Auswahl der wissenschaftlichen Literatur zum Thema „Pulvérisation cathodique magnétron en atmosphère réactive“
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Dissertationen zum Thema "Pulvérisation cathodique magnétron en atmosphère réactive"
Gilbert, Benjamin. „Synthèse de films nanocomposites Ag/YSZ, Ag/CGO & Ag(Cu)/CGO par pulvérisation cathodique magnétron réactive pour l’électrocatalyse de l’éthylène en oxyde d’éthylène“. Electronic Thesis or Diss., Université de Lorraine, 2020. http://www.theses.fr/2020LORR0257.
Der volle Inhalt der QuelleEthylene oxide (EO) is an essential building block for the chemical industry. It is produced by the ethylene epoxidation reaction over a silver-based catalyst. Nevertheless, to achieve high selectivity, industrial processes use chloride additives in the gas phase and alkaline moderators on the catalyst. The aim of this study is to increase EO selectivity without chloride additives thanks to Ag/fluorite oxides electrocatalysts synthesized by reactive magnetron sputtering and incorporated in a 3-electrodes configuration cell designed for electrochemical promotion of catalysis, EPOC. Three porous systems (Ag/YSZ, Ag/GDC, Ag(Cu)/GDC) have been synthesized by reactive magnetron sputtering. Ag/YSZ 4 Pa 25 mA nanocomposite thin film exhibits a botryoidal microstructure characteristic of silver segregation inside the YSZ matrix. Ag/GDC 4 Pa 70 mA nanocomposite thin film exhibits a brain like-morphology with open nanoporosities. Ag(Cu)/GDC 4 Pa 70 mA nanocomposite thin film consists of multi-phase hydrophobic entropic nanowires. During catalytic tests under ethylene epoxidation conditions in reducing medium, Ag/GDC 4 Pa 70 mA showed the maximum EO selectivity of 16.55 % at 220 °C and, under polarization, selectivity boost of 2.78 % occur without the appearance of NEMCA effect
Batan, Abdelkrim. „Dépôt de films minces de silicium et de nitrures de silicium par pulvérisation cathodique réactive magnétron“. Doctoral thesis, Universite Libre de Bruxelles, 2006. http://hdl.handle.net/2013/ULB-DIPOT:oai:dipot.ulb.ac.be:2013/210791.
Der volle Inhalt der QuelleTernon, Céline. „Nanostructures luminescentes à base de silice et de silicium : de l'élaboration par pulvérisation magnétron réactive à la modélisation de la photoluminescence“. Caen, 2002. http://www.theses.fr/2002CAEN2057.
Der volle Inhalt der QuelleCombadière, Laurette. „Contribution à l'étude fondamentale de la pulvérisation cathodique magnétron réactive : application à la réalisation de couches minces de nitrure de titane“. Limoges, 1992. http://www.theses.fr/1992LIMO0170.
Der volle Inhalt der QuelleJin, Chengfei. „Dépôts de TaNx par pulvérisation cathodique magnétron à fort taux d'ionisation de la vapeur pulvérisée“. Phd thesis, Université Paris Sud - Paris XI, 2011. http://tel.archives-ouvertes.fr/tel-00638786.
Der volle Inhalt der QuelleBaraket, Mira. „Élaboration et caractérisation de revêtements nano-structurés à base de nitrure de chrome par pulvérisation cathodique magnétron en condition réactive : propriétés mécaniques et tribologiques“. Besançon, 2008. http://www.theses.fr/2008BESA2049.
Der volle Inhalt der QuelleThe present work deals with structural, mechanical and tribological characterization of nanostructured chromium nitride (CrN) based thin films for cutting tool applications. Coatings are deposited by DC reactive magnetron sputtering from metallic targets (Cr, Si and Ag) on static and rotating substrate holders with RF or DC bias. The influence pf plasma parameters (nitrogen partial pressure and substrate bias) on the mechanical properties of CrN is studied. In order to improve its mechanical properties, silicon is then introduced to CrN thanks to silicon coupons placed on the erosion track of Cr target or by cosputtering of Cr and Si targets; The fraction of silicon into the coatings is then increased in order to achieve the formation of NC-CrN/A-Si3N4 nanocomposite. Chemical, mechanical, tribological and structural properties are studied as a function of silicon content using GDOES, EPMA, nano and microindentation, pin on discs, scratch tests, XRD, SEM and TEM techniques. Si3N4 phase is detected from 1 at. % of silicon by XPS measurements. An increase of the hardness is observed while adding silicon to CrN with two maximum at 5 and 10 at. % of silicon. The resistance to oxidation at high temperature is also studied. To improve the tribological properties of the films, silver is introduced as a solid lubricant in a multilayer structure of CrN/Ag and CrSiN/Ag in the nanoscale range. Multilayers periodicity ranges from 8 to 24 nm. The silver nanolayer and the total coating thicknesses are maintained constant at 4 nm and 2 µm respectively for all the coatings. The nitride layer thickness is the only parameter that has been modified in the multilayer coatings. The influence of the thickness of CrN and CrSiN monolayers on the mechanical and tribological properties is presented and discussed. The resistance to oxidation at high temperatures of all coatings is also examined
Sayah, Imane. „Etude de revêtements photocatalytiques à base de dioxyde de titane nanostructuré élaborés par pulvérisation cathodique magnétron en condition réactive“. Thesis, Belfort-Montbéliard, 2014. http://www.theses.fr/2014BELF0249/document.
