Zeitschriftenartikel: „Material modifications by ion beam“

1

Feng, Y. C., X. G. Li, and S. T. Yang. "Electron beam evaporation broad beam metal ion source for material modifications." Review of Scientific Instruments 67, no. 3 (1996): 924–26. http://dx.doi.org/10.1063/1.1146773.

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2

Ramola, R. C., and Subhash Chandra. "Ion Beam Induced Modifications in Conducting Polymers." Defect and Diffusion Forum 341 (July 2013): 69–105. http://dx.doi.org/10.4028/www.scientific.net/ddf.341.69.

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High energy ion beam induced modifications in polymeric materials is of great interest from the point of view of characterization and development of various structures and filters. Due to potential use of conducting polymers in light weight rechargeable batteries, magnetic storage media, optical computers, molecular electronics, biological and thermal sensors, the impact of swift heavy ions for the changes in electrical, structural and optical properties of polymers is desirable. The high energy ion beam irradiation of polymer is a sensitive technique to enhance its electrical conductivity, structural, mechanical and optical properties. Recent progress in the radiation effects of ion beams on conducting polymers are reviewed briefly. Our recent work on the radiation effects of ion beams on conductive polymers is described. The electrical, structural and optical properties of irradiated films were analyzed using V-I, X-Ray diffraction (XRD), scanning electron microscopy (SEM), UV-Visible spectroscopy and Fourier transform infrared spectroscopy methods.

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3

Abdul-Kader, A. M., and Andrzej Turos. "Ion Beam Induced Modifications of Biocompatible Polymer." Solid State Phenomena 239 (August 2015): 149–60. http://dx.doi.org/10.4028/www.scientific.net/ssp.239.149.

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Ion beam bombardment has shown great potential for improving the surface properties of polymers. In this paper, the ion beam-polymer interaction mechanisms are briefly discussed. The main objective of this research was to study the effects of H-ion beam on physico-chemical properties of Ultra-high-molecular-weight polyethylene (UHMWPE) as it is frequently used in biomedical applications. UHMWPE was bombarded with 65 keV H-ions to fluences ranging from 1x1014–2x1016 ions/cm2. Changes of surface layer composition produced by ion bombardment of UHMWPE samples were studied. The hydrogen release and oxygen uptake induced by ion beam bombardment were determined by Nuclear reaction analysis (NRA) using the 1H(15N, αγ)12C and Rutherford backscattering spectrometry (RBS), respectively. Tribological and hardness properties at the polymer near surface region were studied by means of friction coefficient and micro-hardness testers, respectively. Wettability of the bombarded surfaces was determined by measuring the contact angle for distilled water. The obtained results showed that the ion bombardment induced hydrogen release increases with the increasing ion fluence. An important effect observed, was the rapid oxidation of samples, which occurs after exposure of bombarded samples to air. These effects resulted in important modifications of the surface properties of bombarded material such as change of friction coefficient, hardness and improved wettability.

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4

Dudnikov, Vadim, and Andrei Dudnikov. "Highly Efficient Small Anode Ion Source." Plasma 4, no. 2 (2021): 214–21. http://dx.doi.org/10.3390/plasma4020013.

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We describe some modifications to a Bernas-type ion source that improve the ion beam production efficiency and source operating lifetime. The ionization efficiency of a Bernas type ion source has been improved by using a small anode that is a thin rod, oriented along the magnetic field. The transverse electric field of the small anode causes the plasma to drift in the crossed ExB field to the emission slit. The cathode material recycling was optimized to increase the operating lifetime, and the wall potential optimized to suppress deposition of material and subsequent flake formation. A three-electrode extraction system was optimized for low energy ion beam production and efficient space charge neutralization. An ion beam with emission current density up to 60 mA/cm2 has been extracted from the modified source running on BF3 gas. Space charge neutralization of positive ion beams was improved by injecting electronegative gases.

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Feng, Y. C., and S. P. Wong. "Low energy solid intense ion beams extracted by electron beam evaporation ion source for material modifications." Review of Scientific Instruments 69, no. 7 (1998): 2644–46. http://dx.doi.org/10.1063/1.1148992.

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6

Hirayama, Y. "GaAs/AlGaAs material modifications induced by focused Ga ion beam implantation." Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 6, no. 3 (1988): 1018. http://dx.doi.org/10.1116/1.584339.

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7

Shen, Z. G., C. H. Lee, C. Wu, D. Y. Jiang, and S. Z. Yang. "Material surface modification by pulsed ion beam." Journal of Materials Science 25, no. 7 (1990): 3139–41. http://dx.doi.org/10.1007/bf00587663.

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8

Remnev, G. E., V. A. Tarbokov, and S. K. Pavlov. "Material modification by high-intense pulsed ion beams." Physics and Chemistry of Materials Treatment 2 (2021): 5–26. http://dx.doi.org/10.30791/0015-3214-2021-2-5-26.

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The review is devoted to the use of powerful submicrosecond ion beams for the synthesis and modification of material properties. Powerful ion beams, originally developed for the problems of inertial thermonuclear fusion, have been increasingly used over the past 30 years as a powerful pulsed heating source providing ample opportunities for modifying the surface layer of materials. By varying the key parameters of the beams, such as the composition (type of ions), the duration of the accelerating pulse (10 ns – 1 μs), the kinetic energy of the ions (0.1 – 1 MeV), the energy density transmitted by the beam to the target surface per pulse (0.1 – 50 J/cm2), the main areas of application of high-power ion beams in materials science were determined: modification of the surface layer by ultrafast quenching, melting and ultrafast recrystallization with the formation of micro- and nanostructures, pulsed implantation of ions accompanied by energetic action, deposition of thin films and synthesis of nanosized powders from ablative plasma.

