings of the Third International Symposium on the Physics and Chemistry of SiO₂ and the Si-SiO₂ Interface. Herausgegeben von Massoud Hisham Z, Poindexter Edward H und Helms C. Robert. Pennington, NJ: Electrochemical Society, 1996.

Robert, Helms C., Deal Bruce E, Electrochemical Society Electronics Division, Electrochemical Society. Dielectric Science and Technology Division. und Symposium on the Physics and Chemistry of the SiO₂ and Si-SiO₂ Interface (2nd : 1992 : St. Louis, Mo.), Hrsg. The Physics and chemistry of SiO₂ and the Si-SiO₂ interface 2. New York: Plenum Press, 1993.

International Symposium on the Physics and Chemistry of SiO₂ and the Si-SiO₂ Interface (4th 2000 Toronto, Ont.). The physics and chemistry of SiO₂ and the Si-SiO₂ interface--4, 2000: Proceedings of the Fourth International Symposium on the Physics and Chemistry of SiO₂ and the Si-SiO₂ Interface, Toronto, Canada, May 15-18, 2000. Herausgegeben von Massoud Hisham Z, Electrochemical Society Electronics Division und Electrochemical Society. Dielectric Science and Technology Division. Pennington, NJ: Electrochemical Society, 2000.

P, Jennings J., und Hefter G. T, Hrsg. Amorphous silicon thin films and devices: Results of research carried out as MERIWA Project No. E161 in the School of Mathematical and Physical Sciences, Murdoch University. East Perth, WA: Minerals and Energy Research Institute of Western Australia, 1993.

Narayanan, V., und Martin M. Frank. Thin films on silicon. Singapore: World Scientific Publishing Co. Pte. Ltd, 2016.

IEEE SOS/SOI Technology Conference. (1990 Key West, Fla.). 1990 IEEE SOS/SOI Technology Conference, October 2-4, 1990, Marriott's Casa, Marina Resort, Key West, Florida : proceedings. [New York: IEEE], 1990.

J, Belzer Barbara, und National Institute of Standards and Technology (U.S.), Hrsg. Thin film reference materials development: Final report for CRADA CN-1364. Gaithersburg, MD: U.S. Dept. of Commerce, Technology Administration, National Institute of Standards and Technology, 1998.

United States. National Aeronautics and Space Administration., Hrsg. System for the growth of bulk SiC crystals by modified CVD techniques: Final report. [Washington, DC: National Aeronautics and Space Administration, 1994.

Symposium C on Properties and Applications of SiC, Natural and Synthetic Diamond and Related Materials (1990 Strasbourg, France). SiC, natural and synthetic diamond and related materials: Proceedings of Symposium C on Properties and Applications of SiC, Natural and Synthetic Diamond and Related Materials of the 1990 E-MRS Fall conference, Strasbourg, France, November 27-30, 1990. Amsterdam: North-Holland, 1992.

Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films (2nd 1986 San Diego, Calif.). Proceedings of the Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films. Pennington, NJ (10 S. Main St., Pennington 08534-2696: Electrochemical Society), 1987.

Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films (3rd 1994 San Francisco, Calif.). Proceedings of the Third Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films. Pennington, NJ (10 S. Main St., Pennington 08534-2696: Electrochemical Society), 1994.

Jamal, Deen M., Electrochemical Society. Dielectric Science and Technology Division., Electrochemical Society Electronics Division und Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films (4th : 1997 : Montreal, Quebec), Hrsg. Silicon nitride and silicon dioxide thin insulating films: Proceedings of the Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films. Pennington, New Jersey: Electrochemical Society, 1997.

Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films (1988 Chicago, Ill.). Proceedings of the Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films. Pennington, NJ: Electrochemical Society, 1989.

Fraga, Mariana Amorim. Amorphous silicon carbide thin films: Deposition, characterization, etching, and piezoresistive sensors applications. Hauppauge, N.Y: Nova Science Publishers, 2011.

United States. National Aeronautics and Space Administration., Hrsg. Properties of thin films for high temperature flow sensors: Final report for the period ended August 20, 1990. [Washington, DC: National Aeronautics and Space Administration, 1991.

United States. National Aeronautics and Space Administration., Hrsg. Properties of thin films for high temperature flow sensors: Final report for the period ended August 20, 1990. [Washington, DC: National Aeronautics and Space Administration, 1991.

B, Bergmann Ralf, und Research Signpost (Trivandrum India), Hrsg. Growth, characterization, and electronic applications of si-based thin films. Trivandrum: Research Signpost, 2002.

IEEE SOS/SOI Technology Conference. (1988 St. Simons Island, Ga.). 1988 IEEE SOS/SOI Technology Workshop, October 3-5, 1988, Sea Palms Resort, St. Simons Island, Georgia, proceedings. [United States: s.n., 1988.

1941-, Boulos Edward N., Platts Dennis R und International Conference on Processing Materials for Properties (1st : 1993 : Honolulu, Hawaii), Hrsg. Glass and optical materials II: Optoelectronics, thin film coating, sol-gel processing. Westerville, Ohio: American Ceramic Society, 1994.

