Thematische Bibliographien / Oxide and sulphide thin films

Inhaltsverzeichnis

  1. Zeitschriftenartikel
  2. Dissertationen
  3. Bücher
  4. Buchteile
  5. Konferenzberichte
  6. Berichte der Organisationen

Auswahl der wissenschaftlichen Literatur zum Thema „Oxide and sulphide thin films“

Autor: Grafiati
Veröffentlicht am 18. Mai 2024

Geben Sie eine Quelle nach APA, MLA, Chicago, Harvard und anderen Zitierweisen an

Wählen Sie eine Art der Quelle aus:

Machen Sie sich mit den Listen der aktuellen Artikel, Bücher, Dissertationen, Berichten und anderer wissenschaftlichen Quellen zum Thema "Oxide and sulphide thin films" bekannt.

Neben jedem Werk im Literaturverzeichnis ist die Option "Zur Bibliographie hinzufügen" verfügbar. Nutzen Sie sie, wird Ihre bibliographische Angabe des gewählten Werkes nach der nötigen Zitierweise (APA, MLA, Harvard, Chicago, Vancouver usw.) automatisch gestaltet.

Sie können auch den vollen Text der wissenschaftlichen Publikation im PDF-Format herunterladen und eine Online-Annotation der Arbeit lesen, wenn die relevanten Parameter in den Metadaten verfügbar sind.

Zeitschriftenartikel zum Thema "Oxide and sulphide thin films"

1

Weng, Shixing, und Michael Cocivera. „Cadmium sulphide prepared from cadmium oxide thin films“. Solar Energy Materials and Solar Cells 36, Nr. 3 (März 1995): 301–9. http://dx.doi.org/10.1016/0927-0248(94)00183-9.

Der volle Inhalt der Quelle
APA, Harvard, Vancouver, ISO und andere Zitierweisen
2

Kumar, Rajesh, und Swati Chawla. „Optical, Structural and Gas Sensing Studies on Tin Oxide Thin Films“. Asian Journal of Chemistry 31, Nr. 8 (28.06.2019): 1805–8. http://dx.doi.org/10.14233/ajchem.2019.22054.

Der volle Inhalt der Quelle
Annotation:
In this paper, pure and copper doped tin oxide thin films were grown on glass substrates by thermal evaporation technique for gas sensing applications. Optical, structural and gas sensing properties were investigated for their application for gas sensing applications. The thickness of the samples was kept about 300 nm. The films were annealed at 400 ºC for 4 h in the presence of air. The gas sensing studies were carried out for hydrogen sulphide and ethanol gas. The sensitivity was quite high for hydrogen sulphide gas but little sensitivity towards hydrocarbon gases.
APA, Harvard, Vancouver, ISO und andere Zitierweisen
3

Ho, Soonmin. „Recent advancement in the synthesis of zinc sulphide thin films“. Research Journal of Chemistry and Environment 28, Nr. 6 (30.04.2024): 87–100. http://dx.doi.org/10.25303/286rjce870100.

Der volle Inhalt der Quelle
Annotation:
This research work has given an overview on the preparation of zinc sulphide thin films on different types of substrates (quartz, soda lime glass, silicon, polyethylene terephthalate film, fluorine-doped tin oxide glass, indium tin oxide coated glass, silica, stainless steel, mica, microscopy glass slide and (100) GaAs substrate) using different types of deposition methods. XRD data showed information about the different phases (cubic, wurtzite and hexagonal) presented in the obtained as-deposited films and annealed samples. Based on optical studies, the band gap was observed in the range of 2.6 eV to 3.87 eV with good absorption coefficient value (105 to 106 cm-1). Experimental results indicated these films could be used in solar cell applications, anti-reflection coating, photocatalysts, photo detector devices and laser-oriented coating applications.
APA, Harvard, Vancouver, ISO und andere Zitierweisen
4

Thanikaikarasan, S., T. Mahalingam, S. Veeramuthumari und Luis Ixtlilco. „Electrochemical Growth and Characterization of Lead Sulphide Thin Films“. Journal of New Materials for Electrochemical Systems 16, Nr. 2 (15.04.2013): 133–37. http://dx.doi.org/10.14447/jnmes.v16i2.33.