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9

Bacri, C. O., C. Bachelet, C. Baumier, et al. "SCALP, a platform dedicated to material modifications and characterization under ion beam." Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 406 (September 2017): 48–52. http://dx.doi.org/10.1016/j.nimb.2017.03.036.

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10

Iqbal, Muhammad, J. I. Akhter, A. Qayyum, Y. Javed, M. Rafiq, and A. A. Khuram. "Surface Modification and Characterization of Bulk Amorphous Materials." Key Engineering Materials 510-511 (May 2012): 43–50. http://dx.doi.org/10.4028/www.scientific.net/kem.510-511.43.

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Bulk metallic glasses (BMGs) are well known for their promising properties. Surface properties can be further improved by using certain techniques such as electron beam melting (EBM), laser beam melting (LBM), ion irradiation, ion implantation and neutron irradiation. BMGs especially Zr-based BMGs have numerous applications as structural materials. In this manuscript, the results are presented on microstructural investigations and phase formations in Zr-based BMGs modified by using above mentioned techniques. Microstructure was studied by scanning electron microscopy (SEM). Phase analysis was done by X-ray diffraction (XRD) and confirmed by energy dispersive spectroscopy (EDS). Vickers hardness was measured and correlated with the microstructure. The phases identified in Zr-Cu-Al-Ni alloy samples modified by EBM, LBM and ion irradiation are Ni-Zr, NiZr2, CuZr2, Cu10Zr7 and Al2NiZr6. ZrSi2 phase was detected in Zr55Cu30Al10Ni5 and Zr65Cu17Ni10Al8 BMGs irradiated with Si+ (ions). About 20-35 % increase in hardness and elastic moduli was achieved by surface modification. Modifications of BMGs by electron and laser beams melted the materials surfaces while ion irradiation improved the mechanical properties of localized zones without melting.

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11

Brow, R. K. "Glass surface modifications during ion beam sputtering." Journal of Non-Crystalline Solids 107, no. 1 (1988): 1–10. http://dx.doi.org/10.1016/0022-3093(88)90084-1.

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12

Sezen, Meltem, and Feray Bakan. "Development of Functional Surfaces on High-Density Polyethylene (HDPE) via Gas-Assisted Etching (GAE) Using Focused Ion Beams." Microscopy and Microanalysis 21, no. 6 (2015): 1379–86. http://dx.doi.org/10.1017/s1431927615015391.

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AbstractIrradiation damage, caused by the use of beams in electron and ion microscopes, leads to undesired physical/chemical material property changes or uncontrollable modification of structures. Particularly, soft matter such as polymers or biological materials is highly susceptible and very much prone to react on electron/ion beam irradiation. Nevertheless, it is possible to turn degradation-dependent physical/chemical changes from negative to positive use when materials are intentionally exposed to beams. Especially, controllable surface modification allows tuning of surface properties for targeted purposes and thus provides the use of ultimate materials and their systems at the micro/nanoscale for creating functional surfaces. In this work, XeF2 and I2 gases were used in the focused ion beam scanning electron microscope instrument in combination with gallium ion etching of high-density polyethylene surfaces with different beam currents and accordingly different gas exposure times resulting at the same ion dose to optimize and develop new polymer surface properties and to create functional polymer surfaces. Alterations in the surface morphologies and surface chemistry due to gas-assisted etching-based nanostructuring with various processing parameters were tracked using high-resolution SEM imaging, complementary energy-dispersive spectroscopic analyses, and atomic force microscopic investigations.

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13

Yatsui, Kiyoshi. "Industrial applications of pulse power and particle beams." Laser and Particle Beams 7, no. 4 (1989): 733–41. http://dx.doi.org/10.1017/s0263034600006200.

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An overview is given of recent progress in the industrial applications of intense pulse power and associated particle beams, except for activities in inertial confinement fusion. In particular, several topics are discussed which relate to the applications in the R&D of materials, the excitation of short wavelength lasers, the generation of charged particle beams, and the development of plasma X-ray sources.I. Applications in material processing. If intense pulsed charged particle beams are directed onto materials, only their surfaces where the beam energy is deposited are quickly heated up to very high temperatures. Using the pulsed beam in this way, we might expect to apply them in R&D of materials. Several novel attempts have been made, e.g., on the preparation of thin films by use of a high-density high-temperature plasma, surface modification by surface heating, and ion-beam mixing of multi-layers by use of the focused electron or ion beams, and so on. Furthermore, experimental studies have been done on the surface modification by ion implantation and the evaluation of the damage due to the irradiation by ion beams.II. Applications in the excitation of short wavelength lasers. Activities in the excitation of high-power, short wavelength lasers by using electron beams or ion beams have increased considerably.III. Applications in the generation of charged particle beams, and the development of plasma X-ray source. With regard to new accelerator technologies, several attempts are underway on the application of the modified betatron or the development of a convergent electron beam accelerator with a plasma cathode.

