Dissertationen zum Thema „Metal oxide semiconductors“
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Peleckis, Germanas. „Studies on diluted oxide magnetic semiconductors for spin electronic applications“. Access electronically, 2006. http://www.library.uow.edu.au/adt-NWU/public/adt-NWU20070821.145447/index.html.
Der volle Inhalt der QuelleWu, Kehuey. „Strain effects on the valence band of silicon piezoresistance in p-type silicon and mobility enhancement in strained silicon pMOSFET /“. [Gainesville, Fla.] : University of Florida, 2005. http://purl.fcla.edu/fcla/etd/UFE0008390.
Der volle Inhalt der QuelleAl-Ahmadi, Ahmad Aziz. „Complementary orthogonal stacked metal oxide semiconductor a novel nanoscale complementary metal oxide semiconductor architecture /“. Ohio : Ohio University, 2006. http://www.ohiolink.edu/etd/view.cgi?ohiou1147134449.
Der volle Inhalt der QuelleLiu, Kou-chen. „Si1-xGex/Si vertical MOSFETs and sidewall strained Si devices : design and fabrication /“. Digital version accessible at:, 1999. http://wwwlib.umi.com/cr/utexas/main.
Der volle Inhalt der QuelleHöhr, Timm. „Quantum-mechanical modeling of transport parameters for MOS devices /“. Konstanz : Hartnung-Gorre, 2006. http://www.loc.gov/catdir/toc/fy0707/2007358987.html.
Der volle Inhalt der QuelleSummary in German and English, text in English. Includes bibliographical references (p. 123-132).
Gurcan, Zeki B. „0.18 [mu]m high performance CMOS process optimization for manufacturability /“. Online version of thesis, 2005. http://hdl.handle.net/1850/5197.
Der volle Inhalt der QuelleWu, Ting. „Design of terabits/s CMOS crossbar switch chip /“. View Abstract or Full-Text, 2003. http://library.ust.hk/cgi/db/thesis.pl?ELEC%202003%20WU.
Der volle Inhalt der QuelleIncludes bibliographical references (leaves 100-105). Also available in electronic version. Access restricted to campus users.
Wu, Xu Sheng. „Three dimensional multi-gates devices and circuits fabrication, characterization, and modeling /“. View abstract or full-text, 2005. http://library.ust.hk/cgi/db/thesis.pl?ELEC%202005%20WUX.
Der volle Inhalt der QuelleModzelewski, Kenneth Paul. „DC parameter extraction technique for independent double gate MOSFETs a thesis presented to the faculty of the Graduate School, Tennessee Technological University /“. Click to access online, 2009. http://proquest.umi.com/pqdweb?index=11&did=1759989211&SrchMode=1&sid=1&Fmt=6&VInst=PROD&VType=PQD&RQT=309&VName=PQD&TS=1250600320&clientId=28564.
Der volle Inhalt der QuelleTrivedi, Vishal P. „Physics and design of nonclassical nanoscale CMOS devices with ultra-thin bodies“. [Gainesville, Fla.] : University of Florida, 2005. http://purl.fcla.edu/fcla/etd/UFE0009860.
Der volle Inhalt der QuelleKhan, Shamsul Arefin. „Deep sub-micron MOS transistor design and manufacturing sensitivity analysis /“. Digital version accessible at:, 1999. http://wwwlib.umi.com/cr/utexas/main.
Der volle Inhalt der QuelleHuang, Amy. „On the plasma induced degradation of organosilicate glass (OSG) as an interlevel dielectric for sub 90 nm CMOS /“. Online version of thesis, 2008. http://hdl.handle.net/1850/5899.
Der volle Inhalt der QuelleYoon, Kwang Sub. „A precision analog small-signal model for submicron MOSFET devices“. Diss., Georgia Institute of Technology, 1990. http://hdl.handle.net/1853/14935.
Der volle Inhalt der QuelleShelley, Valerie Anderson 1957. „Validity of the Jain and Balk analytic model for two-dimensional effects in short channel MOSFETS“. Thesis, The University of Arizona, 1988. http://hdl.handle.net/10150/276801.
Der volle Inhalt der QuellePesci, Federico M. „Metal oxide semiconductors employed as photocatalysts during water splitting“. Thesis, Imperial College London, 2014. http://hdl.handle.net/10044/1/24964.
Der volle Inhalt der QuelleWaghe, Anil Bhalchandra. „Synthesis of Porous Monoclinic Tungsten Oxides and Their Application in Sensors“. Fogler Library, University of Maine, 2003. http://www.library.umaine.edu/theses/pdf/WagheAB2003.pdf.
