Auswahl der wissenschaftlichen Literatur zum Thema „Silica films“
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Zeitschriftenartikel zum Thema "Silica films"
Maier, Wilhelm F., Michael Wiedorn und Herbert O. Schramm. „Microporous Silica Films“. Angewandte Chemie International Edition in English 30, Nr. 11 (November 1991): 1509–10. http://dx.doi.org/10.1002/anie.199115091.
Der volle Inhalt der QuelleChien, Wen Chen, Yang Yen Yu und Shih Yu Chen. „Synthesis and Characterization of Photopolymerized Poly(acrylic)/Monodispersed Colloidal Silica Hybrid Thin Films“. Advanced Materials Research 47-50 (Juni 2008): 662–65. http://dx.doi.org/10.4028/www.scientific.net/amr.47-50.662.
Der volle Inhalt der QuelleDeschanels, X., S. Dourdain, C. Rey, G. Toquer, A. Grandjean, S. Pellet-Rostaing, O. Dugne, C. Grygiel, F. Duval und Y. Serruys. „Radiation damages on mesoporous silica thin films and bulk materials“. MRS Proceedings 1514 (2013): 69–74. http://dx.doi.org/10.1557/opl.2013.386.
Der volle Inhalt der QuelleLi, Yu, Yi He Zhang, Bo Shen und Feng Zhu Lv. „Preparation and Dielectric Properties of Polyimide Nanocomposite Films Based on Hollow Silica“. Advanced Materials Research 217-218 (März 2011): 647–51. http://dx.doi.org/10.4028/www.scientific.net/amr.217-218.647.
Der volle Inhalt der QuelleYu, Yang Yen, Wen Chen Chien und Tsung Wei Tsai. „Microstructure and Properties of Polyimide /Monodispersed Colloidal Silica Hybrid Films Prepared by Sol–Gel Process“. Advanced Materials Research 47-50 (Juni 2008): 650–53. http://dx.doi.org/10.4028/www.scientific.net/amr.47-50.650.
Der volle Inhalt der QuelleBreval, E., M. L. Mulvihill, J. P. Dougherty und R. E. Newnham. „Polyimide-silica microcomposite films“. Journal of Materials Science 27, Nr. 12 (1992): 3297–300. http://dx.doi.org/10.1007/bf01116027.
Der volle Inhalt der QuelleLoughlani, Rayane-Ichrak, Alonso Gamero-Quijano und Francisco Montilla. „Electroassisted Incorporation of Ferrocene within Sol–Gel Silica Films to Enhance Electron Transfer“. Molecules 28, Nr. 19 (28.09.2023): 6845. http://dx.doi.org/10.3390/molecules28196845.
Der volle Inhalt der QuelleHorikawa, Hajime, Takashi Ogihara, Akio Shimomura und Junko Shimomura. „Preparation and Characterization of Silica Film on PBT Substrate by Sol-Gel Method Using Perhydropolysilazane“. Key Engineering Materials 421-422 (Dezember 2009): 161–64. http://dx.doi.org/10.4028/www.scientific.net/kem.421-422.161.
Der volle Inhalt der QuelleZhang, Yi He, Qing Song Su, Li Yu, Hong Zheng, Hai Tao Huang, Guo Ge Zhang, Ying Bang Yao und Helen Lai Wah Chan. „Study on the Dielectric Properties of Hybrid and Porous Polyimide-Silica Films“. Advanced Materials Research 47-50 (Juni 2008): 973–76. http://dx.doi.org/10.4028/www.scientific.net/amr.47-50.973.
Der volle Inhalt der QuelleKubo, Tomoko, Eisuke Tadaoka und Hiromitsu Kozuka. „Formation of silica coating films from spin-on polysilazane at room temperature and their stability in hot water“. Journal of Materials Research 19, Nr. 2 (Februar 2004): 635–42. http://dx.doi.org/10.1557/jmr.2004.19.2.635.
Der volle Inhalt der QuelleDissertationen zum Thema "Silica films"
Campbell-Rance, Debbie. „Electrodeposited Silica Thin Films“. VCU Scholars Compass, 2010. http://scholarscompass.vcu.edu/etd/2123.
Der volle Inhalt der QuelleSpaargaren, Susan Marianne Rosemary. „Radiation effects on silica based waveguides“. Thesis, Imperial College London, 1997. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.267942.