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14

Noël, Céline, Sara Pescetelli, Antonio Agresti, et al. "Hybrid Perovskites Depth Profiling with Variable-Size Argon Clusters and Monatomic Ions Beams." Materials 12, no. 5 (2019): 726. http://dx.doi.org/10.3390/ma12050726.

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Ion beam depth profiling is increasingly used to investigate layers and interfaces in complex multilayered devices, including solar cells. This approach is particularly challenging on hybrid perovskite layers and perovskite solar cells because of the presence of organic/inorganic interfaces requiring the fine optimization of the sputtering beam conditions. The ion beam sputtering must ensure a viable sputtering rate on hard inorganic materials while limiting the chemical (fragmentation), compositional (preferential sputtering) or topographical (roughening and intermixing) modifications on soft organic layers. In this work, model (Csx(MA0.17FA0.83)100−xPb(I0.83Br0.17)3/cTiO2/Glass) samples and full mesoscopic perovskite solar cells are profiled using low-energy (500 and 1000 eV) monatomic beams (Ar+ and Cs+) and variable-size argon clusters (Arn+, 75 < n < 4000) with energy up to 20 keV. The ion beam conditions are optimized by systematically comparing the sputtering rates and the surface modifications associated with each sputtering beam. X-ray photoelectron spectroscopy, time-of-flight secondary ion mass spectrometry, and in-situ scanning probe microscopy are combined to characterize the interfaces and evidence sputtering-related artifacts. Within monatomic beams, 500 eV Cs+ results in the most intense and stable ToF-SIMS molecular profiles, almost material-independent sputtering rates and sharp interfaces. Large argon clusters (n > 500) with insufficient energy (E < 10 keV) result in the preferential sputtering of organic molecules and are highly ineffective to sputter small metal clusters (Pb and Au), which tend to artificially accumulate during the depth profile. This is not the case for the optimized cluster ions having a few hundred argon atoms (300 < n < 500) and an energy-per-atom value of at least 20 eV. In these conditions, we obtain (i) the low fragmentation of organic molecules, (ii) convenient erosion rates on soft and hard layers (but still different), and (iii) constant molecular profiles in the perovskite layer, i.e., no accumulation of damages.

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15

Grant Norton, M., Elizabeth L. Fleischer, William Hertl, James W. Mayer, and C. Barry Carter. "Direct observation of microstructural changes in ion-beam modified ceramics." Proceedings, annual meeting, Electron Microscopy Society of America 48, no. 4 (1990): 1048–49. http://dx.doi.org/10.1017/s0424820100178379.

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A technique for the direct observation of microstructural changes in ceramics following ion- implantation is presented. Ion-implantation produces modifications to the mechanical properties of ceramic surfaces. These modifications have been investigated as a means of improving the hardness and wear of such materials. Examples of these changes will be presented for single-crystal specimens of MgO which have been implanted with Xe+ ions. The resultant microstructural changes are a function of ion fluence and are related to structural modifications at or near the surface.Transmission electron microscopy (TEM) is a powerful technique for examination of microstructure on a nanometer scale. A problem often encountered when conventional methods of specimen preparation, for TEM analysis, are used is the possibility of ion-beam induced damage. Ion-beam damage can be a serious problem especially in the preparation of MgO specimens. In the present study damage resulting from ion-milling can be entirely avoided by ion-implantation directly into an electron-transparent thin-foil specimen.

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Abdul-Kader, A. M. "Surface modifications of PADC polymeric material by ion beam bombardment for high technology applications." Radiation Measurements 69 (October 2014): 1–6. http://dx.doi.org/10.1016/j.radmeas.2014.07.013.

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17

Kitta, Mitsunori, and Masanori Kohyama. "Nanoscale controlled Li-insertion reaction induced by scanning electron-beam irradiation in a Li4Ti5O12 electrode material for lithium-ion batteries." Physical Chemistry Chemical Physics 19, no. 18 (2017): 11581–87. http://dx.doi.org/10.1039/c7cp00185a.

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Electron beam of scanning transmission electron microscopy can induce nanoscale-controlled Li-insertion in Li4Ti5O12 electrode, which is significant as a new type of electron beam-assisted chemical reactions for local structural and property modifications.

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18

Torrisi, L., and G. Foti. "Ion beam etching of polytetrafluoroethylene." Journal of Materials Research 5, no. 11 (1990): 2723–28. http://dx.doi.org/10.1557/jmr.1990.2723.

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Cross-links among long chains have been observed in ion bombarded hydrocarbon polymers like polystyrene or polyethylene. Irradiation of fluoropolymers, instead, produces a strong sample erosion with emission of fragments produced along the ion track. Polytetrafluoroethylene foils of thickness ranging from 50 μm up to 2 mm were exposed to MeV helium and proton beams. The ion erosion rate was investigated by changing the target temperature and observing surface topography modifications, using the scanning electron microscopy technique. Etching was measured as removed thickness per irradiation time in the range values of 102−104 μm/h, corresponding to about 104−106 CF2 emitted group/ion. Target temperature (200–400 K), ion mass, and ion energy are the key parameters to follow the evolution of ion erosion of polytetrafluoroethylene.

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19

Weidenmüller, U., J. Meijer, A. Stephan, et al. "Heavy ion projection beam system for material modification at high ion energy." Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 20, no. 1 (2002): 246. http://dx.doi.org/10.1116/1.1434975.