Der volle Inhalt der Quelle
Annotation:
Growth of lead sulphide thin films has been carried out electrochemically on indium doped tin oxide coated conducting glass substrates from an aqueous acidic bath containing Pb(CH3COO)2 and Na2S2O3. X-ray diffraction pattern showed that the deposited films possess cubic structure with most prominent reflection along (200) plane. The dependency of microstructural parameters such as crystallite size, strain and dislocation density with film thickness has been analyzed. Surface morphology and film composition have been analyzed using scanning electron microscopy and energy dispersive analysis by X-rays. Optical absorption analysis showed that the prepared films possess a direct band gap value of 0.37 eV.
APA, Harvard, Vancouver, ISO und andere Zitierweisen
5

Krishnaveni, Arjunan, Gnanasangeetha Selvaraj, Susmitha Joseph, Susithra Sivam, Thomas Makshiya, Anitha Nilavan, Susai Rajendran, Časlav Lacnjevac und Abdulhameed Al-Hashem. „Synthesis of copper sulphide thin film on Indium Tin Oxide glass plate by SILAR method and its characterization“. Zastita materijala 64, Nr. 4 (2023): 468–77. http://dx.doi.org/10.5937/zasmat2304468k.

Der volle Inhalt der Quelle
Annotation:
Thin film of copper sulphide has been deposited on Indium Tin Oxide (ITO) glass plate. This film has been characterized by UV-Visible reflectance spectroscopy, FTIR spectroscopy, EDAX, and SEM. The film has been subjected to polarization study by immersing in sea water. The above studies on the thin film has been compared with copper sulphide prepared by chemical method; that is by mixing a solution of copper sulphate and sodium sulphide solution. For comparison study methods such as UV-Visible reflectance and FTIR have been employed. The UV-Visible reflectance spectrum reveals that the band gap of the copper sulphide film is 1.823eV. This indicates that the film functions as semi conductor. The UV-Visible absorption study of the film indicates that the lmax appears at 310 nm. The FTIR study of the copper sulphide film confirms the presence of CuS. The polarization study reveals that the linear polarization resistance (LPR) value decreases, when compared to ITO plate immersed in sea water. This indicates that the current flowing through the thin film increases. Such a finding can be used in solar cells. This is supported by the fact that the current flowing through the thin film, when it is immersed in sea water increases, when compared to the current flowing through the empty glass plate (without black coating) is immersed in sea water. This is further supported by the fact that for black thin film, the band gap decreases after coating. The EDAX study confirms the presence of elements Cu and S. The SEM study reveals the presence of thin film of copper sulphide on the ITO glass plate. The particle size of the copper sulphide is in the range of 101.1nm, 107.8nm and 114.5nm. Thus it is encouraging to note that copper sulphide nano particles have been prepared by SILAR method.
APA, Harvard, Vancouver, ISO und andere Zitierweisen
6

Aricò, A. S., M. Pieruccini, G. Monforte, V. Antonucci, N. Giordano und P. L. Antonucci. „Electrochemical deposition of iron sulphide thin films on tin oxide substrates“. Materials Chemistry and Physics 34, Nr. 3-4 (Juni 1993): 263–69. http://dx.doi.org/10.1016/0254-0584(93)90045-n.

Der volle Inhalt der Quelle
APA, Harvard, Vancouver, ISO und andere Zitierweisen
7

WONG, P. C., Y. S. LI, M. Y. ZHOU und K. A. R. MITCHELL. „XPS STUDIES OF THE STABILITY OF A MIXED ZIRCONIUM OXIDE AND SULPHIDE THIN FILM“. Surface Review and Letters 02, Nr. 02 (April 1995): 165–69. http://dx.doi.org/10.1142/s0218625x95000170.

Der volle Inhalt der Quelle
Annotation:
A 25 Å film formed by depositing zirconium (~2 Å min –1) onto gold foil in the presence of H 2 S (~5×10−8 mbar ) and H 2 O (~1×10−9 mbar ) has been studied by XPS. This film has an outer region composed of a mixed zirconium oxide/sulphide, while below there is metallic zirconium plus Zr/Au alloy in contact with gold. This film appears stable on heating to 400°C under UHV insofar as the sulphide part does not change, although the oxide part increases apparently as a result of some reaction of metallic zirconium with ambient water. By contrast, when this preheated film at room temperature was treated with a hydrogen plasma, the sulphide component was completely removed and the whole film was converted to the ZrO 2-like form with enhanced formation of OH groups. The hydrogen plasma treatment is therefore capable of desulphurizing the mixed zirconium oxide/sulphide film.
APA, Harvard, Vancouver, ISO und andere Zitierweisen
8

Raj, V. Bhasker, Harpreet Singh, A. Theodore Nimal, M. U. Sharma, Monika Tomar und Vinay Gupta. „Utilization of Mass and Elastic Loading in Oxide Materials Based SAW Devices for the Detection of Mustard Gas Simulant“. Advanced Materials Research 488-489 (März 2012): 1558–62. http://dx.doi.org/10.4028/www.scientific.net/amr.488-489.1558.