Der volle Inhalt der QuelleÖzdağ, Pınar Güneş Mehmet. „Capacitance-voltage spectroscopy in metal-tantalum pentoxide (Ta-O)-silicon mos capacitors/“. [s.l.]: [s.n.], 2005. http://library.iyte.edu.tr/tezler/master/fizik/T000397.pdf.
Der volle Inhalt der QuelleKeywords: Capacitance-voltage spectroscopy, high dielectric constant insulators, tantalum pentoxide. Includes bibliographical references (leaves 92-97)
Randell, Heather Eve. „Applications of stress from boron doping and other challenges in silicon technology“. [Gainesville, Fla.] : University of Florida, 2005. http://purl.fcla.edu/fcla/etd/UFE0010292.
Der volle Inhalt der QuelleChan, Wan Tim. „CMOS-compatible zero-mask one time programmable (OTP) memory design /“. View abstract or full-text, 2008. http://library.ust.hk/cgi/db/thesis.pl?ECED%202008%20CHANW.
Der volle Inhalt der QuelleDuffy, Christopher James. „Modeling hot-electron injection and impact ionization in pFET's“. Thesis, Georgia Institute of Technology, 2001. http://hdl.handle.net/1853/14796.
Der volle Inhalt der QuelleWang, Haihong. „Advanced transport models development for deep submicron low power CMOS device design /“. Digital version accessible at:, 1999. http://wwwlib.umi.com/cr/utexas/main.
Der volle Inhalt der QuellePUZZOVIO, Delia. „Surface interaction mechanisms in metal-oxide semiconductors for alkane detection“. Doctoral thesis, Università degli studi di Ferrara, 2009. http://hdl.handle.net/11392/2389140.
Der volle Inhalt der QuelleBowen, Andrew. „Anodisation and study of oxide films formed on zirconium“. Thesis, University of Nottingham, 1989. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.328407.
Der volle Inhalt der QuelleYellai, Kashyap Williams John R. „Post ion-implantation surface planarization process for 4H-SiC wafers using carbon encapsulation technique“. Auburn, Ala., 2006. http://repo.lib.auburn.edu/2006%20Fall/Theses/YELLAI_KASHYAP_13.pdf.
Der volle Inhalt der QuelleShum, Roger Chi Fai Carleton University Dissertation Engineering Electrical. „A timing macro model for performance optimization of CMOS logic circuits“. Ottawa, 1992.
Den vollen Inhalt der Quelle findenHildreth, Scott A. „Statistical SPICE parameter extraction for an N-Well CMOS process /“. Online version of thesis, 1995. http://hdl.handle.net/1850/12177.
Der volle Inhalt der QuelleCsutak, Sebastian Marius. „Optical receivers and photodetectors in 130nm CMOS technology“. Access restricted to users with UT Austin EID Full text (PDF) from UMI/Dissertation Abstracts International, 2001. http://wwwlib.umi.com/cr/utexas/fullcit?p3036588.
Der volle Inhalt der QuelleVega, Reinaldo A. „Schottky field effect transistors and Schottky CMOS circuitry /“. Online version of thesis, 2006. http://hdl.handle.net/1850/5179.
Der volle Inhalt der QuelleBialuschewski, Danny [Verfasser]. „Laser-assisted Modification of Metals and Metal Oxide Semiconductors as Photoactive Materials / Danny Bialuschewski“. München : Verlag Dr. Hut, 2020. http://d-nb.info/1219477699/34.
Der volle Inhalt der QuelleAli, Danish. „Coulomb blockade in silicon-on-insulator“. Thesis, University of Cambridge, 1994. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.321368.
Der volle Inhalt der QuelleCarruthers, Colin. „Low noise operation in deep depletion mode MOS transistors“. Thesis, University of Edinburgh, 1989. http://hdl.handle.net/1842/10866.
Der volle Inhalt der QuellePrice, David T. „N-Well CMOS process integration /“. Online version of thesis, 1992. http://hdl.handle.net/1850/11261.
Der volle Inhalt der QuelleJohn, Soji. „UHVCVD growth of Si₁-x-yGexCy epitaxial materials and application in heterostructure MOS devices /“. Digital version accessible at:, 1998. http://wwwlib.umi.com/cr/utexas/main.
Der volle Inhalt der QuelleUpadhyaya, Parag. „High IIP2 CMOS doubly balanced quadrature sub-harmonic mixer for 5 GHz direct conversion receiver“. Online access for everyone, 2005. http://www.dissertations.wsu.edu/Thesis/Spring2005/p%5Fupadhyaya%5F050505.pdf.