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20

Appleton, Bill R., S. Tongay, M. Lemaitre, et al. "Materials modifications using a multi-ion beam processing and lithography system." Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 272 (February 2012): 153–57. http://dx.doi.org/10.1016/j.nimb.2011.01.054.

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21

Dev, B. N. "Materials modifications in heavy ion interactions with single crystals and their ion beam characterization." Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 156, no. 1-4 (1999): 258–64. http://dx.doi.org/10.1016/s0168-583x(99)00288-8.

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22

Orloff, J., L. W. Swanson, Jia-Zheng Li, and Dave Tuggle. "Beam Size in A High-Resolution Ion Microprobe Operated at High Current." Proceedings, annual meeting, Electron Microscopy Society of America 48, no. 2 (1990): 312–13. http://dx.doi.org/10.1017/s0424820100135162.

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In recent years the development of liquid metal ion (LMI) sources has made it possible to produce high intensity focused ion beams - beams with current densities of the order of a few amperes per square centimeter and diameters of from less than 50 nanometers to a few micrometers [1,2]. These beams have been applied in areas such as scanning ion microscopy, surface analysis, lithography, implantation and micromachining (removing minute amounts of material in a precise and programmed way). In terms of technological utility micromachining has been the most important of these applications and dozens of focused ion beam systems are in use around the world, for failure analysis and circuit modification. These latter applications depend on the ion beam for removing minute amounts of material from a surface, inspecting the modified surface and for decomposing metal-bearing gases so as to deposit conducting runs on circuits.Some of the features of LMI sources that make them so useful for focused beams are: a high angular intensity of 20 microamperes/steradian, typically [3]; a small apparent source size δ of roughly 50 nanometers [4,5]; wide variety of ionic species including Ga, In, Be, Au, Si, As and B (the latter five species requiring a mass-filtering focusing column); great compactness and extremely reliable operation.

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ROUT, BIBHUDUTTA, MANGAL S. DHOUBHADEL, PRAKASH R. POUDEL, et al. "ION BEAM MATERIALS ANALYSIS AND MODIFICATIONS AT keV TO MeV ENERGIES AT THE UNIVERSITY OF NORTH TEXAS." International Journal of Modern Physics: Conference Series 27 (January 2014): 1460147. http://dx.doi.org/10.1142/s2010194514601471.

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The University of North Texas (UNT) Ion Beam Modification and Analysis Laboratory (IBMAL) has four particle accelerators including a National Electrostatics Corporation (NEC) 9SDH-2 3 MV tandem Pelletron, a NEC 9SH 3 MV single-ended Pelletron, and a 200 kV Cockcroft-Walton. A fourth HVEC AK 2.5 MV Van de Graaff accelerator is presently being refurbished as an educational training facility. These accelerators can produce and accelerate almost any ion in the periodic table at energies from a few keV to tens of MeV. They are used to modify materials by ion implantation and to analyze materials by numerous atomic and nuclear physics techniques. The NEC 9SH accelerator was recently installed in the IBMAL and subsequently upgraded with the addition of a capacitive-liner and terminal potential stabilization system to reduce ion energy spread and therefore improve spatial resolution of the probing ion beam to hundreds of nanometers. Research involves materials modification and synthesis by ion implantation for photonic, electronic, and magnetic applications, micro-fabrication by high energy (MeV) ion beam lithography, microanalysis of biomedical and semiconductor materials, development of highenergy ion nanoprobe focusing systems, and educational and outreach activities. An overview of the IBMAL facilities and some of the current research projects are discussed.

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Song, Yin, Chong-Hong Zhang, Yi-Tao Yang, Jie Gou, and Zhao-Nan Ding. "Microstructure of SiC fibers by swift heavy ion beam irradiation." Modern Physics Letters B 33, no. 20 (2019): 1950236. http://dx.doi.org/10.1142/s0217984919502361.

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In this paper, third generation SiC fiber material irradiated with the 410 MeV energy of [Formula: see text] ion at 173 K was analyzed by Raman spectroscopy, X-ray diffraction (XRD) and transmission electron microscope (TEM). Raman spectroscopy, TEM and XRD data show modifications in the local structure of irradiated SiC fibers. Although highly disordered SiC grains were observed in appearance, no evidence of amorphization was found. After the Sn ions irradiation and XRD, two diffraction peaks disappeared, which showed that the rich Si and C could be further combined in [Formula: see text] ions/cm2 dose irradiation condition. This result mainly explains the electron damage and the nuclear damage process in SiC fibers, leading to the recombination or migration of defects.

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Venkateshwar Rao, E., and M. Ramakrishna Murthy. "Ion beam modifications of defect sub-structure of calcite cleavages." Bulletin of Materials Science 31, no. 2 (2008): 139–42. http://dx.doi.org/10.1007/s12034-008-0024-2.

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Rao, E. Venkateshwar, and M. Ramakrishna Murthy. "Studies on the ion-beam modifications in ethylene diamine sulphate." Bulletin of Materials Science 22, no. 4 (1999): 797–800. http://dx.doi.org/10.1007/bf02745608.

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27

Nellen, Philipp M., Patric Strasser, Victor Callegari, Robert Wüest, Daniel Erni, and Franck Robin. "Focused ion beam modifications of indium phosphide photonic crystals." Microelectronic Engineering 84, no. 5-8 (2007): 1244–47. http://dx.doi.org/10.1016/j.mee.2007.01.037.