Der volle Inhalt der Quelle
Annotation:
The properties (mass loading and elastic changes) of different oxide materials (ZnO, TeO2, SnO2, TiO2) in thin film form has been explored for the enhanced detection of DBS (di butyl sulphide), a simulant of sulphur mustard gas. All the four oxide materials are deposited on to the surface of SAW (Surface Acoustic Wave) devices to impart sensitivity and selectivity. ZnO and SnO2 films are crystalline whereas TiO2 and TeO2 films are amorphous in nature. All the films are transparent with transparency greater than 75 % in the visible region. The SAW devices coated with different oxide materials were placed in the feedback loop of colpitt oscillator. With the exposure of DBS vapors, differential frequency increases for TiO2 thin films whereas for other oxide coatings (ZnO, TeO2 and SnO2) it decreases. ZnO coated SAW sensor is found to be maximum sensitive to DBS vapors. Investigation of sensing mechanism revealed that mass loading effect is pronounced in TiO2 thin film whereas for other films change in elasticity is dominant. The oxide coatings are very less sensitive to the other interferants.
APA, Harvard, Vancouver, ISO und andere Zitierweisen
9

Rogalski, M. S., V. Besserguenev, N. R. A. Barata und R. Baltazar. „CVD synthesis and CEMS study of Fe sulphide and oxide thin films“. IEEE Transactions on Magnetics 39, Nr. 5 (September 2003): 2696–98. http://dx.doi.org/10.1109/tmag.2003.815565.

Der volle Inhalt der Quelle
APA, Harvard, Vancouver, ISO und andere Zitierweisen
10

Zhu, Hui, Jian Feng Huang, Li Yun Cao, Yan Wang und Xie Rong Zeng. „Effect of Deposition Voltage on the Composition, Morphology and Optical Properties of ZnS Thin Films Prepared by Cathodic Electrodeposition“. Advanced Materials Research 105-106 (April 2010): 348–50. http://dx.doi.org/10.4028/www.scientific.net/amr.105-106.348.

Der volle Inhalt der Quelle
Annotation:
Zinc sulphide (ZnS) thin films were deposited on the indium tin oxide (ITO) substrates by a novel, simple cathodic electrodeposition method under atmospheric pressure. These thin films were characterized by X-ray diffraction (XRD), atomic force microscopy (AFM) and photoluminescence spectrum (PL) at room temperature. The effects of deposition voltage on the phase composition, morphology and photoluminescence behavior of the thin films were investigated. XRD analysis shows that the deposited thin films is highly preferential growth along (200) orientation. Both AFM and XRD analyses indicate that the surface of the ZnS thin films is composed of uniform grains of around 50 nm in diameter. With the increase in the deposition voltages, the crystallization of the obtained thin films improves and the grain size of the ZnS thin films increases. Photoluminescence emission peaks are observed at at 475~490 nm and 500 ~530 nm at room temperature for an excitation of 210 nm.
APA, Harvard, Vancouver, ISO und andere Zitierweisen
Mehr Quellen

Dissertationen zum Thema "Oxide and sulphide thin films"

1

Ray, Sekhar chandra. „Preparation and study of some oxide and sulphide thin films deposited by dip and chemical vapour deposition Techniques“. Thesis, University of North Bengal, 1998. http://hdl.handle.net/123456789/633.

Der volle Inhalt der Quelle
APA, Harvard, Vancouver, ISO und andere Zitierweisen
2

Thongchai, Prem. „An investigation into the thin film deposition of binary oxide, ternary oxide and binary sulphide materials“. Thesis, University of Bath, 2019. https://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.767603.

Der volle Inhalt der Quelle
Annotation:
Metal oxide and metal sulphide materials dominate a wide range of attractive properties and also to provide potential performances to various applications. There is a challenge to prepare these materials as a thin film with great quality and properties. Aerosol-assisted chemical vapour deposition (AACVD) is a promising technique to offer a desired thin film. The objective of this work is the preparation of the metal oxide and metal sulphide thin films via AACVD technique with single source precursor. The properties of deposited films were characterised.
APA, Harvard, Vancouver, ISO und andere Zitierweisen
3

Wallace, Anthony James. „Tin oxide thin films“. Thesis, Brunel University, 1995. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.294556.

Der volle Inhalt der Quelle
APA, Harvard, Vancouver, ISO und andere Zitierweisen
4

Hu, Xiao. „Ultra-thin oxide films“. Thesis, University of Oxford, 2016. https://ora.ox.ac.uk/objects/uuid:d7373376-84f1-459e-bffb-f16ce43f02b7.