Der volle Inhalt der QuelleZeng, Xu, und 曾旭. „Electrical reliability of N-Mos devices with N2O-based oxides as gate dielectrics“. Thesis, The University of Hong Kong (Pokfulam, Hong Kong), 1996. http://hub.hku.hk/bib/B31235475.
Der volle Inhalt der QuelleZeng, Xu. „Electrical reliability of N-Mos devices with N2O-based oxides as gate dielectrics /“. Hong Kong : University of Hong Kong, 1996. http://sunzi.lib.hku.hk/hkuto/record.jsp?B1966980X.
Der volle Inhalt der QuelleTurner, Gary Chandler. „Zinc Oxide MESFET Transistors“. Thesis, University of Canterbury. Electrical and Computer Engineering, 2009. http://hdl.handle.net/10092/3439.
Der volle Inhalt der QuelleDu, Xiaohua. „Understanding and optimization of gas sensors based on metal oxide semiconductors“. Connect to online resource, 2007. http://gateway.proquest.com/openurl?url_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:dissertation&res_dat=xri:pqdiss&rft_dat=xri:pqdiss:3284441.
Der volle Inhalt der QuelleBeglitis, N. „First-principles studies of surface defects of model metal-oxide semiconductors“. Thesis, University College London (University of London), 2011. http://discovery.ucl.ac.uk/1324515/.
Der volle Inhalt der QuelleAHMED, ABDELKADER ABDELHAMID MOHAMED. „Metal oxide semiconductors as humidity and NOx sensors for environmental monitoring“. Doctoral thesis, Politecnico di Torino, 2014. http://hdl.handle.net/11583/2528295.
Der volle Inhalt der QuelleGajera, Dipesh. „Process costing of microchip“. Morgantown, W. Va. : [West Virginia University Libraries], 2006. https://eidr.wvu.edu/etd/documentdata.eTD?documentid=4726.
Der volle Inhalt der QuelleTitle from document title page. Document formatted into pages; contains vii, 92 p. : ill. (some col.). Includes abstract. Includes bibliographical references (p. 85-91).
Wu, Zhenghui. „Impact of metal oxide/bulk-heterojunction interface on performance of organic solar cells“. HKBU Institutional Repository, 2015. https://repository.hkbu.edu.hk/etd_oa/159.
Der volle Inhalt der QuelleChun, Young Tea. „Charge transfer characteristic of zinc oxide nanowire devices and their applications“. Thesis, University of Cambridge, 2015. https://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.708978.
Der volle Inhalt der QuelleOuyang, Qiqing Christine. „Physical model enhancement and exploration of bandgap engineering in novel sub-100nm pMOSFETs /“. Digital version:, 2000. http://wwwlib.umi.com/cr/utexas/fullcit?p9992880.
Der volle Inhalt der QuelleHaasmann, Daniel Erwin. „Active Defects in 4H–SiC MOS Devices“. Thesis, Griffith University, 2015. http://hdl.handle.net/10072/367037.
Der volle Inhalt der QuelleThesis (PhD Doctorate)
Doctor of Philosophy (PhD)
Griffith School of Engineering
Science, Environment, Engineering and Technology
Full Text
Zhang, Xibo. „RF integrated circuit design options : from technology to layout /“. View Abstract or Full-Text, 2003. http://library.ust.hk/cgi/db/thesis.pl?ELEC%202003%20ZHANG.
Der volle Inhalt der QuelleIncludes bibliographical references (leaves 59-61). Also available in electronic version. Access restricted to campus users.
李加碧 und Stella Li. „Interface state generation induced by Fowler-Nordheim tunneling in mosdevices“. Thesis, The University of Hong Kong (Pokfulam, Hong Kong), 1999. http://hub.hku.hk/bib/B31221403.
Der volle Inhalt der QuelleCorrell, Jeffrey. „The design and implementation of an 8 bit CMOS microprocessor /“. Online version of thesis, 1992. http://hdl.handle.net/1850/11649.
Der volle Inhalt der QuelleBachelu, Carol R. Carleton University Dissertation Engineering Electrical. „A Topological single-layer routing algorithm and its application to leaf cell synthesis“. Ottawa, 1992.
Den vollen Inhalt der Quelle findenWemple, Ivan L. „Parasitic substrate modeling for monolithic mixed analog/digital circuit design and verification /“. Thesis, Connect to this title online; UW restricted, 1996. http://hdl.handle.net/1773/5944.
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