United States. National Aeronautics and Space Administration., Hrsg. Laser ann[e]aling of amorphous/poly silicon solar cell material flight experiment: Final technical report. [Washington, DC: National Aeronautics and Space Administration, 1990.

A, Golanski, Nguyen Van Tran und Krimmel E. F, Hrsg. Photon, beam, and plasma enhanced processing: June 2nd-5th, 1987, Strasbourg, (France). Les Ulis, France: Editions de Physique, 1987.

Senoussaoui, Nadia. Einfluss der Oberflächenstrukturierung auf die optischen Eigenschaften der Dünnschichtsolarzellen auf der Basis von a-Si : H und [mu]c-Si: H. Jülich: Forschungszentrum Jülich, Zentralbibliothek, 2004.

G, Pensl, und International Conference on Silicon Carbide and Related Materials (7th : 1998 : Stockholm, Sweden), Hrsg. Silicon carbide, III-nitrides and related materials: ICSCIII-N'97 : Proceedings of the 7th International Conference on Silicon Carbide, III-Nitrides and Related Materials, Stockholm, Sweden, September 1997. Uetikon-Zurich, Switzerland: Trans Tech Publications, 1998.

International Conference on Silicon Carbide and Related Materials (1999 Research Triangle Park, N.C.). Silicon carbide and related materials--1999: ICSCRM'99 : proceedings of the International Conference on Silicon Carbide and Related Materials--1999, Research Triangle Park, North Carolina, USA, October 10-15, 1999. Herausgegeben von Carter Calvin H, Devaty Robert Philip 1954- und Rohrer Gregory S. Uetikon-Zurich, Switzerland: Trans Tech Publications, 2000.

Baraban, A. P. Ėlektronika sloev SiO₂ na kremnii. Leningrad: Izd-vo Leningradskogo universiteta, 1988.

Defay, Emmanuel. Ferroelectric dielectrics integrated on silicon. London: ISTE Ltd., 2011.

A, Buchanan D., Hrsg. Structure and electronic properties of ultrathin dielectric films on silicon and related structures: Symposium held November 29-December 1, 1999, Boston, Massachusetts, U.S.A. Warrendale, PA: Materials Research Society, 2000.

Flewitt, Andrew. Amorphous and polycrystalline thin-film silicon science and technology--2009: Symposium held April 14-17, 2009, San Francisco, California, U.S.A. / editors, A. Flewitt ... [et al.]. Warrendale, Pa: Materials Research Society, 2009.

Slafer, Dennis. Novel R2R manufacturable photonic-enhanced thin film solar cells: January 28, 2010 - January 31, 2011. Golden, Colo: National Renewable Energy Laboratory, 2012.

National Renewable Energy Laboratory (U.S.), Hrsg. Porous polycrystalline silicon thin film solar cells: Final report, 24 May 1999-24 May 2002. Golden, Colo: National Renewable Energy Laboratory, 2003.

United States. National Aeronautics and Space Administration., Hrsg. Ultra-low-cost room temperature SiC thin films: Final report, NASA research grant no. NAG3-1828 for the period April 8, 1996 to September 30, 1996. [Cleveland, Ohio?]: The Center, 1997.

J, Camassel, European Materials Research Society. Meeting, Symposium A on High Temperature Electronics: Materials, Devices, and Applications (1996 : Strasbourg, France) und Symposium B on Thin Film Materials for Large Area Electronics (1996 : Strasbourg, France), Hrsg. Frontiers in electronics: High temperature and large area applications : proceedings of Symposium A on High Temperature Electronics: Materials, Devices, and Applications, and proceedings of Symposium B on Thin Film Materials for Large Area Electronics of the 1996 E-MRS Spring Conference, Strasbourg, France, June 4-7, 1996. Amsterdam: Elsevier, 1997.

Luft, Werner. Hydrogenated amorphous silicon alloy deposition processes. New York: M. Dekker, 1993.

Eldada, Louay A. Thin film solar technology III. Bellingham: SPIE, 2011.

G, Spencer M., und International Conference on SiC and Related Materials (5th : 1993 : Washington, D.C.), Hrsg. Silicon carbide and related materials: Proceedings of the fifth conference, 1-3 November 1993, Washington, DC, USA. Bristol: Institute of Physics Pub., 1994.

G, Bentini G., European Materials Research Society und Council of Europe, Hrsg. Dielectric layers in semiconductors: Novel techniques and devices : June 17th-20th 1986, Strasbourg, France. Les Ulis, France: Editions de physique, 1986.

Shaikhutdinov, Shamil. Introduction to Ultrathin Silica Films. Taylor & Francis Group, 2021.

Shaikhutdinov, Shamil. Introduction to Ultrathin Silica Films. Jenny Stanford Publishing, 2020.

Shaikhutdinov, Shamil. Introduction to Ultrathin Silica Films. Jenny Stanford Publishing, 2020.

Shaikhutdinov, Shamil. Introduction to Ultrathin Silica Films. Jenny Stanford Publishing, 2020.

Shaikhutdinov, Shamil. Introduction to Ultrathin Silica Films. Jenny Stanford Publishing, 2020.