Der volle Inhalt der QuelleKlichko, Yaroslav Vladimirovich. „Functional mesoporous silica films for nanosystems applications“. Diss., Restricted to subscribing institutions, 2009. http://proquest.umi.com/pqdweb?did=1998520791&sid=1&Fmt=2&clientId=1564&RQT=309&VName=PQD.
Der volle Inhalt der QuelleKokan, Julie Runyan. „Processing of low permittivity silica thin films“. Thesis, Georgia Institute of Technology, 1994. http://hdl.handle.net/1853/20032.
Der volle Inhalt der QuelleGeite, Patrik. „Medical Implant Applications of Mesoporous Silica Films“. Thesis, Linköpings universitet, Nanostrukturerade material, 2019. http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-154463.
Der volle Inhalt der QuelleWooten, Mary K. „NANOFILTRATION MEMBRANES FROM ORIENTED MESOPOROUS SILICA THIN FILMS“. UKnowledge, 2014. http://uknowledge.uky.edu/cme_etds/28.
Der volle Inhalt der QuelleBragg, Donald. „Photocatalytic Oxidation of Carbon Monoxide Using Sputter Deposited Molybdenum Oxide Thin Films on a Silicon Dioxide Substrate“. Fogler Library, University of Maine, 2007. http://www.library.umaine.edu/theses/pdf/BraggD2007.pdf.
Der volle Inhalt der QuelleBasnig, Deomila. „Élaboration de films minces de silice pour des applications en chimie analytique“. Electronic Thesis or Diss., Université de Lorraine, 2021. http://www.theses.fr/2021LORR0102.
Der volle Inhalt der QuelleOriented mesoporous silica-based film on FTO electrode was prepared via electrochemically-assisted self-assembly approach (EASA). A potential of -1.5V was applied to the FTO electrode containing a prehydrolyzed silica precursor, (e.g. tetraethyl orthosilicate), in the presence of a template (e.g. cetrimonium bromide) and electrolyte. This approach could generate vertically-aligned silica nanochannels with pore sizes adjustable between 2 and 3 nm, depending on the template. This work showed the voltammetric behavior and the selectivity of the mesoporous silica film towards various positively-charged cations of different nature, size, and charge. Results showed an accumulation and selectivity favoring the least positive charged ion: MB⁺ > PQ²⁺ > DQ²⁺ > Ru(bpy)₃²⁺ > Ru(NH₃)₆³⁺. The enhancement of the voltammetric signals relative to the bare FTO electrode was strongly dependent on the probe type. The accumulation of the different redox probe is attributed to the due to the vertical orientation of the nanochannel favoring fast transport and diffusion unto the electrode surface. Further electrochemical characterization showed an interplay of the suface-controlled and diffusion-controlled process, wherein adsorbed species is more prominent in diluted media. Results showed that changing the debye length and electrokinetic radius of the silica nanochannel due to the ionic strength or nanochannel diameter also affects the transport and electrochemical detection of the paraquat analyte. Mesoporous silica films having different pore size, prepared using different alkyl ammonium bromide as template, yield different sensitivities, which could be due to the difference in electrochemical charge of the silica surface, as well as the distribution of ions in the nanochannel. Finally, an attempt to modify the surface of silica wall using zirconia was also made to study the transport of cations, which could pave a way for an improved stability of the mesoporous film
CHAKRAVARTY, SRINIVAS L. N. „DEVELOPMENT OF SCRATCH RESISTANT PECVD SILICA-LIKE FILMS“. University of Cincinnati / OhioLINK, 2000. http://rave.ohiolink.edu/etdc/view?acc_num=ucin973542599.
Der volle Inhalt der QuelleMoskowitz, Steven. „Atomic force miscroscopy [sic] study of SiO₂/Si(111)--(7x7) grown via atomic oxygen plasma /“. Thesis, Connect to this title online; UW restricted, 2005. http://hdl.handle.net/1773/11556.
Der volle Inhalt der QuelleBücher zum Thema "Silica films"
Innocenzi, Plinio. Mesoporous Ordered Silica Films. Cham: Springer International Publishing, 2022. http://dx.doi.org/10.1007/978-3-030-89536-5.
Der volle Inhalt der QuelleCenter, Lewis Research, Hrsg. Mechanical protection of DLC films on fused silica slides. Cleveland, Ohio: Lewis Research Center, 1985.