Der volle Inhalt der Quelle
Annotation:
Oxide ultra-thin film surfaces have properties and structures that are significantly different from the terminations of the corresponding bulk crystals. For example, surface structures of epitaxial ultra-thin oxide films are highly influenced by the crystallinity and electronegativity of the metal substrates they grown on. Some enhanced properties of the novel reconstructions are related to catalysis, sensing and microelectronics, which has resulted in an increasing interest in this field. Ultra-thin TiOx films were grown on Au(111) substrates in this work. Two well-ordered structures within monolayer coverage - honeycomb (HC) and pinwheel - were generated and investigated. Special attention has been paid to the uniform (2 x 2) Ti2O3 HC phase including its regular structure and imperfections such as domain boundaries (DBs) and point defects. Linear DBs with long-range repeating units have been observed; density functional theory (DFT) modelling has been used to simulate their atomic structures and calculate their formation energies. Rotational DBs/defects show up less frequently, however a six-fold symmetrical 'snowflake' DB loop stands out. Two types of point defects have been discovered and assigned to Ti vacancies and oxygen vacancies/hydroxyl groups. Their diffusion manners and pairing habits have been discussed within an experimental context. The results of growing NbOx ultra-thin films on Au(111) are also presented in this thesis. An identical looking (2 x 2) HC structure to the Ti2O3 ultra-thin film has been formed; a stoichiometry of Nb2O3 is suggested. Another interesting reconstruction is a hollow triangle structure. Various sizes have been found, and sides of these equilateral triangles all show a double-line feature aligned along the { 1 ₁⁻ } directions of the Au(111) lattice. Chemical composition characterisations of NbOx thin films are still required as is DFT modelling. Experimental techniques used in this thesis include scanning tunnelling microscopy (STM), low energy electron diffraction (LEED), and X-ray photoelectron spectroscopy (XPS). Ultra-thin oxide films were created by physical vapour deposition (PVD) in ultra-high vacuum (UHV) systems.
APA, Harvard, Vancouver, ISO und andere Zitierweisen
5

Д`яченко, Олексій Вікторович, Алексей Викторович Дьяченко, Oleksii Viktorovych Diachenko, Анатолій Сергійович Опанасюк, Анатолий Сергеевич Опанасюк, Anatolii Serhiiovych Opanasiuk, D. Nam und H. Cheong. „Characterization Cupper Oxide thin films“. Thesis, Львівський національний університет ім. Івана Франка, 2015. http://essuir.sumdu.edu.ua/handle/123456789/48287.

Der volle Inhalt der Quelle
Annotation:
For obtaining of the CuO thin films have used spray pyrolysis method. Glass plates were cleaned in ultrasonic bath and washed with ethanol, used as a substrates. We used an aqueous solution of copper chloride (CuCl22H2O) with a concentration of 0.05 M as a precursor. The substrate temperature range from 570 to 720 K, with step Т=50 K. For atomization of precursor the air flow with a pressure of 0.25 MPa was used.
APA, Harvard, Vancouver, ISO und andere Zitierweisen
6

Wu, Chen. „Elemental growth of oxide thin films“. Thesis, University of Oxford, 2010. http://ora.ox.ac.uk/objects/uuid:ac82a52f-bb62-41d0-a604-3cf7a95e5aaf.

Der volle Inhalt der Quelle
Annotation:
This thesis reports on the elemental growth of oxide thin films including TiOx, BaOx and BaxTiyOz by Ti/Ba deposition and oxidation. The films were grown on two different substrates, Au(111) and SrTiO₃(001), and studied using a variety of surface characterisation techniques. On the reconstructed Au(111) surface, three different TiOx structures were obtained with increasing Ti amounts deposited: a (2 × 2) Ti₂O₃ honeycomb structure, a pinwheel structure that is the result of a Moiré pattern, and a triangular island TiO1.30 structure. The structures arise from raised Ti coverages and have increased Ti densities. Although Ba deposited on the reconstructed Au(111) has a weak interaction with the substrate, the BaOx thin films can grow epitaxially and lift the Au(111) reconstruction. Two well-ordered phases, a (6 × 6) and a (2√3 × 2√3) BaOx structure, were obtained which may have octopolar-based surface structures. For Ba & Ti deposition on Au(111), a locally ordered (5 × 5) BaxTiyOz structure was observed in the sub-monolayer regime. What is more interesting is the possible formation of a BaO-TiO surface alloy with short-range ordering achieved by Ba deposition on the (2 × 2) Ti₂O₃-templated Au(111) surface. This is the first time that surface-alloying has been observed for oxides. When Ti is deposited onto the SrTiO₃(001) surface, it is incorporated into the substrate by forming a variety of Ti-rich SrTiO₃ surface reconstructions, such as c(4 × 2), (6 × 2), (9 × 2) and (√5 ×√5)-R26.6°. Ti deposition provides a completely different route to obtaining these reconstructions at much lower anneal temperatures than the previously reported preparation procedures involving sputtering and annealing the SrTiO₃ sample. Anatase islands with (1 × 3) and (1 × 5) periodicities were also formed by increasing the Ti deposition amount and post-annealing. Reconstructed SrTiO₃ substrate surface has a lattice that differs from the bulk crystal and affects the epitaxial growth of BaO, however, a locally ordered BaOx structure was observed on the sputtered substrate with a growth temperature of 300 °C. Depositing Ba & Ti on SrTiO₃(001) results in the formation of BaOx clusters and the Ti incorporation into the substrate, forming the familiar Ti-rich SrTiO₃ surface reconstructions.
APA, Harvard, Vancouver, ISO und andere Zitierweisen
7