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28

Fox, Daniel, Yanhui Chen, Colm C. Faulkner, and Hongzhou Zhang. "Nano-structuring, surface and bulk modification with a focused helium ion beam." Beilstein Journal of Nanotechnology 3 (August 8, 2012): 579–85. http://dx.doi.org/10.3762/bjnano.3.67.

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We investigate the ability of a focused helium ion beam to selectively modify and mill materials. The sub nanometer probe size of the helium ion microscope used provides lateral control not previously available for helium ion irradiation experiments. At high incidence angles the helium ions were found to remove surface material from a silicon lamella leaving the subsurface structure intact for further analysis. Surface roughness and contaminants were both reduced by the irradiation process. Fabrication is also realized with a high level of patterning acuity. Implantation of helium beneath the surface of the sample is visualized in cross section allowing direct observation of the extended effects of high dose irradiation. The effect of the irradiation on the crystal structure of the material is presented. Applications of the sample modification process are presented and further prospects discussed.

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Avasthi, D. K. "Ion Beam Analysis and Applications in On-Line Monitoring of Ion Induced Modifications of Materials." Materials Science Forum 248-249 (May 1997): 405–8. http://dx.doi.org/10.4028/www.scientific.net/msf.248-249.405.

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30

Phaneuf, M. W., J. Li, and T. Malis. "High Resolution FIB as a General Materials Science Tool." Microscopy and Microanalysis 4, S2 (1998): 492–93. http://dx.doi.org/10.1017/s1431927600022583.

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Focused Ion Beam or FIB systems have been used in integrated circuit production for some time. The ability to combine rapid, precision focused ion beam sputtering or gas-assisted ion etching with focused ion beam deposition allows for rapid-prototyping of circuit modifications and failure analysis of defects even if they are buried deep within the chip's architecture. Inevitably, creative TEM researchers reasoned that a FIB could be used to produce site specific parallel-sided, electron transparent regions, thus bringing about the rather unique situation wherein the specimen preparation device often was worth as much as the TEM itself.More recently, FIB manufacturers have concentrated on improving the resolution and imaging characteristics of these instruments, resulting in a more general-purpose characterization tool. The Micrion 2500 FIB system used in this study is capable of 4 nm imaging resolution using either secondary electron or secondary ions, both generated by a 50 kV liquid metal gallium ion source.

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WATT, F., A. A. BETTIOL, J. A. VAN KAN, E. J. TEO, and M. B. H. BREESE. "ION BEAM LITHOGRAPHY AND NANOFABRICATION: A REVIEW." International Journal of Nanoscience 04, no. 03 (2005): 269–86. http://dx.doi.org/10.1142/s0219581x05003139.

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To overcome the diffraction constraints of traditional optical lithography, the next generation lithographies (NGLs) will utilize any one or more of EUV (extreme ultraviolet), X-ray, electron or ion beam technologies to produce sub-100 nm features. Perhaps the most under-developed and under-rated is the utilization of ions for lithographic purposes. All three ion beam techniques, FIB (Focused Ion Beam), Proton Beam Writing (p-beam writing) and Ion Projection Lithography (IPL) have now breached the technologically difficult 100 nm barrier, and are now capable of fabricating structures at the nanoscale. FIB, p-beam writing and IPL have the flexibility and potential to become leading contenders as NGLs. The three ion beam techniques have widely different attributes, and as such have their own strengths, niche areas and application areas. The physical principles underlying ion beam interactions with materials are described, together with a comparison with other lithographic techniques (electron beam writing and EUV/X-ray lithography). IPL follows the traditional lines of lithography, utilizing large area masks through which a pattern is replicated in resist material which can be used to modify the near-surface properties. In IPL, the complete absence of diffraction effects coupled with ability to tailor the depth of ion penetration to suit the resist thickness or the depth of modification are prime characteristics of this technique, as is the ability to pattern a large area in a single brief irradiation exposure without any wet processing steps. p-beam writing and FIB are direct write (maskless) processes, which for a long time have been considered too slow for mass production. However, these two techniques may have some distinct advantages when used in combination with nanoimprinting and pattern transfer. FIB can produce master stamps in any material, and p-beam writing is ideal for producing three-dimensional high-aspect ratio metallic stamps of precise geometry. The transfer of large scale patterns using nanoimprinting represents a technique of high potential for the mass production of a new generation of high area, high density, low dimensional structures. Finally a cross section of applications are chosen to demonstrate the potential of these new generation ion beam nanolithographies.

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Veligura, Vasilisa, Gregor Hlawacek, Robin P. Berkelaar, Raoul van Gastel, Harold J. W. Zandvliet, and Bene Poelsema. "Digging gold: keV He+ ion interaction with Au." Beilstein Journal of Nanotechnology 4 (July 24, 2013): 453–60. http://dx.doi.org/10.3762/bjnano.4.53.

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Helium ion microscopy (HIM) was used to investigate the interaction of a focused He+ ion beam with energies of several tens of kiloelectronvolts with metals. HIM is usually applied for the visualization of materials with extreme surface sensitivity and resolution. However, the use of high ion fluences can lead to significant sample modifications. We have characterized the changes caused by a focused He+ ion beam at normal incidence to the Au{111} surface as a function of ion fluence and energy. Under the influence of the beam a periodic surface nanopattern develops. The periodicity of the pattern shows a power-law dependence on the ion fluence. Simultaneously, helium implantation occurs. Depending on the fluence and primary energy, porous nanostructures or large blisters form on the sample surface. The growth of the helium bubbles responsible for this effect is discussed.

