Auswahl der wissenschaftlichen Literatur zum Thema „R-HiPIMS“
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Zeitschriftenartikel zum Thema "R-HiPIMS"
Hubička, Zdenek, Martin Zlámal, Jiri Olejníček, Drahoslav Tvarog, Martin Čada und Josef Krýsa. „Semiconducting p-Type Copper Iron Oxide Thin Films Deposited by Hybrid Reactive-HiPIMS + ECWR and Reactive-HiPIMS Magnetron Plasma System“. Coatings 10, Nr. 3 (03.03.2020): 232. http://dx.doi.org/10.3390/coatings10030232.
Der volle Inhalt der QuelleAnders, André. „Tutorial: Reactive high power impulse magnetron sputtering (R-HiPIMS)“. Journal of Applied Physics 121, Nr. 17 (21.03.2017): 171101. http://dx.doi.org/10.1063/1.4978350.
Der volle Inhalt der QuelleVargas, S., D. S. Galeano-Osorio und C. E. Castano. „Controlling preferential growth of chromium – Nitrogen R-HiPIMS and R-DCMS films by substrate magnetic biasing“. Applied Surface Science 569 (Dezember 2021): 151113. http://dx.doi.org/10.1016/j.apsusc.2021.151113.
Der volle Inhalt der QuelleSHIMIZU, Tetsuhide, Michelle VILLAMAYOR, Julien KERAUDY, Daniel LUNDIN und Ulf HELMERSSON. „Transition Mode Control in Reactive High-Power Impulse Magnetron Sputtering (R-HiPIMS)“. Journal of the Vacuum Society of Japan 60, Nr. 9 (2017): 346–51. http://dx.doi.org/10.3131/jvsj2.60.346.
Der volle Inhalt der QuelleStrijckmans, K., F. Moens und D. Depla. „Perspective: Is there a hysteresis during reactive High Power Impulse Magnetron Sputtering (R-HiPIMS)?“ Journal of Applied Physics 121, Nr. 8 (28.02.2017): 080901. http://dx.doi.org/10.1063/1.4976717.
Der volle Inhalt der QuelleCastro, José D., Beatriz Pinto, Fábio Ferreira, R. Serra und S. Carvalho. „Wettability and corrosion resistance of zirconium nitride films obtained via reactive high-power impulse magnetron sputtering“. Journal of Vacuum Science & Technology A 41, Nr. 2 (März 2023): 023106. http://dx.doi.org/10.1116/6.0002341.
Der volle Inhalt der QuelleTang, Chien Jen, Wei Hsuan Hsu und Ching Tang Li. „Thermochromic Properties of Vanadium Oxide Films Prepared by R-HIPIMS Using Closed-Loop Controlled with Plasma Emission Monitoring“. Materials Science Forum 940 (Dezember 2018): 114–19. http://dx.doi.org/10.4028/www.scientific.net/msf.940.114.
Der volle Inhalt der QuelleHubička, Z., M. Čada, A. Kapran, J. Olejníček, P. Kšírová, M. Zanáška, P. Adámek und M. Tichý. „Plasma Diagnostics in Reactive High-Power Impulse Magnetron Sputtering System Working in Ar + H2S Gas Mixture“. Coatings 10, Nr. 3 (06.03.2020): 246. http://dx.doi.org/10.3390/coatings10030246.
Der volle Inhalt der QuelleBoivin, D., A. Najah, R. Jean-Marie-Désirée, C. Noël, G. Henrion, S. Cuynet und L. De Poucques. „Towards control of TiO2 thickness film in R-HiPIMS process with a coupled optical and electrical monitoring of plasma“. Surface and Coatings Technology 433 (März 2022): 128073. http://dx.doi.org/10.1016/j.surfcoat.2021.128073.
Der volle Inhalt der QuelleBunnell, Arianna, Dustin Valdez, Thomas Wolfgruber, Aleen Altamirano, Brenda Hernandez, Peter Sadowski und John Shepherd. „Abstract P3-04-05: Artificial Intelligence Detects, Classifies, and Describes Lesions in Clinical Breast Ultrasound Images“. Cancer Research 83, Nr. 5_Supplement (01.03.2023): P3–04–05—P3–04–05. http://dx.doi.org/10.1158/1538-7445.sabcs22-p3-04-05.
Der volle Inhalt der QuelleDissertationen zum Thema "R-HiPIMS"
Boivin, Dimitri. „Étude et mise au point d’une méthode de contrôle de l'épaisseur des couches minces de type TiO₂ déposées en procédé R-HiPIMS, en couplant la spectroscopie optique d’émission et la mesure du courant de décharge“. Electronic Thesis or Diss., Université de Lorraine, 2022. http://www.theses.fr/2022LORR0013.
Der volle Inhalt der QuelleThe growth of thin layers in reactive-high power impulse magnetron sputtering (R-HiPIMS) process is the general framework of this PhD. The coating industry needs a simple and reliable method to track the evolution of deposits over time because, among other reasons, the racetrack shape certainly changes during the sputtering process. The main goal of this PhD is to develop a reliable tool devised to control TiO₂ thin layer thickness in R-HiPIMS deposition process. Preliminary studies of the influence of O₂ content in the Ar/O₂ gas mixture, the mean pulse power, the pulse width and the substrate-holder temperature were performed. The plasma was characterized by optical emission spectroscopy (OES), mass spectrometry and current-voltage characteristics of the discharge. Thin films were analysed by XRD, SEM and profilometry. From combined analyses of Ti emission line intensity, integrated discharge current and deposited TiO₂ coating thickness, it is established that plasma diagnostics can be used effectively to control the deposition rate. Indeed, dividing the time average emission line intensity (TA_OES) by the integrated current (Iint) leads to obtain the TA_OES signal(Ti)/Iint ratio, which allows eliminating the effect of any variation of the electron energy distribution function. In all our investigated conditions (% O₂, pulse width, the target erosion profile and the substrate-holder temperature), the TA_OES signal(Ti)/Iint ratio seems to be in good agreement with the thickness. Thus, it seems that this ratio well reflects the titanium species density which contributes to the deposits
Bücher zum Thema "R-HiPIMS"
Wissenstransfer Zerspanung 2019. VDI Verlag, 2019. http://dx.doi.org/10.51202/9783181023624.
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