Yang, Zheng. „Doping in zinc oxide thin films“. Diss., [Riverside, Calif.] : University of California, Riverside, 2009. http://gateway.proquest.com/openurl?url_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:dissertation&res_dat=xri:pqdiss&rft_dat=xri:pqdiss:3359913.

Der volle Inhalt der Quelle
Annotation:
Thesis (Ph. D.)--University of California, Riverside, 2009.
Includes abstract. Available via ProQuest Digital Dissertations. Title from first page of PDF file (viewed March 12, 2010). Includes bibliographical references. Also issued in print.
APA, Harvard, Vancouver, ISO und andere Zitierweisen
8

MARTINEZ, POZZONI UMBERTO LUIGI. „Oxide ultra-thin films on metals“. Doctoral thesis, Università degli Studi di Milano-Bicocca, 2009. http://hdl.handle.net/10281/7463.

Der volle Inhalt der Quelle
Annotation:
When the thickness of an oxide film is below a nm (few atomic layers) the interaction with the metal substrate, together with structural and morphology changes, can lead to completely different chemistry with espect to thicker films and can lead to new and unprecedented phenomena. This thesis focuses on the study of the structure and properties of different ultrathin oxide films epitaxially grown on metal subtrates and their interactions with adsorbed metal atoms and clusters.
APA, Harvard, Vancouver, ISO und andere Zitierweisen
9

Barrioz, Vincent. „Laser-fibre system for in-situ stress monitoring of thin films“. Thesis, Bangor University, 2003. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.273632.

Der volle Inhalt der Quelle
APA, Harvard, Vancouver, ISO und andere Zitierweisen
10

Sands, D. „Growth and characterisation of thin films of zinc sulphide on silicon“. Thesis, University of Bradford, 1987. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.379798.

Der volle Inhalt der Quelle
APA, Harvard, Vancouver, ISO und andere Zitierweisen
Mehr Quellen

Bücher zum Thema "Oxide and sulphide thin films"

1

Fanciulli, Marco, und Giovanna Scarel, Hrsg. Rare Earth Oxide Thin Films. Berlin, Heidelberg: Springer Berlin Heidelberg, 2007. http://dx.doi.org/10.1007/b137342.

Der volle Inhalt der Quelle
APA, Harvard, Vancouver, ISO und andere Zitierweisen
2

Mele, Paolo, Tamio Endo, Shunichi Arisawa, Chaoyang Li und Tetsuo Tsuchiya, Hrsg. Oxide Thin Films, Multilayers, and Nanocomposites. Cham: Springer International Publishing, 2015. http://dx.doi.org/10.1007/978-3-319-14478-8.

Der volle Inhalt der Quelle
APA, Harvard, Vancouver, ISO und andere Zitierweisen
3

Ezema, Fabian I., Chandrakant D. Lokhande und Rajan Jose, Hrsg. Chemically Deposited Nanocrystalline Metal Oxide Thin Films. Cham: Springer International Publishing, 2021. http://dx.doi.org/10.1007/978-3-030-68462-4.

Der volle Inhalt der Quelle
APA, Harvard, Vancouver, ISO und andere Zitierweisen
4

Schneller, Theodor, Rainer Waser, Marija Kosec und David Payne, Hrsg. Chemical Solution Deposition of Functional Oxide Thin Films. Vienna: Springer Vienna, 2013. http://dx.doi.org/10.1007/978-3-211-99311-8.

Der volle Inhalt der Quelle
APA, Harvard, Vancouver, ISO und andere Zitierweisen
5

Murphy, Thomas Patrick. Electrochromic properties of tin-nickel oxide thin films. Oxford: Oxford Brookes University, 1997.

Den vollen Inhalt der Quelle finden
APA, Harvard, Vancouver, ISO und andere Zitierweisen
6

Elfallal, Ibrahim Abdel-Wahab. A study of indium tin oxide thin films. Salford: University of Salford, 1992.