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Prenitzer, B. I., B. W. Kempshall, S. M. Schwarz, L. A. Giannuzzi, and F. A. Stevie. "Practical Aspects of FIB Milling: Understanding Ion Beam/Material Interactions." Microscopy and Microanalysis 6, S2 (2000): 502–3. http://dx.doi.org/10.1017/s1431927600035005.

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Nanometer scale, high resolution Ga+ ion probes, attainable in commercially available focused ion beam (FIB) instruments, allow imaging, sputtering and deposition operations to be performed with a high degree of spatial precision. Of particular interest is how this precision milling/deposition capability has enabled a wide range of site specific micromachining and microfabrication operations (e.g., TEM, SEM, SIMS, and AUGER specimen preparation and circuit modification). The applications of FIB instruments frequently involve the creation of high aspect ratio features (i.e., deep narrow trenches). Ideally, the sidewalls of an FIB milled feature should be vertical; however, it has been generally observed that the trenches tend to exhibit a gradual sloping. The observed deviation from vertical milling has been attributed to the redeposition of sputtered material, and is especially pervasive at high beam currents and confining trench geometries. A hole milled with an FIB tends to be widest at the top surface and taper down to a point at the bottom.

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Le Boité, M. G., A. Traverse, L. Névot, B. Pardo, and J. Corno. "Characterization of ion-beam mixed multilayers via grazing x-ray reflectometry." Journal of Materials Research 3, no. 6 (1988): 1089–96. http://dx.doi.org/10.1557/jmr.1988.1089.

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The grazing x-ray reflectrometry technique was used as a way to study modifications in metallic multilayers induced by ion-beam irradiation. Due to the high sensitivity of the technique, short-range atomic displacements of an atom A in a layer B can be detected so that the first stages of ion-beam mixing can be investigated. The rate of mixing is measured and the compound A1−xBx formed at the layers' interfaces is characterized.

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Chakravadhanula, Venkata Sai Kiran, Yogendra Kumar Mishra, Venkata Girish Kotnur, et al. "Microstructural and plasmonic modifications in Ag–TiO2 and Au–TiO2 nanocomposites through ion beam irradiation." Beilstein Journal of Nanotechnology 5 (September 1, 2014): 1419–31. http://dx.doi.org/10.3762/bjnano.5.154.

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The development of new fabrication techniques of plasmonic nanocomposites with specific properties is an ongoing issue in the plasmonic and nanophotonics community. In this paper we report detailed investigations on the modifications of the microstructural and plasmonic properties of metal–titania nanocomposite films induced by swift heavy ions. Au–TiO2 and Ag–TiO2 nanocomposite thin films with varying metal volume fractions were deposited by co-sputtering and were subsequently irradiated by 100 MeV Ag8+ ions at various ion fluences. The morphology of these nanocomposite thin films before and after ion beam irradiation has been investigated in detail by transmission electron microscopy studies, which showed interesting changes in the titania matrix. Additionally, interesting modifications in the plasmonic absorption behavior for both Au–TiO2 and Ag–TiO2 nanocomposites were observed, which have been discussed in terms of ion beam induced growth of nanoparticles and structural modifications in the titania matrix.

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Panchal, Suresh, and R. P. Chauhan. "Nickel ion beam induced modifications in Cu–Se heterojunction nanowires." Journal of Materials Science: Materials in Electronics 31, no. 1 (2019): 693–703. http://dx.doi.org/10.1007/s10854-019-02577-2.

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Cureton, William F., Cameron L. Tracy, and Maik Lang. "Review of Swift Heavy Ion Irradiation Effects in CeO2." Quantum Beam Science 5, no. 2 (2021): 19. http://dx.doi.org/10.3390/qubs5020019.

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Cerium dioxide (CeO2) exhibits complex behavior when irradiated with swift heavy ions. Modifications to this material originate from the production of atomic-scale defects, which accumulate and induce changes to the microstructure, chemistry, and material properties. As such, characterizing its radiation response requires a wide range of complementary characterization techniques to elucidate the defect formation and stability over multiple length scales, such as X-ray and neutron scattering, optical spectroscopy, and electron microscopy. In this article, recent experimental efforts are reviewed in order to holistically assess the current understanding and knowledge gaps regarding the underlying physical mechanisms that dictate the response of CeO2 and related materials to irradiation with swift heavy ions. The recent application of novel experimental techniques has provided additional insight into the structural and chemical behavior of irradiation-induced defects, from the local, atomic-scale arrangement to the long-range structure. However, future work must carefully account for the influence of experimental conditions, with respect to both sample properties (e.g., grain size and impurity content) and ion-beam parameters (e.g., ion mass and energy), to facilitate a more direct comparison of experimental results.

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Zhao, Lirong, Yimin Cui, Wenping Li, Wajid Ali Khan, and Yutian Ma. "3-D SRIM Simulation of Focused Ion Beam Sputtering with an Application-Oriented Incident Beam Model." Applied Sciences 9, no. 23 (2019): 5133. http://dx.doi.org/10.3390/app9235133.