Den vollen Inhalt der Quelle findenSymposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films (8th 2005 Québec, Québec). Silicon nitride, silicon dioxide thin insulating films, and other emerging diele[c]trics VIII: Proceedings of the international symposium. Herausgegeben von Sah R. E, Electrochemical Society. Dielectric Science and Technology Division., Electrochemical Society Electronics Division und Electrochemical Society Meeting. Pennington, N.J: Electrochemical Society, 2005.
Den vollen Inhalt der Quelle findenSymposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films (8th 2005 Québec, Québec). Silicon nitride, silicon dioxide thin insulating films, and other emerging diele[c]trics VIII: Proceedings of the international symposium. Herausgegeben von Sah R. E, Electrochemical Society. Dielectric Science and Technology Division., Electrochemical Society Electronics Division und Electrochemical Society Meeting. Pennington, N.J: Electrochemical Society, 2005.
Den vollen Inhalt der Quelle findenSymposium on Silicon Nitride, Silicon Dioxide Thin Insulating Films, and Emerging Dielectrics (9th 2007 Chicago, Ill.). Silicon nitride, silicon dioxide, and emerging dielectrics 9. Herausgegeben von Sah R. E, Electrochemical Society. Dielectric Science and Technology Division. und Electrochemical Society Meeting. Pennington, N.J: Electrochemical Society, 2007.
Den vollen Inhalt der Quelle findenSymposium on Silicon Nitride, Silicon Dioxide Thin Insulating Films, and Emerging Dielectrics (9th 2007 Chicago, Ill.). Silicon nitride, silicon dioxide, and emerging dielectrics 9. Herausgegeben von Sah R. E, Electrochemical Society. Dielectric Science and Technology Division. und Electrochemical Society Meeting. Pennington, N.J: Electrochemical Society, 2007.
Den vollen Inhalt der Quelle findenSymposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films (5th 1999 Seattle, Wash.). Silicon nitride and silicon dioxide thin insulating films: Proceedings of the fifth international symposium. Pennington, NJ (10 S. Main St., Pennington 08534-2696: Electrochemical Society), 1999.
Den vollen Inhalt der Quelle findenSymposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films (7th 2003 Paris, France). Silicon nitride and silicon dioxide thin insulating films VII: Proceedings of the international symposium. Herausgegeben von Sah R. E, Electrochemical Society. Dielectric Science and Technology Division., Electrochemical Society Electronics Division und Electrochemical Society Meeting. Pennington, NJ: Electrochemical Society, 2003.
Den vollen Inhalt der Quelle findenAngeles, CA) International Symposium on the Physics and Chemistry of SiO₂ and the Si-SiO₂ Interface (5th 2005 Los. The physics and chemistry of SiO₂ and the Si-SiO₂ interface--5. Pennington, NJ: Electrochemical Society, 2005.
Den vollen Inhalt der Quelle findenInternational Symposium on the Physics and Chemistry of SiO₂ and the Si-SiO₂ Interface (3rd 1996 Los Angeles, Calif.). The physics and chemistry of SiO₂ and the Si-SiO₂ interface-3, 1996: Proceedings of the Third International Symposium on the Physics and Chemistry of SiO₂ and the Si-SiO₂ Interface. Herausgegeben von Massoud Hisham Z, Poindexter Edward H und Helms C. Robert. Pennington, NJ: Electrochemical Society, 1996.
Den vollen Inhalt der Quelle findenBuchteile zum Thema "Silica films"
Gonçalves, M. Clara, und George S. Attard. „Nanostructured Mesoporous Silica Films“. In Nanostructured Materials and Coatings for Biomedical and Sensor Applications, 159–68. Dordrecht: Springer Netherlands, 2003. http://dx.doi.org/10.1007/978-94-010-0157-1_16.
Der volle Inhalt der QuelleShaikhutdinov, Shamil. „Water Adsorption on Silica Films“. In Introduction to Ultrathin Silica Films Silicatene and Others, 271–91. New York: Jenny Stanford Publishing, 2022. http://dx.doi.org/10.1201/9781003088622-8.
Der volle Inhalt der QuelleShaikhutdinov, Shamil. „Ultrathin Silica Films on Metals“. In Introduction to Ultrathin Silica Films Silicatene and Others, 107–65. New York: Jenny Stanford Publishing, 2022. http://dx.doi.org/10.1201/9781003088622-4.
Der volle Inhalt der QuelleShaikhutdinov, Shamil. „Silica and Silicates“. In Introduction to Ultrathin Silica Films Silicatene and Others, 1–30. New York: Jenny Stanford Publishing, 2022. http://dx.doi.org/10.1201/9781003088622-1.