Den vollen Inhalt der Quelle finden
APA, Harvard, Vancouver, ISO und andere Zitierweisen
7

M, Durbin Steven, Wenckstern Holger von, Allen Martin W und Materials Research Society, Hrsg. Zinc oxide and related materials--2009: Symposium held November 30-December 3, 2009, Boston, Massachusetts, USA. Warrendale, Pa: Materials Research Society, 2010.

Den vollen Inhalt der Quelle finden
APA, Harvard, Vancouver, ISO und andere Zitierweisen
8

M, Fanciulli, und Scarel Giovanna, Hrsg. Rare earth oxide thin films: Growth, characterization, and applications. Berlin: Springer, 2007.

Den vollen Inhalt der Quelle finden
APA, Harvard, Vancouver, ISO und andere Zitierweisen
9

Yagoubi, Benabdellah. A study of some thin transition metal oxide films. Uxbridge: Brunel University, 1989.

Den vollen Inhalt der Quelle finden
APA, Harvard, Vancouver, ISO und andere Zitierweisen
10

Barquinha, Pedro. Transparent oxide electronics: From materials to devices. Hoboken, N.J: Wiley, 2012.

Den vollen Inhalt der Quelle finden
APA, Harvard, Vancouver, ISO und andere Zitierweisen
Mehr Quellen

Buchteile zum Thema "Oxide and sulphide thin films"

1

Haavik, Camilla, und Per Martin Rørvik. „Conducting Oxide Thin Films“. In Chemical Solution Deposition of Functional Oxide Thin Films, 621–54. Vienna: Springer Vienna, 2013. http://dx.doi.org/10.1007/978-3-211-99311-8_25.

Der volle Inhalt der Quelle
APA, Harvard, Vancouver, ISO und andere Zitierweisen
2

Mele, Paolo, Shrikant Saini und Edoardo Magnone. „Thermoelectric Modules Based on Oxide Thin Films“. In Thermoelectric Thin Films, 139–56. Cham: Springer International Publishing, 2019. http://dx.doi.org/10.1007/978-3-030-20043-5_7.

Der volle Inhalt der Quelle
APA, Harvard, Vancouver, ISO und andere Zitierweisen
3

Thimont, Yohann. „Thermoelectric Oxide Thin Films with Hopping Transport“. In Thermoelectric Thin Films, 185–204. Cham: Springer International Publishing, 2019. http://dx.doi.org/10.1007/978-3-030-20043-5_9.

Der volle Inhalt der Quelle
APA, Harvard, Vancouver, ISO und andere Zitierweisen
4

Kim, Heungsoo. „Transparent Conducting Oxide Films“. In Pulsed Laser Deposition of Thin Films, 239–60. Hoboken, NJ, USA: John Wiley & Sons, Inc., 2006. http://dx.doi.org/10.1002/9780470052129.ch11.

Der volle Inhalt der Quelle
APA, Harvard, Vancouver, ISO und andere Zitierweisen
5

Lu, Jiwei, Kevin G. West und Stuart A. Wolf. „Novel Magnetic Oxide Thin Films“. In Thin Film Metal-Oxides, 95–129. Boston, MA: Springer US, 2009. http://dx.doi.org/10.1007/978-1-4419-0664-9_3.

Der volle Inhalt der Quelle
APA, Harvard, Vancouver, ISO und andere Zitierweisen
6

Variola, Fabio, und Antonio Nanci. „Titania Thin Films in Biocompatible Matals and Medical Implants“. In Oxide Ultrathin Films, 309–28. Weinheim, Germany: Wiley-VCH Verlag GmbH & Co. KGaA, 2012. http://dx.doi.org/10.1002/9783527640171.ch13.

Der volle Inhalt der Quelle
APA, Harvard, Vancouver, ISO und andere Zitierweisen
7

Bersuker, Gennadi, Keith McKenna und Alexander Shluger. „Silica and High-k Dielectric Thin Films in Microelectronics“. In Oxide Ultrathin Films, 101–18. Weinheim, Germany: Wiley-VCH Verlag GmbH & Co. KGaA, 2012. http://dx.doi.org/10.1002/9783527640171.ch5.

Der volle Inhalt der Quelle
APA, Harvard, Vancouver, ISO und andere Zitierweisen
8

Vattuone, Luca, Letizia Savio und Mario Rocca. „Phonons in Thin Oxide Films“. In Oxide Materials at the Two-Dimensional Limit, 169–99. Cham: Springer International Publishing, 2016. http://dx.doi.org/10.1007/978-3-319-28332-6_6.

Der volle Inhalt der Quelle
APA, Harvard, Vancouver, ISO und andere Zitierweisen
9

Trinh, Bui Nguyen Quoc, Endah Kinarya Palupi und Akihiko Fujiwara. „Solution-Processed Oxide-Semiconductor Films and Devices“. In Functional Thin Films Technology, 225–52. New York: CRC Press, 2021. http://dx.doi.org/10.1201/9781003088080-9.