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Ion beam sputter etching has been widely used in material surface modification and transmission electron microscope (TEM) sample preparation. Due to the complexity of the ion beam etching process, the quantitative simulation of ion beam sputtering is necessary to guarantee precision in surface treatment and sculpting under different energies and beam currents. In this paper, an application-oriented incident ion beam model was first built with aberrations and Coulomb repulsion forces being considered from the Ga ion source to the sample. The sputtering process of this model on the sample was then analyzed and simulated with an improved stopping and range of ions in matter (SRIM) program. The sputtering performance of this model, the point-like incident beam and the typical Gaussian incident beam was given in the end. Results show that the penetration depth of Ga ions having 30 keV energy in silicon is 28 nm and the radial range is 29.6 nm with 50 pA beam current. The application-oriented model has been verified by our focused ion beam-scanning electron microscopy (FIB-SEM) milling experiment and it will be a potential thermal source in simulating the process of FIB bombarding organic samples.

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Michael, Joseph R. "Focused Ion Beam Induced Microstructural Alterations: Texture Development, Grain Growth, and Intermetallic Formation." Microscopy and Microanalysis 17, no. 3 (2011): 386–97. http://dx.doi.org/10.1017/s1431927611000171.

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AbstractCopper, gold, and tungsten thin films have been exposed to 30 kV Ga+ion irradiation, and the resulting microstructural modifications are studied as a function of ion dose. The observed microstructural changes include texture development with respect to the easy channeling direction in the target, and in the case of Cu, an additional intermetallic phase is produced. Texture development in these target materials is a function of the starting materials grain size, and these changes are not observed in large grained materials. The accepted models of differential damage driven grain growth are not supported by the results of this study. The implications of this study to the use of focused ion beam tools for sample preparation are discussed.

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Bhattacharya, Rabi S., A. K. Rai, A. W. McCormick, and A. Erdemir. "High Energy (MeV) Ion Beam Modifications of Sputtered MoS2Coatings on Ceramics." Tribology Transactions 36, no. 4 (1993): 621–26. http://dx.doi.org/10.1080/10402009308983203.

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41

Costantini, Jean-Marc, Xavier Kerbiriou, Maxime Sauzay, and Lionel Thomé. "Ion-beam modifications of mechanical and dimensional properties of silicon carbide." Journal of Physics D: Applied Physics 45, no. 46 (2012): 465301. http://dx.doi.org/10.1088/0022-3727/45/46/465301.

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Zhang, J., H. W. Zhong, Z. A. Ye, et al. "Study on ablation products of zinc by intense pulsed ion beam irradiation." Laser and Particle Beams 35, no. 1 (2017): 108–13. http://dx.doi.org/10.1017/s0263034616000938.

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AbstractAs a kind of flash heat source, intense pulsed ion beam (IPIB) can be used for material surface modification. The ablation effect has important influence on interaction between IPIB and material. Therefore, the understanding of ablation mechanism is of great significance to IPIB application. In this work, pure zinc targets were irradiated and ablated by IPIB. In the ablation process under the different ion beam energy densities, the ablation products were collected by a monocrystalline silicon substrate. By analyzing the ablation products with scanning electron microscope and energy-dispersive spectrometer, the surface morphology, and the spatial distribution of ablation products quantity were obtained. The results are useful for clearing the ablation process and the influence of beam parameter on the ablation effect.

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King, Stanley, Isabel Escobar, and Xinglong Xu. "Ion Beam Irradiation Modifications of a Commercial Polyether Sulfone Water-Treatment Membrane." Environmental Chemistry 1, no. 1 (2004): 55. http://dx.doi.org/10.1071/en04003.

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Environmental Context.The demand for more efficient and effective water-treatment processes is increasing. A popular method is the use of membrane filtration, to separate water from contaminants such as ions and microorganisms, however more selective membranes have a lower flux (permeate produced per unit area of membrane per unit time) and are more susceptible to fouling (an accumulation of surface-blocking materials). To aid flux and limit fouling, and thereby make membrane processes competitive with conventional technologies, a post-synthesis treatment is applied to alter the microstructure and surface of the water-treatment membrane. Abstract.A commercial polyether sulfone (PES) water-treatment membrane was modified by ion beam irradiation. Bench-scale cross-flow filtration experiments were conducted to investigate the transport properties and fouling potential of the modified membrane with respect to the four major constituents of raw water: monovalent cations, divalent cations, natural organic matter (NOM), and bacterial presence. Results indicated modification led to a reduction in the charge of the membrane, as observed by lower rejection of monovalent cations and increased cross-linking of divalent cations on the membrane’s surface, along with a hardening of membrane pores, as observed by increased organic matter removal. The most significant result was with respect to NOM fouling, which was shown to become more reversible.

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Singh, Divya, B. Bhattacharya, and Hardev Singh Virk. "Conductivity Modulation in Polymer Electrolytes and their Composites due to Ion-Beam Irradiation." Solid State Phenomena 239 (August 2015): 110–48. http://dx.doi.org/10.4028/www.scientific.net/ssp.239.110.