Der volle Inhalt der QuelleAlexander, John Callum. „TiO2 Thin Films on Fused Silica“. In Springer Theses, 221–59. Cham: Springer International Publishing, 2016. http://dx.doi.org/10.1007/978-3-319-34229-0_7.
Der volle Inhalt der QuelleBersuker, Gennadi, Keith McKenna und Alexander Shluger. „Silica and High-k Dielectric Thin Films in Microelectronics“. In Oxide Ultrathin Films, 101–18. Weinheim, Germany: Wiley-VCH Verlag GmbH & Co. KGaA, 2012. http://dx.doi.org/10.1002/9783527640171.ch5.
Der volle Inhalt der QuelleHolt, S. A., K. J. Edler und C. Fernandez-Martin. „Formation of surfactant–silica mesophase films at a silica interface“. In Surface and Colloid Science, 169–74. Berlin, Heidelberg: Springer Berlin Heidelberg, 2004. http://dx.doi.org/10.1007/b97126.
Der volle Inhalt der QuelleKhabibullin, Amir, und Ilya Zharov. „Responsive Nanoporous Silica Colloidal Films and Membranes“. In Intelligent Stimuli-Responsive Materials, 265–91. Hoboken, NJ, USA: John Wiley & Sons, Inc., 2013. http://dx.doi.org/10.1002/9781118680469.ch8.
Der volle Inhalt der QuelleShaikhutdinov, Shamil. „Defects in Ultrathin Silica Films on Metals“. In Introduction to Ultrathin Silica Films Silicatene and Others, 167–90. New York: Jenny Stanford Publishing, 2022. http://dx.doi.org/10.1201/9781003088622-5.
Der volle Inhalt der QuelleShaikhutdinov, Shamil. „Thin Silica Films on Si and SIC“. In Introduction to Ultrathin Silica Films Silicatene and Others, 69–106. New York: Jenny Stanford Publishing, 2022. http://dx.doi.org/10.1201/9781003088622-3.
Der volle Inhalt der QuelleKonferenzberichte zum Thema "Silica films"
Hur, Soojung C., Laurent Pilon, Adam Christensen und Samuel Graham. „Thermal Conductivity of Cubic Mesoporous Silica Thin Films“. In ASME 2007 International Mechanical Engineering Congress and Exposition. ASMEDC, 2007. http://dx.doi.org/10.1115/imece2007-43016.
Der volle Inhalt der QuelleCoquil, Thomas, Neal Hutchinson, Laurent Pilon, Erik Richman und Sarah Tolbert. „Thermal Conductivity of Cubic and Hexagonal Mesoporous Silica Thin Films“. In ASME 2009 Heat Transfer Summer Conference collocated with the InterPACK09 and 3rd Energy Sustainability Conferences. ASMEDC, 2009. http://dx.doi.org/10.1115/ht2009-88256.
Der volle Inhalt der QuellePoulsen, Christian V., Mikael Svalgaard und Ove Poulsen. „Photosensitivity in germania-doped silica films“. In The European Conference on Lasers and Electro-Optics. Washington, D.C.: Optica Publishing Group, 1994. http://dx.doi.org/10.1364/cleo_europe.1994.cmm5.
Der volle Inhalt der QuelleKobavashi, Junva, Tohru Maruno, Yasuhiro Hida, Tohru Matsuura und Shigekuni Sasaki. „Thermooptic switches using fluorinated polyimide waveguides“. In Organic Thin Films for Photonic Applications. Washington, D.C.: Optica Publishing Group, 1997. http://dx.doi.org/10.1364/otfa.1997.fa.4.
Der volle Inhalt der QuelleMelninkaitis, Andrius, Algirdas Selskis, Rytis Buzelis, Lina Mažule, Tomas Tolenis, Lina Grineviciute und Ramutis Drazdys. „New generation all-silica based optical elements for high power laser systems“. In Nanostructured Thin Films X, herausgegeben von Tom G. Mackay, Akhlesh Lakhtakia und Yi-Jun Jen. SPIE, 2017. http://dx.doi.org/10.1117/12.2272952.
Der volle Inhalt der QuelleGrineviciute, Lina, Lukas Ramalis, Rytis Buzelis und Tomas Tolenis. „Highly resistant all-silica polarizers for normal incidence applications“. In Advances in Optical Thin Films VII, herausgegeben von Michel Lequime und Detlev Ristau. SPIE, 2021. http://dx.doi.org/10.1117/12.2597136.