Der volle Inhalt der Quelle
APA, Harvard, Vancouver, ISO und andere Zitierweisen
10

Rupprechter, Günther, und Simon Penner. „Catalysis by Thin Oxide Films and Oxide Nanoparticles“. In Model Systems in Catalysis, 367–94. New York, NY: Springer New York, 2009. http://dx.doi.org/10.1007/978-0-387-98049-2_17.

Der volle Inhalt der Quelle
APA, Harvard, Vancouver, ISO und andere Zitierweisen

Konferenzberichte zum Thema "Oxide and sulphide thin films"

1

Geethu, R., S. Dhanya, P. V. Sreenivasan, Namitha Ashokan, B. Pradeep, Rachel Reena Philip, P. Predeep, Mrinal Thakur und M. K. Ravi Varma. „Optoelectronic Properties of Nanostructured Cadmium Sulphide Thin Films“. In OPTICS: PHENOMENA, MATERIALS, DEVICES, AND CHARACTERIZATION: OPTICS 2011: International Conference on Light. AIP, 2011. http://dx.doi.org/10.1063/1.3643618.

Der volle Inhalt der Quelle
APA, Harvard, Vancouver, ISO und andere Zitierweisen
2

Akkari, A., T. Ben Nasr, N. Kamoun, Mourad Telmini, Najeh Thabet Mliki und Ezeddine Sediki. „Structural and optical properties of Tin sulphide thin films“. In FUNDAMENTAL AND APPLIED SPECTROSCOPY: Second International Spectroscopy Conference, ISC 2007. AIP, 2007. http://dx.doi.org/10.1063/1.2795424.

Der volle Inhalt der Quelle
APA, Harvard, Vancouver, ISO und andere Zitierweisen
3

Sumi, R., Anita R. Warrier und C. Vijayan. „Synthesis of indium sulphide quantum dots in perfluoronated ionomer membrane“. In OPTOELECTRONIC MATERIALS AND THIN FILMS: OMTAT 2013. AIP Publishing LLC, 2014. http://dx.doi.org/10.1063/1.4862004.

Der volle Inhalt der Quelle
APA, Harvard, Vancouver, ISO und andere Zitierweisen
4

Shyju, T. S., und R. Gopalakrishnan. „Studies on lead sulphide thin films deposited by photochemical method“. In 2013 International Conference on Advanced Nanomaterials and Emerging Engineering Technologies (ICANMEET). IEEE, 2013. http://dx.doi.org/10.1109/icanmeet.2013.6609311.

Der volle Inhalt der Quelle
APA, Harvard, Vancouver, ISO und andere Zitierweisen
5

Giribabu, K., R. Suresh, R. Manigandan, L. Vijayalakshmi, A. Stephen und V. Narayanan. „Synthesis of zinc sulphide nanoparticles and its photodegradation ability towards organic pollutants“. In OPTOELECTRONIC MATERIALS AND THIN FILMS: OMTAT 2013. AIP Publishing LLC, 2014. http://dx.doi.org/10.1063/1.4862006.

Der volle Inhalt der Quelle
APA, Harvard, Vancouver, ISO und andere Zitierweisen
6

Kaur, Manmeet, S. Kailasa Ganapathi, Varsha Chaware, Vivek Rane, Niranjan Ramgir, Niyanta Datta, Vijaya Giramkar, Girish Phatak, D. K. Aswal und S. K. Gupta. „SnO2: CuO based hydrogen sulphide sensor on LTCC substrates“. In INDIAN VACUUM SOCIETY SYMPOSIUM ON THIN FILMS: SCIENCE AND TECHNOLOGY. AIP, 2012. http://dx.doi.org/10.1063/1.4732450.

Der volle Inhalt der Quelle
APA, Harvard, Vancouver, ISO und andere Zitierweisen
7

Jensen, Lars O., Frank Wagner, Mathias Mende, Céline Gouldieff, Holger Blaschke, Jean-Yves Natoli und Detlev Ristau. „Defect formation in oxide thin films“. In XLIII Annual Symposium on Optical Materials for High Power Lasers, herausgegeben von Gregory J. Exarhos, Vitaly E. Gruzdev, Joseph A. Menapace, Detlev Ristau und M. J. Soileau. SPIE, 2011. http://dx.doi.org/10.1117/12.899113.

Der volle Inhalt der Quelle
APA, Harvard, Vancouver, ISO und andere Zitierweisen
8

Fan, Rui-Ying, Yue M. Lu und Xiangyun Song. „Microstructure of titanium oxide thin films“. In Shanghai - DL tentative, herausgegeben von Shixun Zhou und Yongling Wang. SPIE, 1991. http://dx.doi.org/10.1117/12.47278.