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Polymers are a class of materials widely used in different fields of applications. With imminent applications of polymers, the study of radiation induced changes in polymers has become an obvious scientific demand. The bombardment by ion beam radiations has become one of the most promising techniques in present day polymer research. When the polymers are irradiated, a variety of physical and chemical changes takes place due to energy deposition of the radiation in the polymer matrix. Scissoring, cross-linking, recombination, radical decomposition, etc. are some of the interesting changes that are obvious in polymers. The modification in polymer properties by irradiation depends mainly on the nature of radiation and the type of polymer used.Polymer electrolytes are obtained by modifying polymers by doping, complexing, or other chemical processes. In general, they suffer from low conductivity due to high crystallinity of the matrix. The effect of radiation on polymer electrolyte is expected to alter their crystalline nature vis-a-vis electrical properties. This review article shall elaborate modifications in the physical and chemical properties of polymer electrolytes and their composites. The variations in properties have been explored on PEO based polymer electrolyte and correlated with the parameters responsible for such changes. Also a comparison with different types of the polymers irradiated with a wide range of ion beams has been established.

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Wu, Di, and Yong Jian Du. "The Irradiation Effects of Metal Gold Surface by Intense Pulsed Ion Beam." Advanced Materials Research 690-693 (May 2013): 2085–88. http://dx.doi.org/10.4028/www.scientific.net/amr.690-693.2085.

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We report a modification method for Gold target by intense pulsed ion beam (IPIB) irradiation. Based on the temporal and spatial distribution models of the ion beam density detected by Faraday cup in the chamber and the ions accelerating voltage, the energy deposition of the beam ions in Au is calculated by Monte Carlo method. Taking this time-dependent nonlinear deposited energy as the source term of two-dimensional thermal conduction equation, we obtain the temporal and spatial ablation process of metal Au during a pulse time. The top-layer Gold material in thickness of about 0.25μm is ablated by vaporization and the layer in thickness of 1.40μm is melted after one shot at the ion beam density of 300 A/cm2.

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Marx, Michael, Wolfgang Schäf, and Horst Vehoff. "Influence of Grain Boundaries on Short Fatigue Crack Growth in “Polycrystalline CMSX-4”." Advanced Materials Research 278 (July 2011): 333–38. http://dx.doi.org/10.4028/www.scientific.net/amr.278.333.

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Increasing the resistance of a material to fatigue crack growth by optimizing the microstructure is a major task of materials science. In this regard, grain boundaries and precipitates are well known to decelerate short cracks. Thereby the strength of the interaction is influenced by the crack parameters crack length and distance to the obstacles, the grain boundary parameters like orientation of the adjacent grains and the precipitate parameters like size and distance. A comprehensive understanding of the underlying physical principles is missing. The focused ion beam (FIB) microscope offers new possibilities for systematic experiments and three dimensional investigations to quantify the microstructural impact. The ion beam is used to cut micro-notches as initiation sites for cracks. Contrary to natural cracks the influencing parameters can be varied independently for a systematic investigation of the mechanisms. Additionally, the ion beam is used to make a 3D image of the crack path and the surrounding microstructural elements. The commonly single crystalline nickel base superalloy CMSX-4 served as a model material in a polycrystalline modification. Thereby it was possible for the first time to reveal quantitative data of the effect of microstructural barriers on short fatigue crack growth.

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Wu, Di. "Research on Thermo Effects of Silver Modified by High-Intensity Pulsed Ion Beam." Applied Mechanics and Materials 423-426 (September 2013): 294–97. http://dx.doi.org/10.4028/www.scientific.net/amm.423-426.294.

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We report a modification method for Silver target by high-intensity pulsed ion beam (HIPIB) irradiation. Based on the temporal and spatial distribution models of the ion beam density detected by Faraday cup in the chamber and the ions accelerating voltage, the energy deposition of the beam ions in Ag is calculated by Monte Carlo method. Taking this time-dependent nonlinear deposited energy as the source term of two-dimensional thermal conduction equation, we obtain the temporal and spatial ablation process of metal Ag during a pulse time. The top-layer silver material in thickness of about 0.33μm is ablated by vaporization and the layer in thickness of 1.6μm is melted after one shot at the ion beam density of 300 A/cm2.

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Sharma, Amit L., and Alok Srivastava. "Ion beam induced modifications in nitroso substituted polyaniline: Spectral and electrical studies." Current Applied Physics 7, no. 6 (2007): 650–54. http://dx.doi.org/10.1016/j.cap.2007.02.001.

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TEH, Thiam Oun, Arwinder SINGH, Jalil ALI, et al. "A Study on the Surface Hardness Obtained by Nitriding with a Plasma Focus Machine." Walailak Journal of Science and Technology (WJST) 16, no. 6 (2018): 379–84. http://dx.doi.org/10.48048/wjst.2019.6268.

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A dense plasma focus (DPF) machine, being a source of a powerful ion beam, can be useful in the modification of the surface properties of materials. Experimental investigations were carried out with a 3.3 kJ Mather-type DPF operating in nitrogen at a low chamber pressure with low carbon steel as the target material. It was found that the DPF ion beam implanted nitrogen onto the steel surface thereby causing a marked increase in surface hardness. The variation of pressure and target distances appear to affect the outcome of this nitriding technique with optimum hardness reached at the pressure setting of 1 Torr and at a target distance of 40 mm from the anode.

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Marletta, Giovanni, Salvatore Pignataro, Andras Toth, Imre Bertoti, Tamas Szekely, and Balazs Keszler. "X-ray, electron, and ion beam induced modifications of poly(ether sulfone)." Macromolecules 24, no. 1 (1991): 99–105. http://dx.doi.org/10.1021/ma00001a016.

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