Der volle Inhalt der QuelleThe development of supported photocatalysts thin films is of major interest allowing an efficient separation of the reaction products, in spite of their specific area reduction compared to nanometric scale powders. The synthesis of TiO2 coatings by reactive magnetron sputtering is the subject of intensive researches. This technique allows, trough the control of the deposition parameters, to manage the structure and the physicochemical and photocatalytic properties of the coatings. In order to hinder the sodium contamination of the catalyst from the glass substrate, either during in situ or ex situ heating of the coating, a SiNx diffusion barrier is intercalated with a fixed thickness. Different layers of TiO2 were prepared at high pressure in a reactor equipped with a closed-loop control system based on optical emission spectroscopy. The influence of the in situ crystallization at different temperatures on the properties of the TiO2 coatings was studied. These properties were compared with those of samples synthesized ex situ and at the same temperatures. Finally, first studies on the influence of silver enrichment at different contents on photocatalytic activity under visible light of TiO2 layers crystallized in situ and ex situ, are presented
Benzeggouta, Dhafira. „Etude de procédés de dépôts de films minces par décharge magnétron fortement ionisée“. Paris 11, 2008. http://www.theses.fr/2008PA112090.
Der volle Inhalt der QuelleLn modern techniques of thin film deposition it is necessary to improve the quality of the deposited thin film, to achieve a better control of the energy deposited to the growing thin film and to permit the deposition of thin films on complex shape substrates of with good step coverage. The main drawback of convention al De magnetron sputtering is that emitted metal particles are mainly neutrals. It this condition, it is difficult to guide. Their pathway and to control their energy. An improvement of sputtering process consists in iO[1izing the emitted vapour by adding a second discharge between the target and the substrate. This technique is usually called IPVD (Ionized Physical Vapor Deposition) in which frequently a second Radio-Frequency (RF) discharge is used (RF-IPVD). A second alternative method developed more recently, ca lied HPPMS (High Power Pulsed Magnetron Sputtering), uses high power pulses applied directly on the magnetron cathode. During the,pulse. An important ionization degree of sputtered species (> 50 %) is achieved. The two techniques have been used for the case of reactive sputtering for the deposition of RU02 oxide. A very few works have developed till now for this reactive conditions. A large part of this thesis is devoted to the study of the influence of the introduction of O2 on the discharge behaviour in the two RF-IPVD and HPPMS processes. We also studied the possibility of depositing dielectric thin films BaSrTi03 using a ceramics target and the RF-IPVD process. Results obtained within this thesis open new perspectives for the use of the HPPMS technique for the development of new material having specifie properties
Jin, Chengfei. „Dépôts de TaNx par pulvérisation cathodique magnétron à fort taux d’ionisation de la vapeur pulvérisée“. Thesis, Paris 11, 2011. http://www.theses.fr/2011PA112212/document.
Der volle Inhalt der QuelleThanks to their excellent physical and chimical characteristics such as good stability with temperature, good conductor of heat and electricity, ductility, hardness, chemical inertness and good corrosion resistance, tantalum and its nitride are used in a wide variety of applications such as wear and corrosion-resistant materials, thin film transistors, diffusion barrier for copper and for carbon nanotube grown by CCVD process (catalytically chemical vapor deposition). For some recent industrial demand, it is necessary to deposit on substrates with complex shape. The main disadvantage of the conventional magnetron sputtering (CMS) is that most of the sputtered particles are neutral. To controle the energy and the path of sputtered particles, new magnetron sputtering techniques have been developed for ionizing a significant fraction of sputtered material. A new sputtering process called RF-IPVD consists in ionizing the sputtered vapor by adding second plasma by a RF coil between the target and the substrate. Another method called HIPIMS (High Power Impulsed Magnetron Sputtering), uses high power impulse instead of DC power. During the impulse, the sputtered Ta atoms are ionized in the dense plasma. We have deposited Ta thin films by CMS, RF-IPVD and HIPIMS and TaNx thin films by CMS and HIPIMS. The objective of this thesis is to compare the properties of discharges and thin films deposited by these different techniques
Sanchette, Fredéric. „Synthèse et caractérisation de dépôts Al-Cr-(N) et Al-Ti-(N) obtenus par pulvérisation cathodique magnétron en condition réactive“. Vandoeuvre-les-Nancy, INPL, 1996. http://www.theses.fr/1996INPL057N.
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