Der volle Inhalt der Quelle
APA, Harvard, Vancouver, ISO und andere Zitierweisen
9

Kasischke, Maren, Stella Maragkaki, Andreas Ostendorf, Sergej Volz und Evgeny L. Gurevich. „Graphene oxide reduction induced by femtosecond laser irradiation“. In Nanostructured Thin Films X, herausgegeben von Tom G. Mackay, Akhlesh Lakhtakia und Yi-Jun Jen. SPIE, 2017. http://dx.doi.org/10.1117/12.2274976.

Der volle Inhalt der Quelle
APA, Harvard, Vancouver, ISO und andere Zitierweisen
10

MALASHCHONAK, M. V., E. A. STRELTSOV, S. K. POZNYAK, A. V. MAZANIK und A. K. FEDOTOV. „MESOPOROUS INDIUM OXIDE FILMS SENSITIZED WITH CADMIUM SULPHIDE FOR SOLAR CELLS APPLICATION“. In Proceedings of International Conference Nanomeeting – 2013. WORLD SCIENTIFIC, 2013. http://dx.doi.org/10.1142/9789814460187_0116.

Der volle Inhalt der Quelle
APA, Harvard, Vancouver, ISO und andere Zitierweisen

Berichte der Organisationen zum Thema "Oxide and sulphide thin films"

1

Eng, Gabriel. Fabrication and Characterization of Gradient Oxide Thin Films. Portland State University Library, Januar 2016. http://dx.doi.org/10.15760/honors.281.

Der volle Inhalt der Quelle
APA, Harvard, Vancouver, ISO und andere Zitierweisen
2

Ramanathan, Shriram. Photo-Activated Synthesis of Functional Oxide Thin Films. Fort Belvoir, VA: Defense Technical Information Center, März 2010. http://dx.doi.org/10.21236/ada534012.

Der volle Inhalt der Quelle
APA, Harvard, Vancouver, ISO und andere Zitierweisen
3

Chow, A. F., A. I. Kingon, O. Auciello und D. B. Poker. Investigation of optical loss mechanisms in oxide thin films. Office of Scientific and Technical Information (OSTI), Mai 1995. http://dx.doi.org/10.2172/86955.

Der volle Inhalt der Quelle
APA, Harvard, Vancouver, ISO und andere Zitierweisen
4

Carim, Altaf H. Microstructures and Epitaxy in Oxide Superconductor Thin Films and Devices. Fort Belvoir, VA: Defense Technical Information Center, März 1994. http://dx.doi.org/10.21236/ada278427.

Der volle Inhalt der Quelle
APA, Harvard, Vancouver, ISO und andere Zitierweisen
5

Olson, K. Laser photodeposition of molybdenum oxide thin films from organometallic precursors. Office of Scientific and Technical Information (OSTI), Januar 1990. http://dx.doi.org/10.2172/7186114.

Der volle Inhalt der Quelle
APA, Harvard, Vancouver, ISO und andere Zitierweisen
6

Apen, E. A., L. M. Atagi, R. S. Barbero, B. F. Espinoza, K. M. Hubbard, K. V. Salazar, J. A. Samuels, D. C. Smith und D. M. Hoffman. New deposition processes for the growth of oxide and nitride thin films. Office of Scientific and Technical Information (OSTI), November 1998. http://dx.doi.org/10.2172/676883.

Der volle Inhalt der Quelle
APA, Harvard, Vancouver, ISO und andere Zitierweisen
7

Pejakovic, Dusan. Thin Films of Reduced Hafnium Oxide with Excess Carbon for High-Temperature Oxidation Protection. Fort Belvoir, VA: Defense Technical Information Center, Februar 2010. http://dx.doi.org/10.21236/ada514280.

Der volle Inhalt der Quelle
APA, Harvard, Vancouver, ISO und andere Zitierweisen
8

Vohs, John, Raymond Gorte und Steve McIntosh. Enhancing Coking Tolerance and Stability of SOFC Anodes Using Atomic Layer Deposition (ALD) of Oxide Thin Films. Office of Scientific and Technical Information (OSTI), Dezember 2021. http://dx.doi.org/10.2172/1837232.

Der volle Inhalt der Quelle
APA, Harvard, Vancouver, ISO und andere Zitierweisen
Die Auswahlen zum Thema "Oxide and sulphide thin films" für konkrete Quellenarten können Sie auch interessieren:
Zeitschriftenartikel Dissertationen Bücher
Wir bieten Rabatte auf alle Premium-Pläne für Autoren, deren Werke in thematische Literatursammlungen aufgenommen wurden. Kontaktieren Sie uns, um einen einzigartigen Promo-Code zu erhalten!

Zur Bibliographie