Der volle Inhalt der QuelleKao, Chih-cheng, B. Gallas und J. Rivory. „Study of Erbium Doped Silica Films Containing Silicon Nanograins“. In 2007 IEEE Conference on Electron Devices and Solid-State Circuits. IEEE, 2007. http://dx.doi.org/10.1109/edssc.2007.4450187.
Der volle Inhalt der QuelleFardad, M. A., Eric M. Yeatman und Emma J. Dawnay. „Porous films for nonlinear silica-on-silicon integrated optics“. In SPIE's 1994 International Symposium on Optics, Imaging, and Instrumentation, herausgegeben von John D. Mackenzie. SPIE, 1994. http://dx.doi.org/10.1117/12.188938.
Der volle Inhalt der QuelleSwab, P., und R. E. Klinger. „Physical microstructure of evaporated titania-silica and zirconia-silica multilayer thin films“. In OSA Annual Meeting. Washington, D.C.: Optica Publishing Group, 1985. http://dx.doi.org/10.1364/oam.1985.thv1.
Der volle Inhalt der QuelleRamalis, Lukas, Ugnė Norkutė, Rytis Buzelis, Algirdas Selskis und Tomas Tolenis. „Sculptured thin film based all-silica mirrors for high power lasers“. In Advances in Optical Thin Films VII, herausgegeben von Michel Lequime und Detlev Ristau. SPIE, 2021. http://dx.doi.org/10.1117/12.2597151.
Der volle Inhalt der QuelleBerichte der Organisationen zum Thema "Silica films"
Smith, W. L., T. A. Michalske und R. R. Rye. The deposition of boron nitride and carbon films on silica glass fibers. Office of Scientific and Technical Information (OSTI), November 1993. http://dx.doi.org/10.2172/10110580.
Der volle Inhalt der QuelleKalnitsky, A., S. P. Tay, J. P. Ellul, J. W. Andrews, E. A. Irene und S. Chongsawagvirod. Measurements and Modelling of Thin Silicon Dioxide Films on Silicon. Fort Belvoir, VA: Defense Technical Information Center, Mai 1989. http://dx.doi.org/10.21236/ada207853.
Der volle Inhalt der QuelleMecholsky, Jr, Tsai J. J., Drawl Y. L. und W. R. Fracture Studies of Diamond Films on Silicon. Fort Belvoir, VA: Defense Technical Information Center, August 1991. http://dx.doi.org/10.21236/ada240978.
Der volle Inhalt der QuelleMartin U. Pralle und James E. Carey. Black Silicon Enhanced Thin Film Silicon Photovoltaic Devices. Office of Scientific and Technical Information (OSTI), Juli 2010. http://dx.doi.org/10.2172/984305.
Der volle Inhalt der QuelleIrene, Eugene A. Silicon Oxidation Studies on Thin Film Silicon Oxidation Formation. Fort Belvoir, VA: Defense Technical Information Center, März 1989. http://dx.doi.org/10.21236/ada206835.
Der volle Inhalt der QuelleBerman, G. P., G. D. Doolen, R. Mainieri, D. K. Campbell und V. A. Luchnikov. Molecular dynamics simulations of grain boundaries in thin nanocrystalline silicon films. Office of Scientific and Technical Information (OSTI), Oktober 1997. http://dx.doi.org/10.2172/292865.
Der volle Inhalt der QuelleGallagher, A., D. Doughty und J. Doyle. Diagnostics of glow discharges used to produce hydrogenated amorphous silicon films. Office of Scientific and Technical Information (OSTI), Mai 1990. http://dx.doi.org/10.2172/6910198.
Der volle Inhalt der QuelleKeyes, Brian. National solar technology roadmap: Film-silicon PV. Office of Scientific and Technical Information (OSTI), Juni 2007. http://dx.doi.org/10.2172/1217298.
Der volle Inhalt der QuelleBenziger, Jay B. Surface Intermediates in Thin Film Deposition on Silicon. Fort Belvoir, VA: Defense Technical Information Center, August 1989. http://dx.doi.org/10.21236/ada216662.
Der volle Inhalt der QuelleHall, R. B., C. Bacon, V. DiReda, D. H. Ford, A. E. Ingram, S. M. Lampo, J. A. Rand, T. R. Ruffins und A. M. Barnett. Silicon-film{trademark} on ceramic solar cells. Final report. Office of Scientific and Technical Information (OSTI), Februar 1993. http://dx.doi.org/10.2172/10135001.
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